Inventor · disambiguated record
Meitoku Aibara
Also filed as: AIBARA MEITOKU
13 granted patents·3 pending applications·43 citations·filing 2013–2022
89Inventor score
Technology areasH10P
Files withTOKYO ELECTRON LTD16
Top patents by PatentIndex Score
16 records- 0196US11367630B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jun 21, 2022·3 cites·20 claims
- 0294US9953826B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2014·Granted Apr 24, 2018·15 cites·18 claims
- 0391US10272478B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·7 cites·24 claims
- 0489US10734255B2Substrate cleaning method, substrate cleaning system and memory mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 4, 2020·6 cites·20 claims
- 0583US9818598B2Substrate cleaning method and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Nov 14, 2017·4 cites·10 claims
- 0682US10811283B2Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·2 cites·18 claims
- 0781US11551941B2Substrate cleaning methodTOKYO ELECTRON LTD·Filed 2020·Granted Jan 10, 2023·1 cites·2 claims
- 0878US10121646B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Nov 6, 2018·2 cites·7 claims
- 0974US2022277968A1Substrate cleaning method, substrate cleaning system, and memory mediumTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1073US10792711B2Substrate processing system, substrate cleaning method, and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 6, 2020·1 cites·12 claims
- 1169US9870914B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 16, 2018·1 cites·7 claims
- 1261US9768039B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Sep 19, 2017·1 cites·9 claims
- 1351US2018330971A1Substrate cleaning apparatus and substrate cleaning methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1449US11600499B2Substrate cleaning method, substrate cleaning system, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Granted Mar 7, 2023·0 cites·8 claims
- 1545US9764345B2Substrate processing apparatus and nozzle cleaning methodTOKYO ELECTRON LTD·Filed 2014·Granted Sep 19, 2017·0 cites·13 claims
- 1643US2014373877A1Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →