Material mixture, sputter target and method for producing a sputter target

Abstract

A material mixture is produced having a cobalt-based alloy as the predominant component and an additional component of at least TiO x . The material mixture may be formed into a sputter target by hot pressing.

1 . A material mixture comprising a cobalt-based alloy as a predominant component and a component of lesser amount comprising at least TiO x , wherein x is the atomic ratio of O to Ti. 
     
     
         2 . The material mixture according to  claim 1 , wherein in the component TiO x , x<2. 
     
     
         3 . The material mixture according to  claim 2 , wherein in the component TiO x , 1.5<x<1.998. 
     
     
         4 . The material mixture according to  claim 1 , wherein the component TiO x  is in particle form having a particle size in a range of 0.1 to 50 μm. 
     
     
         5 . The material mixture according to  claim 1 , wherein the mixture is a mixture of a metallic powder of the cobalt-based alloy and an oxide powder of the TiO x . 
     
     
         6 . The material mixture according to  claim 1 , wherein the cobalt-based alloy is an alloy of cobalt with at least one metal selected from chromium, platinum, tantalum, and boron. 
     
     
         7 . A sputter target produced from a material mixture according to  claim 1 . 
     
     
         8 . The sputter target according to  claim 7 , wherein the target has a density of at least 95% of a theoretical density of the material mixture. 
     
     
         9 . A method for producing a sputter target according to  claim 7 , the method comprising mixing a powder of the cobalt-based alloy with a powder of the TiO x , and hot-pressing the powder mixture. 
     
     
         10 . The method according to  claim 9 , wherein the powder mixture is pressed hot axially or hot isostatically.