Inventor · disambiguated record
Mitsunori Ohata
Also filed as: OHATA MITSUNORI
32 granted patents·21 pending applications·124 citations·filing 2006–2025
95Inventor score
Top patents by PatentIndex Score
53 records- 0197US10217933B2Method for etching multilayer filmTOKYO ELECTRON LTD·Filed 2015·Granted Feb 26, 2019·40 cites·16 claims
- 0296US11798787B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Oct 24, 2023·4 cites·13 claims
- 0394US12183583B2Remote source pulsing with advanced pulse controlTOKYO ELECTRON LTD·Filed 2021·Granted Dec 31, 2024·2 cites·20 claims
- 0493US9076636B2Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the methodOHATA MITSUNORI·Filed 2011·Granted Jul 7, 2015·29 cites·5 claims
- 0591US11251021B2Mode-switching plasma systems and methods of operating thereofTOKYO ELECTRON LTD·Filed 2021·Granted Feb 15, 2022·2 cites·20 claims
- 0690US12394600B2Balanced RF resonant antenna systemTOKYO ELECTRON LTD·Filed 2023·Granted Aug 19, 2025·2 cites·20 claims
- 0790US7893387B2High rate method for stable temperature control of a substrateTOKYO ELECTRON LTD·Filed 2009·Granted Feb 22, 2011·26 cites·12 claims
- 0884US7557328B2High rate method for stable temperature control of a substrateTOKYO ELECTRON LTD·Filed 2006·Granted Jul 7, 2009·17 cites·19 claims
- 0983US12374531B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 29, 2025·1 cites·16 claims
- 1076US2025079178A1Remote source pulsing with advanced pulse controlTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1175US2025292996A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1274US12154761B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Nov 26, 2024·0 cites·17 claims
- 1374US2025293005A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1473US12394629B2Plasma processing methods using low frequency bias pulsesTOKYO ELECTRON LTD·Filed 2021·Granted Aug 19, 2025·0 cites·20 claims
- 1572US2025149295A1Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1671US2025273439A1Method of uniformity controlTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 1770US12300468B2Method of uniformity controlTOKYO ELECTRON LTD·Filed 2022·Granted May 13, 2025·0 cites·14 claims
- 1869US12451329B2Plasma processing apparatus with tunable electrical characteristicTOKYO ELECTRON LTD·Filed 2021·Granted Oct 21, 2025·0 cites·20 claims
- 1968US11158516B2Plasma processing methods using low frequency bias pulsesTOKYO ELECTRON LTD·Filed 2020·Granted Oct 26, 2021·0 cites·20 claims
- 2066US10020172B2Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the methodTOKYO ELECTRON LTD·Filed 2015·Granted Jul 10, 2018·1 cites·3 claims
- 2164US12347646B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·4 claims
- 2263US2025364224A1Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2362US12347654B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jul 1, 2025·0 cites·4 claims
- 2461US12230475B2Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted Feb 18, 2025·0 cites·18 claims
- 2561US11450515B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 20, 2022·0 cites·7 claims
- 2661US2025273429A1Plasma potential adjustment circuitTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2759US11915910B2Fast neutral generation for plasma processingTOKYO ELECTRON LTD·Filed 2021·Granted Feb 27, 2024·0 cites·20 claims
- 2859US2025293095A1System and method of pulse scoringTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2958US2025226192A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3058US2024071734A1Lower electrode mechanism and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3158US2024347317A1Method and System for Plasma ProcessingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3257US10910196B1Mode-switching plasma systems and methods of operating thereofTOKYO ELECTRON LTD·Filed 2019·Granted Feb 2, 2021·0 cites·20 claims
- 3357US2025079128A1Processing substrates with plasma modulated by dc magnetic fieldsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3457US2025226179A1Method and system for plasma processTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 3557US2024258074A1Antenna Plane Magnets for Improved PerformanceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3657US2024339297A1Plasma processing systems with matching network and methodsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 3755US11521834B2Plasma processing systems and methods for chemical processing a substrateTOKYO ELECTRON LTD·Filed 2020·Granted Dec 6, 2022·0 cites·20 claims
- 3852US12334313B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Jun 17, 2025·0 cites·15 claims
- 3952US10825663B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Nov 3, 2020·0 cites·6 claims
- 4051US2023377853A1Plasma systems and processes with pulsed magnetic fieldTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 4149US11817295B2Three-phase pulsing systems and methods for plasma processingTOKYO ELECTRON LTD·Filed 2019·Granted Nov 14, 2023·0 cites·17 claims
- 4246US2021193439A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 4345US2009212014A1Method and system for performing multiple treatments in a dual-chamber batch processing systemTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 4444US8084720B2High rate method for stable temperature control of a substrateOHATA MITSUNORI·Filed 2010·Granted Dec 27, 2011·0 cites·13 claims
- 4544US2021020405A1Equipment and methods for plasma processingTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 4641US11972925B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Apr 30, 2024·0 cites·16 claims
- 4739US10204766B2Ion beam irradiation apparatus and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Feb 12, 2019·0 cites·12 claims
- 4838US10541142B2Maintenance method of plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jan 21, 2020·0 cites·16 claims
- 4937US10685816B2Method of etching object to be processedTOKYO ELECTRON LTD·Filed 2016·Granted Jun 16, 2020·0 cites·6 claims
- 5037US2019131158A1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →