Inventor · disambiguated record
Masaki Takakuwa
Also filed as: TAKAKUWA MASAKI
11 granted patents·2 pending applications·235 citations·filing 1996–2023
91Inventor score
Top patents by PatentIndex Score
13 records- 0182US5900554APressure sensorNIPPON DENSO CO·Filed 1998·Granted May 4, 1999·56 cites·27 claims
- 0280US5747694APressure sensor with barrier in a pressure chamberNIPPON DENSO CO·Filed 1996·Granted May 5, 1998·58 cites·12 claims
- 0375US6807864B2Pressure sensor with water repellent filterDENSO CORP·Filed 2001·Granted Oct 26, 2004·22 cites·20 claims
- 0474US6969862B2Charged-particle-beam exposure apparatus and method of controlling sameCANON KK·Filed 2003·Granted Nov 29, 2005·19 cites·16 claims
- 0572US6946662B2Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing methodHITACHI LTD·Filed 2003·Granted Sep 20, 2005·11 cites·19 claims
- 0672US6575038B1Pressure sensor and method for assembling the sameDENSO CORP·Filed 2000·Granted Jun 10, 2003·20 cites·19 claims
- 0771US7034321B2Electron beam exposure apparatus and electron beam measurement moduleCANON KK·Filed 2003·Granted Apr 25, 2006·9 cites·13 claims
- 0871US6768118B2Electron beam monitoring sensor and electron beam monitoring methodHITACHI LTD·Filed 2003·Granted Jul 27, 2004·8 cites·11 claims
- 0963US6085598APressure sensor device having breakable mounting memberDENSO CORP·Filed 1999·Granted Jul 11, 2000·26 cites·17 claims
- 1058US2024290741A1Semiconductor apparatus and manufacturing methodADVANTEST CORP·Filed 2023·Application pending·0 cites
- 1156US6870310B2Multibeam generating apparatus and electron beam drawing apparatusCANON KK·Filed 2003·Granted Mar 22, 2005·5 cites·15 claims
- 1250US7015482B2Electron beam writing equipment using plural beams and methodADVANTEST CORP·Filed 2003·Granted Mar 21, 2006·1 cites·11 claims
- 1335US2001052573A1Target mark member, method for manufacturing, and electron beam exposure apparatus thereofADVANTEST CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →