Inventor · disambiguated record
Maki Tanaka
Also filed as: TANAKA MAKI · TANAKA MAKI SHI
97 granted patents·8 pending applications·2,132 citations·filing 1989–2017
99Inventor score
Files withHITACHI LTD51HITACHI HIGH TECH CORP30SHISHIDO CHIE4SNOW BRAND MILK PRODUCTS CO LTD3TANAKA MAKI3
Top patents by PatentIndex Score
105 records- 0199US7692144B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2007·Granted Apr 6, 2010·42 cites·15 claims
- 0299US6172363B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 1997·Granted Jan 9, 2001·185 cites·20 claims
- 0399US6107637AElectron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 1998·Granted Aug 22, 2000·147 cites·34 claims
- 0499US5986263AElectron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1997·Granted Nov 16, 1999·164 cites·21 claims
- 0597US6329826B1Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2000·Granted Dec 11, 2001·95 cites·4 claims
- 0696US7417444B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2005·Granted Aug 26, 2008·25 cites·7 claims
- 0796US6333510B1Electron beam exposure or system inspection of measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2000·Granted Dec 25, 2001·44 cites·12 claims
- 0895US7329889B2Electron beam apparatus and method with surface height calculator and a dual projection optical unitHITACHI LTD·Filed 2005·Granted Feb 12, 2008·17 cites·6 claims
- 0994US8212227B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusWATANABE MASAHIRO·Filed 2010·Granted Jul 3, 2012·12 cites·10 claims
- 1094US7061602B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 13, 2006·18 cites·13 claims
- 1194US6952492B2Method and apparatus for inspecting a semiconductor deviceHITACHI LTD·Filed 2001·Granted Oct 4, 2005·50 cites·18 claims
- 1294US6753518B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2001·Granted Jun 22, 2004·35 cites·17 claims
- 1393US7633061B2Method and apparatus for measuring pattern dimensionsHITACHI HIGH TECH CORP·Filed 2008·Granted Dec 15, 2009·25 cites·14 claims
- 1493US6583634B1Method of inspecting circuit pattern and inspecting instrumentHITACHI LTD·Filed 2000·Granted Jun 24, 2003·68 cites·5 claims
- 1592US6919577B2Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatusHITACHI LTD·Filed 2004·Granted Jul 19, 2005·25 cites·17 claims
- 1692US6587581B1Visual inspection method and apparatus thereforHITACHI LTD·Filed 1998·Granted Jul 1, 2003·118 cites·59 claims
- 1792US6172365B1Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 1999·Granted Jan 9, 2001·48 cites·10 claims
- 1891US7732761B2Method for measuring a pattern dimension using a scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2007·Granted Jun 8, 2010·18 cites·13 claims
- 1991US7417723B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI LTD·Filed 2006·Granted Aug 26, 2008·10 cites·12 claims
- 2091US6909930B2Method and system for monitoring a semiconductor device manufacturing processHITACHI LTD·Filed 2002·Granted Jun 21, 2005·52 cites·37 claims
- 2191US6373054B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2001·Granted Apr 16, 2002·23 cites·22 claims
- 2290US8110800B2Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the systemSHISHIDO CHIE·Filed 2009·Granted Feb 7, 2012·10 cites·20 claims
- 2390US7952074B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2008·Granted May 31, 2011·8 cites·18 claims
- 2490US7164128B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2004·Granted Jan 16, 2007·26 cites·22 claims
- 2590US6888959B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI HIGH TECH ELECT ENG CO·Filed 2001·Granted May 3, 2005·38 cites·20 claims
- 2689US9852881B2Scanning electron microscope system, pattern measurement method using same, and scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2014·Granted Dec 26, 2017·9 cites·25 claims
- 2788US7935927B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2008·Granted May 3, 2011·7 cites·23 claims
- 2888US7116817B2Method and apparatus for inspecting a semiconductor deviceHITACHI LTD·Filed 2005·Granted Oct 3, 2006·10 cites·18 claims
- 2988US6841403B2Method for manufacturing semiconductor devices and method and its apparatus for processing detected defect dataHITACHI LTD·Filed 2003·Granted Jan 11, 2005·35 cites·17 claims
- 3088US6703850B2Method of inspecting circuit pattern and inspecting instrumentHITACHI LTD·Filed 2003·Granted Mar 9, 2004·37 cites·6 claims
- 3187US6717142B2Electron beam inspection method and apparatus and semiconductor manufacturing method and its manufacturing line utilizing the sameHITACHI LTD·Filed 2002·Granted Apr 6, 2004·16 cites·15 claims
- 3287US6335532B1Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 1999·Granted Jan 1, 2002·38 cites·3 claims
- 3386US10186399B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2017·Granted Jan 22, 2019·4 cites·10 claims
- 3486US8481936B2Scanning electron microscope system and method for measuring dimensions of patterns formed on semiconductor device by using the systemSHISHIDO CHIE·Filed 2012·Granted Jul 9, 2013·4 cites·16 claims
- 3586US8274651B2Method of inspecting a semiconductor device and an apparatus thereofHAMAMATSU AKIRA·Filed 2011·Granted Sep 25, 2012·3 cites·14 claims
- 3686US7230243B2Method and apparatus for measuring three-dimensional shape of specimen by using SEMHITACHI HIGH TECH CORP·Filed 2005·Granted Jun 12, 2007·9 cites·15 claims
- 3786US7133550B2Pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted Nov 7, 2006·19 cites·15 claims
- 3886US6898305B2Circuit pattern inspection method and apparatusHITACHI LTD·Filed 2001·Granted May 24, 2005·40 cites·24 claims
- 3986US6087673AMethod of inspecting pattern and apparatus thereofHITACHI LTD·Filed 1998·Granted Jul 11, 2000·58 cites·29 claims
- 4085US7643138B2Method of inspecting a semiconductor device and an apparatus thereofHITACHI LTD·Filed 2008·Granted Jan 5, 2010·5 cites·12 claims
- 4185US7365325B2Method and apparatus for observing a specimenHITACHI HIGH TECH CORP·Filed 2007·Granted Apr 29, 2008·11 cites·12 claims
- 4285US7116816B2Method of inspecting a pattern and an apparatus thereof and a method of processing a specimenHITACHI LTD·Filed 2001·Granted Oct 3, 2006·41 cites·23 claims
- 4385US6913861B2Method of observing exposure condition for exposing semiconductor device and its apparatus and method of manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·24 cites·18 claims
- 4485US6559663B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2001·Granted May 6, 2003·20 cites·10 claims
- 4584US7889908B2Method and apparatus for measuring shape of a specimenHITACHI HIGH TECH CORP·Filed 2006·Granted Feb 15, 2011·7 cites·9 claims
- 4684US7026830B2Method and apparatus for inspecting integrated circuit patternHITACHI LTD·Filed 2003·Granted Apr 11, 2006·19 cites·6 claims
- 4784US6929892B2Method of monitoring an exposure processHITACHI HIGH TECH CORP·Filed 2004·Granted Aug 16, 2005·25 cites·15 claims
- 4884US6559459B2Convergent charged particle beam apparatus and inspection method using sameHITACHI LTD·Filed 2001·Granted May 6, 2003·14 cites·11 claims
- 4983US9824853B2Electron microscope device and imaging method using sameHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 21, 2017·4 cites·16 claims
- 5083US7957579B2Pattern inspection method and apparatusHITACHI LTD·Filed 2007·Granted Jun 7, 2011·5 cites·11 claims
Showing the top 50 of 105 patent records by PatentIndex Score.
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