Inventor · disambiguated record
Manoj Vellaikal
Also filed as: VELLAIKAL MANOJ
19 granted patents·11 pending applications·473 citations·filing 1999–2024
94Inventor score
Top patents by PatentIndex Score
30 records- 0196US7628897B2Reactive ion etching for semiconductor device feature topography modificationAPPLIED MATERIALS INC·Filed 2003·Granted Dec 8, 2009·230 cites·28 claims
- 0293US7205240B2HDP-CVD multistep gapfill processAPPLIED MATERIALS INC·Filed 2003·Granted Apr 17, 2007·114 cites·36 claims
- 0391US9870921B2Cleaning methodAPPLIED MATERIALS INC·Filed 2016·Granted Jan 16, 2018·6 cites·20 claims
- 0491US7745350B2Impurity control in HDP-CVD DEP/ETCH/DEP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jun 29, 2010·13 cites·12 claims
- 0582US10199221B2Cleaning methodAPPLIED MATERIALS INC·Filed 2017·Granted Feb 5, 2019·2 cites·20 claims
- 0680US7867921B2Reduction of etch-rate drift in HDP processesAPPLIED MATERIALS INC·Filed 2008·Granted Jan 11, 2011·7 cites·19 claims
- 0778US7329586B2Gapfill using deposition-etch sequenceAPPLIED MATERIALS INC·Filed 2005·Granted Feb 12, 2008·6 cites·19 claims
- 0877US6413871B2Nitrogen treatment of polished halogen-doped silicon glassAPPLIED MATERIALS INC·Filed 1999·Granted Jul 2, 2002·40 cites·18 claims
- 0976US11087979B2Cleaning methodAPPLIED MATERIALS INC·Filed 2019·Granted Aug 10, 2021·1 cites·20 claims
- 1076US6410457B1Method for improving barrier layer adhesion to HDP-FSG thin filmsAPPLIED MATERIALS INC·Filed 2000·Granted Jun 25, 2002·17 cites·24 claims
- 1175US7659184B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2008·Granted Feb 9, 2010·3 cites·13 claims
- 1273US8642128B2Enhanced scavenging of residual fluorine radicals using silicon coating on process chamber wallsCHOI DONGWON·Filed 2010·Granted Feb 4, 2014·4 cites·17 claims
- 1370US7229931B2Oxygen plasma treatment for enhanced HDP-CVD gapfillAPPLIED MATERIALS INC·Filed 2004·Granted Jun 12, 2007·16 cites·20 claims
- 1470US6803325B2Apparatus for improving barrier layer adhesion to HDP-FSG thin filmsAPPLIED MATERIALS INC·Filed 2002·Granted Oct 12, 2004·12 cites·7 claims
- 1567US8927400B2Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersAPPLIED MATERIALS INC·Filed 2014·Granted Jan 6, 2015·1 cites·11 claims
- 1667US8003500B2Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechuckingAPPLIED MATERIALS INC·Filed 2009·Granted Aug 23, 2011·1 cites·7 claims
- 1759US12356705B2Electrical contact cavity structure and methods of forming the sameAPPLIED MATERIALS INC·Filed 2024·Granted Jul 8, 2025·0 cites·26 claims
- 1858US2014000686A1Film stack and process design for back passivated solar cells and laser opening of contactAPPLIED MATERIALS INC·Filed 2013·Application pending·0 cites
- 1955US2023307506A1Low temperature n-type contact epi formationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 2054US2008153271A1Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2151US2013273262A1Static deposition profile modulation for linear plasma sourceVELLAIKAL MANOJ·Filed 2012·Application pending·0 cites
- 2245US2010173484A1Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafersFOAD MAJEED A·Filed 2010·Application pending·0 cites
- 2345US2022375751A1Integrated epitaxy and preclean systemAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2445US2008299775A1Gapfill extension of hdp-cvd integrated process modulation sio2 processAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2541US8492177B2Methods for quantitative measurement of a plasma immersion processYAO DAPING·Filed 2011·Granted Jul 23, 2013·0 cites·18 claims
- 2637US8501605B2Methods and apparatus for conformal dopingSANTHANAM KARTIK·Filed 2011·Granted Aug 6, 2013·0 cites·18 claims
- 2735US2010297347A1Substrate support having side gas outlets and methodsAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 2832US2012302048A1Pre or post-implant plasma treatment for plasma immersed ion implantation processSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 2931US2012289036A1Surface dose retention of dopants by pre-amorphization and post implant passivation treatmentsSANTHANAM KARTIK·Filed 2012·Application pending·0 cites
- 3031US2013095643A1Methods for implanting dopant species in a substrateSANTHANAM KARTIK·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →