Inventor · disambiguated record
Michel Fransois Hubert Klaassen
Also filed as: KLAASSEN MICHEL F H · KLAASSEN MICHEL FRANSOIS H · KLAASSEN MICHEL FRANSOIS HUBER · KLAASSEN MICHEL FRANSOIS HUBERT
6 granted patents·9 pending applications·30 citations·filing 2004–2009
76Inventor score
Files withASML NETHERLANDS BV12KLAASSEN MICHEL FRANSOIS HUBERT1VAN DE KERKHOF MARCUS ADRIANUS1ZEISS CARL SMT AG1
Top patents by PatentIndex Score
15 records- 0194US7375799B2Lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·24 cites·15 claims
- 0267US7352443B2Radially polarized light in lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Apr 1, 2008·2 cites·33 claims
- 0355US8704199B2Alignment of collector device in lithographic apparatusKLAASSEN MICHEL FRANSOIS HUBERT·Filed 2009·Granted Apr 22, 2014·2 cites·19 claims
- 0452US2008030708A1Device manufacturing methodASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 0550US2006203221A1Lithographic apparatus and a method for determining a polarization propertyASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 0648US7952685B2Illuminator for a lithographic apparatus and methodZEISS CARL SMT AG·Filed 2007·Granted May 31, 2011·0 cites·24 claims
- 0748US7538875B2Lithographic apparatus and methods for use thereofASML NETHERLANDS BV·Filed 2004·Granted May 26, 2009·2 cites·12 claims
- 0845US2011122389A1Radiation source, lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 0941US2005007573A1Device manufacturing methodASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 1041US2006098182A1Radially polarized light in lithographic apparatusASML NETHERLANDS BV·Filed 2004·Application pending·0 cites
- 1140US7872731B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jan 18, 2011·0 cites·21 claims
- 1239US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 1339US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1439US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1538US2008062385A1Method of monitoring polarization performance, polarization measurement assembly, lithographic apparatus and computer program product using the sameASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →