Inventor · disambiguated record
Masayuki Tomoyasu
Also filed as: KOMINO MITSUAKI · TOMOYASU MASAYUKI
25 granted patents·2 pending applications·1,632 citations·filing 1989–2021
97Inventor score
Top patents by PatentIndex Score
27 records- 0198US5888907APlasma processing methodTOKYO ELECTRON LTD·Filed 1997·Granted Mar 30, 1999·427 cites·5 claims
- 0297US6544380B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 8, 2003·104 cites·3 claims
- 0397US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0496US7477960B2Fault detection and classification (FDC) using a run-to-run controllerTOKYO ELECTRON LTD·Filed 2005·Granted Jan 13, 2009·86 cites·51 claims
- 0596US6264788B1Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jul 24, 2001·125 cites·3 claims
- 0696US5900103APlasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 1995·Granted May 4, 1999·173 cites·2 claims
- 0793US7505879B2Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Mar 17, 2009·56 cites·14 claims
- 0891US5904780APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1997·Granted May 18, 1999·73 cites·18 claims
- 0990US7648610B2Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plateTOKYO ELECTRON LTD·Filed 2000·Granted Jan 19, 2010·42 cites·8 claims
- 1088US6106737APlasma treatment method utilizing an amplitude-modulated high frequency powerTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·66 cites·4 claims
- 1188US5343047AIon implantation systemTOKYO ELECTRON LTD·Filed 1993·Granted Aug 30, 1994·62 cites·19 claims
- 1283US7153387B1Plasma processing apparatus and method of plasma processingTOKYO ELECTRON LTD·Filed 2000·Granted Dec 26, 2006·19 cites·38 claims
- 1380US6423242B1Etching methodTOKYO ELECTRON LTD·Filed 1999·Granted Jul 23, 2002·58 cites·5 claims
- 1477US7047095B2Process control system and process control methodTOKYO ELECTRON LTD·Filed 2003·Granted May 16, 2006·22 cites·19 claims
- 1574US11018046B2Substrate processing apparatus including edge ringSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 25, 2021·1 cites·13 claims
- 1670US7877161B2Method and system for performing a chemical oxide removal processTOKYO ELECTRON LTD·Filed 2003·Granted Jan 25, 2011·13 cites·49 claims
- 1770US5067798ALaser beam scanning systemTOKYO ELECTRON LTD·Filed 1989·Granted Nov 26, 1991·24 cites·9 claims
- 1868US8175736B2Method and system for performing a chemical oxide removal processTOMOYASU MASAYUKI·Filed 2010·Granted May 8, 2012·3 cites·52 claims
- 1965US7289866B2Plasma processing method and apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Oct 30, 2007·2 cites·10 claims
- 2061US11837496B2Substrate processing apparatus and method of processing a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Dec 5, 2023·0 cites·5 claims
- 2152US11817298B2Focus ring, chuck assembly for securing a substrate and plasma treatment apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Nov 14, 2023·0 cites·17 claims
- 2240US11450545B2Capacitively-coupled plasma substrate processing apparatus including a focus ring and a substrate processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Sep 20, 2022·0 cites·14 claims
- 2340US9799561B2Method for fabricating a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Oct 24, 2017·0 cites·19 claims
- 2439US7172675B2Observation window of plasma processing apparatus and plasma processing apparatus using the sameTOKYO ELECTRON LTD·Filed 2003·Granted Feb 6, 2007·0 cites·2 claims
- 2536US9859175B2Substrate processing system, method of managing the same and method of manufacturing semiconductor device with the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jan 2, 2018·0 cites·20 claims
- 2635US2017032987A1Dry etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 2732US2017047200A1Plasma Processing ApparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Masayuki Tomoyasu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →