Inventor · disambiguated record
Marie-Claire Van Lare
Also filed as: VAN LARE MARIE-CLAIRE
4 granted patents·8 pending applications·2 citations·filing 2017–2025
58Inventor score
Files withASML NETHERLANDS BV12
Top patents by PatentIndex Score
12 records- 0184US12321101B2Method for applying a deposition model in a semiconductor manufacturing processASML NETHERLANDS BV·Filed 2020·Granted Jun 3, 2025·2 cites·20 claims
- 0278US2025391010A1System and method for generating predictive images for wafer inspection using machine learningASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0374US2024219843A1Imaging via zeroth order suppressionASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0467US12386268B2Method for calibrating simulation process based on defect-based process windowASML NETHERLANDS BV·Filed 2021·Granted Aug 12, 2025·0 cites·20 claims
- 0562US2024210336A1Patterning device defect detection systems and methodsASML NETHERLANDS BV·Filed 2024·Application pending·0 cites
- 0661US11892776B2Imaging via zeroth order suppressionASML NETHERLANDS BV·Filed 2019·Granted Feb 6, 2024·0 cites·20 claims
- 0755US2025021018A1Systems and methods for reducing pattern shift in a lithographic apparatusASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0854US2025147435A1Method for focus metrology and associated apparatusesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0949US12197120B2Patterning device and method of use thereofASML NETHERLANDS BV·Filed 2020·Granted Jan 14, 2025·0 cites·22 claims
- 1040US2021079519A1Method and apparatus for forming a patterned layer of materialASML NETHERLANDS BV·Filed 2019·Application pending·0 cites
- 1139US2022214610A1A patterning deviceASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1235US2019129301A1Resist compositionsASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Marie-Claire Van Lare files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →