Inventor · disambiguated record
Masaru Tanabe
Also filed as: TANABE MASARU · YOKOTA KATSUYOSHI
40 granted patents·4 pending applications·156 citations·filing 1979–2022
97Inventor score
Top patents by PatentIndex Score
44 records- 0189US7592104B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2005·Granted Sep 22, 2009·10 cites·12 claims
- 0288US8142963B2Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor deviceTANABE MASARU·Filed 2010·Granted Mar 27, 2012·5 cites·31 claims
- 0387US8039178B2Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masksHOYA CORP·Filed 2010·Granted Oct 18, 2011·4 cites·26 claims
- 0484US6593408B1Organic polymer/inorganic fine particle-dispersed aqueous solution having excellent stability and uses thereofMITSUI CHEMICALS INC·Filed 1999·Granted Jul 15, 2003·38 cites·48 claims
- 0583US6359093B1Amphipathic compound having succinic acid skeletonMITSUI CHEMICALS INC·Filed 2000·Granted Mar 19, 2002·18 cites·3 claims
- 0681US8048593B2Mask blank substrate, mask blank, photomask, and methods of manufacturing the sameHOYA CORP·Filed 2009·Granted Nov 1, 2011·4 cites·9 claims
- 0779US9690189B2Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Jun 27, 2017·2 cites·26 claims
- 0879US8609304B2Method of manufacturing a transfer mask and method of manufacturing a semiconductor deviceTANABE MASARU·Filed 2012·Granted Dec 17, 2013·4 cites·22 claims
- 0976US6683720B2Reflector, sidelight type backlighting apparatus and reflector substrateMITSUI CHEMICALS INC·Filed 2001·Granted Jan 27, 2004·16 cites·44 claims
- 1074US8455158B2Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceTANABE MASARU·Filed 2011·Granted Jun 4, 2013·2 cites·40 claims
- 1172US8007961B2Mask blank substrate set and mask blank setHOYA CORP·Filed 2009·Granted Aug 30, 2011·2 cites·8 claims
- 1271US7898650B2Inspection method for transparent articleHOYA CORP·Filed 2006·Granted Mar 1, 2011·2 cites·32 claims
- 1369US12468220B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Nov 11, 2025·0 cites·17 claims
- 1468US8318388B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodSUZUKI OSAMU·Filed 2011·Granted Nov 27, 2012·1 cites·13 claims
- 1568US7998644B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodHOYA CORP·Filed 2010·Granted Aug 16, 2011·1 cites·25 claims
- 1668US7892708B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2010·Granted Feb 22, 2011·1 cites·35 claims
- 1767US6861659B2Method of inspecting ununiformity of transparent material, apparatus therefor, and method of selecting transparent substrateHOYA CORP·Filed 2003·Granted Mar 1, 2005·5 cites·10 claims
- 1864US7745074B2Mask blank substrate, mask blank, exposure mask, mask blank substrate manufacturing method, and semiconductor manufacturing methodHOYA CORP·Filed 2009·Granted Jun 29, 2010·1 cites·15 claims
- 1963US6610994B1Method of checking unevenness of light-transmitting substance, apparatus therefor, and method of sorting transparent substratesHOYA CORP·Filed 1998·Granted Aug 26, 2003·22 cites·25 claims
- 2062US7700244B2Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing methodHOYA CORP·Filed 2005·Granted Apr 20, 2010·1 cites·12 claims
- 2159US8197992B2Photomask blank, photomask blank manufacturing method, and photomask manufacturing methodTANABE MASARU·Filed 2009·Granted Jun 12, 2012·0 cites·10 claims
- 2258US10168613B2Mask blank substrate, mask blank, transfer mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Jan 1, 2019·0 cites·15 claims
- 2358US8609307B2Thin film evaluation method, mask blank, and transfer maskHOYA CORP·Filed 2013·Granted Dec 17, 2013·0 cites·25 claims
- 2456US8709683B2Photomask blank, photomask blank manufacturing method, and photomask manufacturing methodTANABE MASARU·Filed 2012·Granted Apr 29, 2014·0 cites·11 claims
- 2556US8107063B2Transparent articleTANABE MASARU·Filed 2010·Granted Jan 31, 2012·0 cites·20 claims
- 2655US8440373B2Mask blank substrate, mask blank, photomask, and methods of manufacturing the sameTANABE MASARU·Filed 2011·Granted May 14, 2013·0 cites·18 claims
- 2754US8592106B2Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor deviceTANABE MASARU·Filed 2012·Granted Nov 26, 2013·0 cites·29 claims
- 2854US8450030B2Thin film evaluation method, mask blank, and transfer maskSAKAI KAZUYA·Filed 2011·Granted May 28, 2013·0 cites·10 claims
- 2954US8318387B2Mask blank substrate set and mask blank setTANABE MASARU·Filed 2011·Granted Nov 27, 2012·0 cites·24 claims
- 3053US10578961B2Mask blank substrate, multi-layer reflective film coated substrate, and mask blankHOYA CORP·Filed 2017·Granted Mar 3, 2020·0 cites·19 claims
- 3151US8026025B2Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing methodHOYA CORP·Filed 2010·Granted Sep 27, 2011·0 cites·17 claims
- 3251US7901840B2Mask blank transparent substrate manufacturing method, mask blank manufacturing method, and exposure mask manufacturing methodHOYA CORP·Filed 2006·Granted Mar 8, 2011·0 cites·15 claims
- 3351US7862960B2Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masksHOYA CORP·Filed 2005·Granted Jan 4, 2011·0 cites·12 claims
- 3450US2015030230A1Substrate inspection method, substrate manufacturing method and substrate inspection deviceHOYA CORP·Filed 2014·Application pending·0 cites
- 3547US2017363952A1Mask blank substrate, mask blank, and methods for manufacturing them, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Application pending·0 cites
- 3646US2015372158A1Solar battery-sealing sheet, solar battery module and method for manufacturing the sameMITSUI CHEMICALS TOHCELLO INC·Filed 2013·Application pending·0 cites
- 3745US6555273B2Glass substrate for an electron device, photomask blank and photomask using the sameHOYA CORP·Filed 1998·Granted Apr 29, 2003·9 cites·12 claims
- 3845US2015029324A1Substrate inspection method, substrate manufacturing method and substrate inspection deviceHOYA CORP·Filed 2014·Application pending·0 cites
- 3943US10983427B2Method for manufacturing a mask blank substrate, method for manufacturing a mask blank, method for manufacturing a transfer mask, method for manufacturing a semiconductor device, a mask blank substrate, a mask blank, and a transfer maskHOYA CORP·Filed 2017·Granted Apr 20, 2021·0 cites·12 claims
- 4043US7972702B2Defect inspection method for a glass substrate for a mask blank, glass substrate for a mask blank, mask blank, exposure mask, method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing an exposure maskHOYA CORP·Filed 2006·Granted Jul 5, 2011·0 cites·8 claims
- 4143US5872287AAmphipathic compound having succinic acid skeletonMITSUI CHEMICALS INC·Filed 1996·Granted Feb 16, 1999·5 cites·2 claims
- 4241US8785085B2Method of manufacturing a mask blank substrate, method of manufacturing a mask blank, method of manufacturing a transfer mask, and method of manufacturing a semiconductor deviceTANABE MASARU·Filed 2011·Granted Jul 22, 2014·0 cites·44 claims
- 4337US4205805AAutomatic tape windup meansNCR CO·Filed 1979·Granted Jun 3, 1980·3 cites·14 claims
- 4434US6057412AAmphipathic compound having succinic acid skeletonMITSUI CHEMICALS INC·Filed 1998·Granted May 2, 2000·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →