Inventor · disambiguated record
Matthew Scott Weimer
Also filed as: WEIMER MATTHEW S · WEIMER MATTHEW SCOTT
6 granted patents·6 pending applications·25 citations·filing 2014–2025
77Inventor score
Top patents by PatentIndex Score
12 records- 0196US12359311B2Conformal deposition of silicon carbide films using heterogeneous precursor interactionLAM RES CORP·Filed 2023·Granted Jul 15, 2025·4 cites·15 claims
- 0294US10840087B2Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride filmsLAM RES CORP·Filed 2018·Granted Nov 17, 2020·15 cites·19 claims
- 0386US12334332B2Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursorsLAM RES CORP·Filed 2018·Granted Jun 17, 2025·4 cites·18 claims
- 0476US11837441B2Depositing a carbon hardmask by high power pulsed low frequency RFLAM RES CORP·Filed 2020·Granted Dec 5, 2023·1 cites·25 claims
- 0575US9382618B2Oxygen-free atomic layer deposition of indium sulfideUCHICAGO ARGONNE LLC·Filed 2014·Granted Jul 5, 2016·1 cites·14 claims
- 0665US2024234091A9Depositing a carbon hardmask by high power pulsed low frequency rfLAM RES CORP·Filed 2023·Application pending·0 cites
- 0764US2025149328A1Remote plasma based deposition of silicon carbide films using silicon-containing and carbon-containing precursorsLAM RES CORP·Filed 2025·Application pending·0 cites
- 0852US2018347035A1Conformal deposition of silicon carbide films using heterogeneous precursor interactionLAM RES CORP·Filed 2018·Application pending·0 cites
- 0952US2024282570A1Radical-activated carbon film depositionLAM RES CORP·Filed 2022·Application pending·0 cites
- 1045US12435412B2High density, modulus, and hardness amorphous carbon films at low pressureLAM RES CORP·Filed 2020·Granted Oct 7, 2025·0 cites·27 claims
- 1145US2023360922A1Robust ashable hard maskLAM RES CORP·Filed 2021·Application pending·0 cites
- 1241US2023357921A1Deposition rate enhancement of amorphous carbon hard mask film by purely chemical meansLAM RES CORP·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →