Inventor · disambiguated record
Michiko Nakaya
Also filed as: NAKAYA MICHIKO
15 granted patents·5 pending applications·44 citations·filing 2003–2025
89Inventor score
Top patents by PatentIndex Score
20 records- 0192US11804379B2Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Oct 31, 2023·2 cites·20 claims
- 0289US8251011B2Plasma processing apparatusYAMAZAWA YOHEI·Filed 2007·Granted Aug 28, 2012·13 cites·19 claims
- 0380US10651044B2Processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted May 12, 2020·2 cites·9 claims
- 0480US7527016B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2003·Granted May 5, 2009·16 cites·11 claims
- 0576US11699614B2Film deposition method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jul 11, 2023·2 cites·13 claims
- 0674US7902078B2Processing method and plasma etching methodTOKYO ELECTRON LTD·Filed 2007·Granted Mar 8, 2011·5 cites·12 claims
- 0773US12080521B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Sep 3, 2024·0 cites·19 claims
- 0872US8263499B2Plasma processing method and computer readable storage mediumHONDA MASANOBU·Filed 2009·Granted Sep 11, 2012·4 cites·21 claims
- 0970US12071687B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Aug 27, 2024·0 cites·17 claims
- 1062US11749508B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Sep 5, 2023·0 cites·16 claims
- 1160US11459655B2Plasma processing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Oct 4, 2022·0 cites·17 claims
- 1255US2025210371A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1351US10886138B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jan 5, 2021·0 cites·10 claims
- 1451US2007202701A1Plasma etching apparatus and methodTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1547US2022059361A1Etching method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1646US11728176B2Treatment methodTOKYO ELECTRON LTD·Filed 2019·Granted Aug 15, 2023·0 cites·11 claims
- 1745US2010144157A1Plasma etching apparatus and methodTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
- 1844US10504741B2Semiconductor manufacturing method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Dec 10, 2019·0 cites·9 claims
- 1938US8751196B2Abnormality detection system, abnormality detection method, recording medium, and substrate processing apparatusMORIYA TSUYOSHI·Filed 2010·Granted Jun 10, 2014·0 cites·15 claims
- 2036US2013056154A1Abnormality detecting unit and abnormality detecting methodNAKAYA MICHIKO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →