Inventor · disambiguated record
Michael Carcasi
Also filed as: CARCASI MICHAEL · CARCASI MICHAEL A · CARCASI MICHAEL ANDREW
44 granted patents·19 pending applications·591 citations·filing 2005–2024
97Inventor score
Top patents by PatentIndex Score
63 records- 0199US9613801B2Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·464 cites·18 claims
- 0297US9519227B2Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Dec 13, 2016·12 cites·20 claims
- 0396US9746774B2Mitigation of EUV shot noise replicating into acid shot noise in photo-sensitized chemically-amplified resist (PS-CAR)TOKYO ELECTRON LTD·Filed 2015·Granted Aug 29, 2017·10 cites·22 claims
- 0494US9618848B2Methods and techniques to use with photosensitized chemically amplified resist chemicals and processesTOKYO ELECTRON LTD·Filed 2015·Granted Apr 11, 2017·12 cites·10 claims
- 0593US10809620B1Systems and methods for developer drain line monitoringTOKYO ELECTRON LTD·Filed 2019·Granted Oct 20, 2020·8 cites·18 claims
- 0692US10048594B2Photo-sensitized chemically amplified resist (PS-CAR) model calibrationTOKYO ELECTRON LTD·Filed 2016·Granted Aug 14, 2018·5 cites·15 claims
- 0792US10020195B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·8 cites·18 claims
- 0892US8980538B2Chemi-epitaxy in directed self-assembly applications using photo-decomposable agentsTOKYO ELECTRON LTD·Filed 2013·Granted Mar 17, 2015·8 cites·21 claims
- 0991US12123778B2Thermal imaging sensor for integration into track systemTOKYO ELECTRON LTD·Filed 2021·Granted Oct 22, 2024·2 cites·13 claims
- 1091US8024676B2Multi-pitch scatterometry targetsTOKYO ELECTRON LTD·Filed 2009·Granted Sep 20, 2011·15 cites·21 claims
- 1190US10551743B2Critical dimension control by use of photo-sensitized chemicals or photo-sensitized chemically amplified resistTOKYO ELECTRON LTD·Filed 2017·Granted Feb 4, 2020·4 cites·26 claims
- 1289US10522428B2Critical dimension control by use of a photo agentTOKYO ELECTRON LTD·Filed 2018·Granted Dec 31, 2019·4 cites·21 claims
- 1388US10096528B2Critical dimension control by use of a photo agentTOKYO ELECTRON LTD·Filed 2017·Granted Oct 9, 2018·4 cites·20 claims
- 1486US11738363B2Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2021·Granted Aug 29, 2023·1 cites·19 claims
- 1586US11163236B2Method and process for stochastic driven detectivity healingTOKYO ELECTRON LTD·Filed 2020·Granted Nov 2, 2021·2 cites·24 claims
- 1685US10429745B2Photo-sensitized chemically amplified resist (PS-CAR) simulationTOKYO ELECTRON LTD·Filed 2016·Granted Oct 1, 2019·3 cites·24 claims
- 1782US10048587B2Method and apparatus for increased recirculation and filtration in a photoresist dispense system using a liquid empty reservoirTOKYO ELECTRON LTD·Filed 2015·Granted Aug 14, 2018·3 cites·6 claims
- 1880US12226796B2Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2023·Granted Feb 18, 2025·0 cites·20 claims
- 1979US2025196175A1Bath systems and methods thereofTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2078US9085045B2Method and system for controlling a spike anneal processTOKYO ELECTRON LTD·Filed 2012·Granted Jul 21, 2015·4 cites·19 claims
- 2176US7479463B2Method for heating a chemically amplified resist layer carried on a rotating substrateTOKYO ELECTRON LTD·Filed 2007·Granted Jan 20, 2009·5 cites·10 claims
- 2276US7435692B2Gas jet reduction of iso-dense field thickness bias for gapfill processTOKYO ELECTRON LTD·Filed 2005·Granted Oct 14, 2008·5 cites·15 claims
- 2374US9612534B2Exposure dose homogenization through rotation, translation, and variable processing conditionsTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·1 cites·20 claims
- 2471US8338086B2Method of slimming radiation-sensitive material lines in lithographic applicationsCARCASI MICHAEL A·Filed 2010·Granted Dec 25, 2012·3 cites·18 claims
- 2570US9786523B2Method and apparatus for substrate rinsing and dryingTOKYO ELECTRON LTD·Filed 2014·Granted Oct 10, 2017·2 cites·17 claims
- 2669US7671412B2Method and device for controlling temperature of a substrate using an internal temperature control deviceTOKYO ELECTRON LTD·Filed 2007·Granted Mar 2, 2010·4 cites·43 claims
- 2767US11168978B2Hardware improvements and methods for the analysis of a spinning reflective substratesTOKYO ELECTRON LTD·Filed 2020·Granted Nov 9, 2021·0 cites·20 claims
- 2865US8435728B2Method of slimming radiation-sensitive material lines in lithographic applicationsCARCASI MICHAEL A·Filed 2011·Granted May 7, 2013·2 cites·18 claims
- 2965US2025076757A1Treatments for metal oxide photoresist filmsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3064US12488452B2Wafer bath imagingTOKYO ELECTRON LTD·Filed 2021·Granted Dec 2, 2025·0 cites·18 claims
- 3162US11624607B2Hardware improvements and methods for the analysis of a spinning reflective substratesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 11, 2023·0 cites·21 claims
- 3259US2025118555A1Selective passivation of photoresistsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3359US2020348596A1Method and apparatus for multiple recirculation and filtration cycles per dispense in a photoresist dispense systemTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3458US11998945B2Methods and systems to monitor, control, and synchronize dispense systemsTOKYO ELECTRON LTD·Filed 2020·Granted Jun 4, 2024·0 cites·19 claims
- 3558US11262657B2System and method of planarization control using a cross-linkable materialTOKYO ELECTRON LTD·Filed 2019·Granted Mar 1, 2022·0 cites·37 claims
- 3658US2024420974A1Systems and methods for determining a localized fluid velocity of a processing liquid dispensed on a spinning substrate by tracking movement of an induced perturbation in the processing liquid across the spinning substrateTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3757US11276157B2Systems and methods for automated video analysis detection techniques for substrate processTOKYO ELECTRON LTD·Filed 2020·Granted Mar 15, 2022·0 cites·19 claims
- 3857US2025102738A1Surface relief grating performance and cost enhancements for augmented reality applicationsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3957US2024128212A1Surface energy modification in hybrid bondingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4056US11637031B2Systems and methods for spin process video analysis during substrate processingTOKYO ELECTRON LTD·Filed 2020·Granted Apr 25, 2023·0 cites·19 claims
- 4155US11339733B2Systems and methods to monitor particulate accumulation for bake chamber cleaningTOKYO ELECTRON LTD·Filed 2019·Granted May 24, 2022·0 cites·20 claims
- 4255US2025105066A1Systems and methods that use infrared (ir) spectroscopy to monitor process chemicals utilized in a semiconductor processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 4354US12165870B2Chemical amplification methods and techniques for developable bottom anti-reflective coatings and dyed implant resistsTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2024·0 cites·22 claims
- 4454US11474028B2Systems and methods for monitoring one or more characteristics of a substrateTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·0 cites·25 claims
- 4554US2025364335A1Systems and methods for wafer processing with sensor technologiesTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 4654US2014273534A1Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 4753US12424467B2Systems and methods for determining a localized fluid velocity on a spinning substrate by tracking movement of a tracer across the spinning substrateTOKYO ELECTRON LTD·Filed 2023·Granted Sep 23, 2025·0 cites·14 claims
- 4853US11703459B2System and method to calibrate a plurality of wafer inspection system (WIS) modulesTOKYO ELECTRON LTD·Filed 2020·Granted Jul 18, 2023·0 cites·23 claims
- 4953US2024421009A1Systems and methods for determining a fluid height and/or a fluid velocity on a spinning substrateTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 5052US2023259030A1Providing a barrier layer for photoresist processingTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
Showing the top 50 of 63 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →