Inventor · disambiguated record
Masataka Yahagi
Also filed as: YAHAGI MASATAKA
32 granted patents·9 pending applications·315 citations·filing 1998–2021
97Inventor score
Files withNIPPON MINING CO13JX NIPPON MINING & METALS CORP9IKISAWA MASAKATSU7TAKAMI HIDEO5NAKAMURA ATSUSHI2
Top patents by PatentIndex Score
41 records- 0195US8148245B2Method for producing a-IGZO oxide thin filmIKISAWA MASAKATSU·Filed 2008·Granted Apr 3, 2012·60 cites·10 claims
- 0293US7699965B2Zinc oxide-based transparent conductor and sputtering target for forming the transparent conductorNIPPON MINING CO·Filed 2007·Granted Apr 20, 2010·20 cites·18 claims
- 0392US7718095B2Sputtering target, thin film for optical information recording medium and process for producing the sameNIPPON MINING CO·Filed 2008·Granted May 18, 2010·10 cites·9 claims
- 0491US8728358B2Sintered compact, amorphous film and crystalline film of composite oxide, and process for producing the filmsIKISAWA MASAKATSU·Filed 2012·Granted May 20, 2014·7 cites·3 claims
- 0590US7484546B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2006·Granted Feb 3, 2009·9 cites·17 claims
- 0689US7789948B2Hydrogen separation membrane, sputtering target for forming said hydrogen separation membrane, and manufacturing method thereofNIPPON MINING CO·Filed 2005·Granted Sep 7, 2010·9 cites·17 claims
- 0787US7635440B2Sputtering target, thin film for optical information recording medium and process for producing the sameNIPPON MINING CO·Filed 2004·Granted Dec 22, 2009·22 cites·20 claims
- 0883US8758497B2Sputtering target of sintered Ti—Nb based oxide, thin film of Ti—Nb based oxide, and method of producing the thin filmTAKAMI HIDEO·Filed 2010·Granted Jun 24, 2014·4 cites·2 claims
- 0982US7897068B2Sputtering target, thin film for optical information recording medium and process for producing the sameJX NIPPON MINING & METALS CORP·Filed 2010·Granted Mar 1, 2011·4 cites·16 claims
- 1082US7156964B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2002·Granted Jan 2, 2007·20 cites·2 claims
- 1181US8277694B2Sintered compact of composite oxide, amorphous film of composite oxide, process for producing said film, crystalline film of composite oxide and process for producing said filmIKISAWA MASAKATSU·Filed 2008·Granted Oct 2, 2012·6 cites·10 claims
- 1281US7892457B2Sputtering target, thin film for optical information recording medium and process for producing the sameJX NIPPON MINING & METALS CORP·Filed 2010·Granted Feb 22, 2011·1 cites·12 claims
- 1380US7279211B2Sputtering target containing zinc sulfide as major component, optical recording medium on which phase change optical disk protective film containing zinc sulfide as major component is formed by using the target, and method for manufacturing the sputtering targetNIPPON MINING CO·Filed 2002·Granted Oct 9, 2007·19 cites·19 claims
- 1480US7217310B2Metal powder for powder metallurgy and iron-based sintered compactNIPPON MINING CO·Filed 2003·Granted May 15, 2007·24 cites·3 claims
- 1579US7666245B2Metallic powder for powder metallurgy whose main component is iron and iron-based sintered bodyNIPPON MINING CO·Filed 2005·Granted Feb 23, 2010·3 cites·6 claims
- 1677US11651790B2Thin film comprising titanium oxide, and method of producing thin film comprising titanium oxideJX NIPPON MINING & METALS CORP·Filed 2021·Granted May 16, 2023·0 cites·6 claims
- 1777US7727639B2Iron-based sintered compact and method for production thereofNIPPON MINING CO·Filed 2008·Granted Jun 1, 2010·3 cites·3 claims
- 1876US8882975B2Sb-Te base alloy sinter sputtering targetYAHAGI MASATAKA·Filed 2007·Granted Nov 11, 2014·5 cites·12 claims
- 1976US7347969B2Iron-based sintered compact and method for production thereofNIPPON MINING CO·Filed 2003·Granted Mar 25, 2008·13 cites·8 claims
- 2075US8007693B2Zinc oxide based transparent electric conductor, sputtering target for forming of the conductor and process for producing the targetJX NIPPON MINING & METALS CORP·Filed 2007·Granted Aug 30, 2011·4 cites·18 claims
- 2174US8252206B2Amorphous film of composite oxide, crystalline film of composite oxide, method of producing said films and sintered compact of composite oxideIKISAWA MASAKATSU·Filed 2008·Granted Aug 28, 2012·4 cites·5 claims
- 2272US8501052B2Thin film comprising titanium oxide as main component and sintered compact sputtering target comprising titanium oxide as main componentTAKAMI HIDEO·Filed 2010·Granted Aug 6, 2013·2 cites·9 claims
- 2372US8430978B2Sputtering target and method for production thereofINOE AKIHISA·Filed 2004·Granted Apr 30, 2013·8 cites·17 claims
- 2472US7691172B2Metallic powder for powder metallurgy whose main component is iron and iron-based sintered bodyNIPPON MINING CO·Filed 2005·Granted Apr 6, 2010·3 cites·13 claims
- 2572US7344660B2Sputtering target and process for producing the sameNIPPON MINING CO·Filed 2004·Granted Mar 18, 2008·10 cites·20 claims
- 2671US5939043AProcess for preparing Lix Mn2 O4 intercalation compoundsGA TEK INC·Filed 1998·Granted Aug 17, 1999·45 cites·15 claims
- 2771US2018085828A1Sintered compact target and method of producing sintered compactJX NIPPON MINING & METALS CORP·Filed 2017·Application pending·0 cites
- 2864US2012196076A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 2964US2012192763A1Thin Film Comprising Titanium Oxide as Main Component and Sintered Compact Sputtering Target Comprising Titanium Oxide as Main ComponentTAKAMI HIDEO·Filed 2012·Application pending·0 cites
- 3062US2011017590A1Sintered Compact Target and Method of Producing Sintered CompactJX NIPPON MINING & METALS CORP·Filed 2008·Application pending·0 cites
- 3160US2015162045A1Thin Film Comprising Titanium Oxide, and Method of Producing Thin Film Comprising Titanium OxideJX NIPPON MINING & METALS CORP·Filed 2015·Application pending·0 cites
- 3260US2021237153A1Sintered compact target and method of producing sintered compactJX NIPPON MINING & METALS CORP·Filed 2021·Application pending·0 cites
- 3359US2010276276A1Thin Film Mainly Comprising Titanium Oxide, Sintered Sputtering Target Suitable for Producing Thin Film Mainly Comprising Titanium Oxide, and Method of Producing Thin Film Mainly Comprising Titanium OxideNIPPON MINING AND METALS CO LT·Filed 2008·Application pending·0 cites
- 3458US8652399B2Sputtering target for producing metallic glass membrane and manufacturing method thereofNAKAMURA ATSUSHI·Filed 2010·Granted Feb 18, 2014·0 cites·4 claims
- 3557US9028726B2Oxide sintered compact for producing transparent conductive filmIKISAWA MASAKATSU·Filed 2009·Granted May 12, 2015·0 cites·8 claims
- 3657US8663439B2Sputtering target for producing metallic glass membrane and manufacturing method thereofNAKAMURA ATSUSHI·Filed 2005·Granted Mar 4, 2014·0 cites·2 claims
- 3756US2014023868A1Sputtering Target of Sintered Ti-Nb Based Oxide, Thin Film of Ti-Nb Based Oxide, and Method of Producing The Thin FilmJX NIPPON MINING & METALS CORP·Filed 2013·Application pending·0 cites
- 3853US12444686B2Semiconductor deviceUNIV TOHOKU·Filed 2020·Granted Oct 14, 2025·0 cites·8 claims
- 3950US8877021B2Chromic oxide powder for sputtering target, and sputtering target manufactured from such chromic oxide powderTAKAMI HIDEO·Filed 2006·Granted Nov 4, 2014·0 cites·5 claims
- 4048US9663405B2Oxide sintered compact, its production method, and raw material powder for producing oxide sintered compactIKISAWA MASAKATSU·Filed 2010·Granted May 30, 2017·0 cites·3 claims
- 4148US2011163277A1Oxide sintered compact for preparing transparent conductive filmIKISAWA MASAKATSU·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →