Inventor · disambiguated record
Megumi Takahashi
Also filed as: TAKAHASHI MEGUMI
16 granted patents·2 pending applications·11 citations·filing 2013–2022
86Inventor score
Files withMERCK PATENT GMBH6AROMA BIT INC4AZ ELECTRONIC MAT LUXEMBOURG SARL2AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1AZ ELECTRONIC MAT MFG (JAPAN) KK1
Top patents by PatentIndex Score
18 records- 0181US10606173B2Photosensitive siloxane compositionAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Mar 31, 2020·2 cites·20 claims
- 0281US10379042B2Fourier transform-type spectroscopic deviceUNIV TOKYO·Filed 2016·Granted Aug 13, 2019·5 cites·8 claims
- 0373US9701834B2Blend of acrylonitrile/styrene copolymer with butadiene particlesFUJI XEROX CO LTD·Filed 2015·Granted Jul 11, 2017·1 cites·9 claims
- 0473US9164386B2Negative-working photosensitive siloxane compositionAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2013·Granted Oct 20, 2015·2 cites·12 claims
- 0572US11959899B2Method for preparing original data of odor imageAROMA BIT INC·Filed 2022·Granted Apr 16, 2024·0 cites·16 claims
- 0668US10409161B2Positive type photosensitive siloxane compositionAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Sep 10, 2019·1 cites·17 claims
- 0766US11408872B2Method for preparing original data of odor imageAROMA BIT INC·Filed 2019·Granted Aug 9, 2022·0 cites·13 claims
- 0855US11892436B2Odor exploration method and odor exploration systemAROMA BIT INC·Filed 2021·Granted Feb 6, 2024·0 cites·12 claims
- 0955US2020201179A1Photosensitive siloxane compositionMERCK PERFORMANCE MAT MANUFACTURING G K·Filed 2020·Application pending·0 cites
- 1054US11846615B2Data structure and composite data generation deviceAROMA BIT INC·Filed 2019·Granted Dec 19, 2023·0 cites·20 claims
- 1153US9505888B2Composite of metal oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereofAZ ELECTRONIC MAT MFG (JAPAN) KK·Filed 2013·Granted Nov 29, 2016·0 cites·9 claims
- 1249US2020225583A1Positive type photosensitive siloxane composition and cured film using the sameMERCK PATENT GMBH·Filed 2018·Application pending·0 cites
- 1346US11899365B2Photosensitive siloxane composition and pattern forming method using the sameMERCK PATENT GMBH·Filed 2018·Granted Feb 13, 2024·0 cites·20 claims
- 1446US9684240B2Negative-working photosensitive siloxane compositionAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2013·Granted Jun 20, 2017·0 cites·16 claims
- 1545US11392032B2Positive type photosensitive siloxane composition and cured film formed by using the sameMERCK PATENT GMBH·Filed 2018·Granted Jul 19, 2022·0 cites·9 claims
- 1644US11860537B2Positive type photosensitive siloxane composition and cured film formed by using the sameMERCK PATENT GMBH·Filed 2018·Granted Jan 2, 2024·0 cites·20 claims
- 1743US11644754B2Photosensitive siloxane composition and cured film formed by using the sameMERCK PATENT GMBH·Filed 2018·Granted May 9, 2023·0 cites·19 claims
- 1840US11866553B2Polysiloxane, composition comprising the same and cured film using the sameMERCK PATENT GMBH·Filed 2018·Granted Jan 9, 2024·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →