Inventor · disambiguated record
Michael Kubis
Also filed as: KUBIS MICHAEL · KUBIS MICHAEL E
33 granted patents·3 pending applications·266 citations·filing 1998–2022
97Inventor score
Files withASML NETHERLANDS BV23TEMPEL STEEL CO3CRAMER HUGO AUGUSTINUS JOSEPH1DEN BOEF ARIE JEFFREY1DRESDEN EV INST FESTKOERPER1
Top patents by PatentIndex Score
36 records- 0199US9946167B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Apr 17, 2018·18 cites·18 claims
- 0298US11204239B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2020·Granted Dec 21, 2021·7 cites·36 claims
- 0397US11428521B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2021·Granted Aug 30, 2022·3 cites·29 claims
- 0497US10718604B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 21, 2020·6 cites·22 claims
- 0597US9140998B2Metrology method and inspection apparatus, lithographic system and device manufacturing methodSMILDE HENDRIK JAN HIDDE·Filed 2011·Granted Sep 22, 2015·24 cites·12 claims
- 0697US9081303B2Methods and scatterometers, lithographic systems, and lithographic processing cellsCRAMER HUGO AUGUSTINUS JOSEPH·Filed 2010·Granted Jul 14, 2015·73 cites·24 claims
- 0796US8994944B2Methods and scatterometers, lithographic systems, and lithographic processing cellsASML NETHERLANDS BV·Filed 2014·Granted Mar 31, 2015·24 cites·16 claims
- 0894US11385553B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2021·Granted Jul 12, 2022·2 cites·20 claims
- 0994US10386176B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2015·Granted Aug 20, 2019·5 cites·20 claims
- 1092US9291916B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsASML NETHERLANDS BV·Filed 2015·Granted Mar 22, 2016·5 cites·12 claims
- 1192US8976355B2Method of applying a pattern to a substrate, device manufacturing method and lithographic apparatus for use in such methodsVAN DER SANDEN STEFAN CORNELIS THEODORUS·Filed 2012·Granted Mar 10, 2015·19 cites·8 claims
- 1292US8908147B2Method and apparatus for determining an overlay errorDEN BOEF ARIE JEFFREY·Filed 2011·Granted Dec 9, 2014·9 cites·20 claims
- 1390US9158194B2Metrology method and apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2012·Granted Oct 13, 2015·9 cites·16 claims
- 1487US9069264B2Metrology method and apparatus, and device manufacturing methodWARNAAR PATRICK·Filed 2012·Granted Jun 30, 2015·8 cites·19 claims
- 1586US10996570B2Metrology method, patterning device, apparatus and computer programASML NETHERLANDS BV·Filed 2019·Granted May 4, 2021·2 cites·25 claims
- 1686US9454084B2Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement systemASML NETHERLANDS BV·Filed 2013·Granted Sep 27, 2016·5 cites·15 claims
- 1782US12429328B2Metrology method, target and substrateASML NETHERLANDS BV·Filed 2022·Granted Sep 30, 2025·0 cites·20 claims
- 1880US8887107B2Inspection method and apparatus and lithographic processing cellASML NETHERLANDS BV·Filed 2013·Granted Nov 11, 2014·2 cites·18 claims
- 1978US7520746B1Annealing furnace cooling and purging system and methodTEMPLE STEEL COMPANY·Filed 2007·Granted Apr 21, 2009·13 cites·30 claims
- 2076US11170072B2Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2016·Granted Nov 9, 2021·2 cites·21 claims
- 2176US8709687B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodVAN DER SCHAAR MAURITS·Filed 2012·Granted Apr 29, 2014·3 cites·6 claims
- 2270US7371296B1Annealing furnace cooling and purging system and methodTEMPEL STEEL CO·Filed 2004·Granted May 13, 2008·8 cites·20 claims
- 2369US11048174B2Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer programASML NETHERLANDS BV·Filed 2017·Granted Jun 29, 2021·1 cites·21 claims
- 2468US7435375B1Annealing furnace purging and oxidation system and methodTEMPEL STEEL CO·Filed 2007·Granted Oct 14, 2008·1 cites·20 claims
- 2561US7361238B1Annealing furnace purging and oxidation system and methodTEMPEL STEEL CO·Filed 2004·Granted Apr 22, 2008·4 cites·16 claims
- 2661US2022027437A1Method and apparatus for inspection and metrologyASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2757US9331022B2Substrate and patterning device for use in metrology, metrology method and device manufacturing methodASML NETHERLANDS BV·Filed 2014·Granted May 3, 2016·0 cites·5 claims
- 2855USRE49460EInspection method and apparatus and lithographic processing cellASML NETHERLANDS BV·Filed 2015·Granted Mar 14, 2023·0 cites·27 claims
- 2954USRE49199EInspection method and apparatus and lithographic processing cellASML NETHERLANDS BV·Filed 2015·Granted Sep 6, 2022·0 cites·27 claims
- 3054US10634490B2Determining edge roughness parametersASML NETHERLANDS BV·Filed 2018·Granted Apr 28, 2020·0 cites·18 claims
- 3150US2016179019A1Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2016·Application pending·0 cites
- 3247US7252913B2Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Aug 7, 2007·4 cites·14 claims
- 3346US9163935B2Device manufacturing method and associated lithographic apparatus, inspection apparatus, and lithographic processing cellASML NETHERLANDS BV·Filed 2012·Granted Oct 20, 2015·0 cites·20 claims
- 3444US10915689B2Method and apparatus to correct for patterning process errorASML NETHERLANDS BV·Filed 2016·Granted Feb 9, 2021·0 cites·21 claims
- 3542US2010040983A1Compensation of Process-Induced DisplacementQIMONDA AG·Filed 2008·Application pending·0 cites
- 3637US6352597B1Method for producing a magnetic alloy powderDRESDEN EV INST FESTKOERPER·Filed 1998·Granted Mar 5, 2002·9 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →