Inventor · disambiguated record
Masahiro Sumiya
Also filed as: SUMIYA MASAHIRO
43 granted patents·23 pending applications·306 citations·filing 1997–2025
97Inventor score
Top patents by PatentIndex Score
66 records- 0198US6777037B2Plasma processing method and apparatusHITACHI LTD·Filed 2001·Granted Aug 17, 2004·100 cites·3 claims
- 0295US12191121B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Jan 7, 2025·2 cites·4 claims
- 0395US11664233B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2021·Granted May 30, 2023·2 cites·8 claims
- 0494US7373899B2Plasma processing apparatus using active matchingHITACHI HIGH TECH CORP·Filed 2004·Granted May 20, 2008·46 cites·14 claims
- 0590US7169255B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Jan 30, 2007·30 cites·3 claims
- 0688US8557709B2Plasma processing apparatus and plasma processing methodSUMIYA MASAHIRO·Filed 2010·Granted Oct 15, 2013·9 cites·11 claims
- 0788US6875366B2Plasma processing apparatus and method with controlled biasing functionsHITACHI LTD·Filed 2001·Granted Apr 5, 2005·22 cites·17 claims
- 0886US9496147B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 15, 2016·5 cites·7 claims
- 0985US7029594B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 18, 2006·19 cites·12 claims
- 1084US10510519B2Plasma processing apparatus and data analysis apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 17, 2019·3 cites·8 claims
- 1183US11257661B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Feb 22, 2022·3 cites·7 claims
- 1283US10184173B1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jan 22, 2019·5 cites·8 claims
- 1383US7615132B2Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing methodHITACHI HIGH TECH CORP·Filed 2004·Granted Nov 10, 2009·16 cites·8 claims
- 1482US12494348B2Plasma processing apparatus and member of plasma processing chamberHITACHI HIGH TECH CORP·Filed 2023·Granted Dec 9, 2025·0 cites·2 claims
- 1581US9597975B2Power supply systemITO AKIRA·Filed 2012·Granted Mar 21, 2017·9 cites·6 claims
- 1680US2025323029A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 1779US6806201B2Plasma processing apparatus and method using active matchingHITACHI LTD·Filed 2001·Granted Oct 19, 2004·12 cites·10 claims
- 1873US9960031B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted May 1, 2018·1 cites·5 claims
- 1973US2025046580A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2024·Application pending·0 cites
- 2072US7771608B2Plasma processing method and apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted Aug 10, 2010·4 cites·2 claims
- 2171US12368031B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Granted Jul 22, 2025·0 cites·1 claims
- 2271US12112925B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted Oct 8, 2024·0 cites·5 claims
- 2369US11107664B2Plasma processing apparatus and prediction apparatus of the condition of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 31, 2021·1 cites·15 claims
- 2467US12080529B2Plasma processing apparatus and prediction method of the condition of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted Sep 3, 2024·0 cites·4 claims
- 2565US12148633B2Plasma processing apparatus and method for releasing sampleHITACHI HIGH TECH CORP·Filed 2020·Granted Nov 19, 2024·0 cites·1 claims
- 2665US7585776B2Dry etching method of insulating filmHITACHI HIGH TECH CORP·Filed 2007·Granted Sep 8, 2009·2 cites·9 claims
- 2764US11107694B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 31, 2021·0 cites·1 claims
- 2863US11538671B2Plasma processing apparatus and data analysis apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 27, 2022·0 cites·5 claims
- 2963US11315792B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2019·Granted Apr 26, 2022·0 cites·6 claims
- 3060US10395935B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Aug 27, 2019·0 cites·3 claims
- 3160US5886473ASurface wave plasma processing apparatusHITACHI LTD·Filed 1997·Granted Mar 23, 1999·14 cites·5 claims
- 3260US2023110096A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 3360US2019326101A1Plasma processing apparatus and member of plasma processing chamberHITACHI HIGH TECH CORP·Filed 2019·Application pending·0 cites
- 3460US2009165955A1Plasma processing apparatus and method with controlled biasing functionsSUMIYA MASAHIRO·Filed 2009·Application pending·0 cites
- 3559US8236701B2Plasma processing apparatus and plasma processing methodSUMIYA MASAHIRO·Filed 2009·Granted Aug 7, 2012·1 cites·4 claims
- 3657US12154765B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Nov 26, 2024·0 cites·3 claims
- 3757US12050455B2State prediction apparatus and semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 30, 2024·0 cites·9 claims
- 3855US11355324B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 7, 2022·0 cites·9 claims
- 3955US10490412B2Method for releasing sample and plasma processing apparatus using sameHITACHI HIGH TECH CORP·Filed 2016·Granted Nov 26, 2019·0 cites·2 claims
- 4055US9941133B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Apr 10, 2018·0 cites·6 claims
- 4155US2014053983A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 4255US2007186856A1Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing methodYASUI NAOKI·Filed 2007·Application pending·0 cites
- 4353US2005155711A1Plasma processing apparatus and method with controlled biasing functionsFiled 2005·Application pending·0 cites
- 4452US11424108B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 23, 2022·0 cites·4 claims
- 4552US2005126712A1Plasma processing methodFiled 2005·Application pending·0 cites
- 4652US2024310821A1Diagnostic apparatus and diagnostic method, and semiconductor manufacturing apparatus system and semiconductor apparatus manufacturing systemHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 4751US12444591B2Diagnosis device, diagnosis method, plasma processing apparatus, and semiconductor device manufacturing systemHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 14, 2025·0 cites·12 claims
- 4851US10886110B2Plasma processing apparatus and prediction method of the condition of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Jan 5, 2021·0 cites·4 claims
- 4951US10825700B2Plasma processing apparatus and method for releasing sampleHITACHI HIGH TECH CORP·Filed 2017·Granted Nov 3, 2020·0 cites·5 claims
- 5050US2024395518A1Diagnostic device, diagnostic method, semiconductor manufacturing equipment system, and semiconductor equipment manufacturing systemHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
Showing the top 50 of 66 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →