Inventor · disambiguated record
Martin Von Hodenberg
Also filed as: VON HODENBERG MARTIN
9 granted patents·1 pending application·16 citations·filing 2013–2017
82Inventor score
Files withZEISS CARL SMT GMBH10
Top patents by PatentIndex Score
10 records- 0192US9170497B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2013·Granted Oct 27, 2015·7 cites·21 claims
- 0279US9134613B2Illumination and displacement device for a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Sep 15, 2015·3 cites·25 claims
- 0378US10303063B2Projection exposure apparatus with at least one manipulatorZEISS CARL SMT GMBH·Filed 2017·Granted May 28, 2019·1 cites·20 claims
- 0474US10018907B2Method of operating a microlithographic projection apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Jul 10, 2018·2 cites·18 claims
- 0573US9817316B2Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Nov 14, 2017·1 cites·34 claims
- 0666US9348234B2Microlithographic apparatusZEISS CARL SMT GMBH·Filed 2015·Granted May 24, 2016·1 cites·22 claims
- 0759US9372411B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2014·Granted Jun 21, 2016·1 cites·34 claims
- 0855US2018136565A1Projection exposure method and projection exposure apparatus for microlithographyZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 0950US9829800B2System correction from long timescalesZEISS CARL SMT GMBH·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
- 1042US9606446B2Reflective optical element for EUV lithography and method of manufacturing a reflective optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Mar 28, 2017·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →