Inventor · disambiguated record
Masaru Zaitsu
Also filed as: ZAITSU MASARU
13 granted patents·1 pending application·3,087 citations·filing 1993–2020
95Inventor score
Top patents by PatentIndex Score
14 records- 0199US9627221B1Continuous process incorporating atomic layer etchingASM IP HOLDING BV·Filed 2015·Granted Apr 18, 2017·507 cites·17 claims
- 0299US9455138B1Method for forming dielectric film in trenches by PEALD using H-containing gasASM IP HOLDING BV·Filed 2015·Granted Sep 27, 2016·587 cites·20 claims
- 0398US10283353B2Method of reforming insulating film deposited on substrate with recess patternASM IP HOLDING BV·Filed 2017·Granted May 7, 2019·416 cites·21 claims
- 0498US9793135B1Method of cyclic dry etching using etchant filmASM IP HOLDING BV·Filed 2016·Granted Oct 17, 2017·475 cites·18 claims
- 0598US9735024B2Method of atomic layer etching using functional group-containing fluorocarbonASM IP HOLDING BV·Filed 2015·Granted Aug 15, 2017·489 cites·14 claims
- 0697US10435790B2Method of subatmospheric plasma-enhanced ALD using capacitively coupled electrodes with narrow gapASM IP HOLDING BV·Filed 2016·Granted Oct 8, 2019·397 cites·19 claims
- 0794US10504742B2Method of atomic layer etching using hydrogen plasmaASM IP HOLDING BV·Filed 2018·Granted Dec 10, 2019·9 cites·19 claims
- 0893US9818601B1Substrate processing apparatus and method of processing substrateASM IP HOLDING BV·Filed 2016·Granted Nov 14, 2017·12 cites·7 claims
- 0992US5414879AShower apparatusTOTO LTD·Filed 1993·Granted May 16, 1995·133 cites·18 claims
- 1087US10847365B2Method of forming conformal silicon carbide film by cyclic CVDASM IP HOLDING BV·Filed 2018·Granted Nov 24, 2020·4 cites·14 claims
- 1183US5428850AShower apparatusTOTO LTD·Filed 1994·Granted Jul 4, 1995·56 cites·10 claims
- 1281US11637011B2Method of topology-selective film formation of silicon oxideASM IP HOLDING BV·Filed 2020·Granted Apr 25, 2023·1 cites·12 claims
- 1380US11127589B2Method of topology-selective film formation of silicon oxideASM IP HOLDING BV·Filed 2020·Granted Sep 21, 2021·1 cites·13 claims
- 1442US2020111669A1Method for depositing oxide film by peald using nitrogenASM IP HOLDING BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →