Inventor · disambiguated record
Minjoon Park
Also filed as: PARK MINJOON
14 granted patents·14 pending applications·39 citations·filing 2014–2025
86Inventor score
Files withTOKYO ELECTRON LTD18SAMSUNG ELECTRONICS CO LTD4ALATION INC2SAMSUNG DISPLAY CO LTD2INDUSTRY-UNIV COOP FOUND HANYANG UNIV ERICA CAMPUS1
Top patents by PatentIndex Score
28 records- 0192US10776366B1Computer-implemented method and system for writing and performing a data queryALATION INC·Filed 2016·Granted Sep 15, 2020·27 cites·18 claims
- 0287US10054496B2Temperature sensing device, temperature sensor using the same, and wearable device having the sameSAMSUNG DISPLAY CO LTD·Filed 2015·Granted Aug 21, 2018·4 cites·10 claims
- 0381US9305802B2Methods of forming semiconductor devices using hard masksSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 5, 2016·5 cites·20 claims
- 0476US10497597B2Electrostatic chuck assembly and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Dec 3, 2019·3 cites·18 claims
- 0572US2025279280A1Plasma etching tools and systemsTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0669US12334356B2Plasma etching tools and systemsTOKYO ELECTRON LTD·Filed 2022·Granted Jun 17, 2025·0 cites·20 claims
- 0764US12512329B2Multi level contact etchTOKYO ELECTRON LTD·Filed 2023·Granted Dec 30, 2025·0 cites·20 claims
- 0862US12354842B2In-situ focus ring coatingTOKYO ELECTRON LTD·Filed 2023·Granted Jul 8, 2025·0 cites·20 claims
- 0958US2025253157A1Method for etching a pattern in a layer of a substrateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1057US12040176B2Technologies for high aspect ratio carbon etching with inserted charge dissipation layerTOKYO ELECTRON LTD·Filed 2022·Granted Jul 16, 2024·0 cites·20 claims
- 1157US2025166966A1Plasma processing with phase-locked waveformsTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1257US2025391659A1Method for patterning mask layer over substrateTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 1355US11468072B2Computer-implemented method and system for writing and performing a data queryALATION INC·Filed 2020·Granted Oct 11, 2022·0 cites·18 claims
- 1454US2017167035A1Hybrid type deviceINDUSTRY-UNIV COOP FOUND HANYANG UNIV ERICA CAMPUS·Filed 2014·Application pending·0 cites
- 1554US2024249927A1Plasma Etching with Metal SputteringTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1652US12463048B2Methods for forming semiconductor devices using metal hard masksTOKYO ELECTRON LTD·Filed 2022·Granted Nov 4, 2025·0 cites·20 claims
- 1750US2023343598A1Method For Improving Etch Rate And Critical Dimension Uniformity When Etching High Aspect Ratio Features Within A Hard Mask LayerTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1850US2024347346A1Semiconductor devices and methods of manufacturing the sameTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1950US2025293019A1Etch stop layer in all-in-one harc etchTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2050US2025293042A1Harc etch chemistry for seminconductorsTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2150US2025293041A1Cyclic etch/deposition plasma processes using tungsten based precursor gasTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 2249US11189889B2Rechargeable batterySAMSUNG SDI CO LTD·Filed 2017·Granted Nov 30, 2021·0 cites·15 claims
- 2349US2025191929A1Layer by layer etch processTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2448US9123657B2Method of fabricating semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Sep 1, 2015·0 cites·20 claims
- 2548US2024234157A9Polymer Removal via Multiple Flash Steps during Plasma EtchTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 2648US2025210368A1Single mask multi-critical dimension etching using etch stopTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 2746US11487854B2Electronic device for protecting application from abnormal environment and operating method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 1, 2022·0 cites·15 claims
- 2845US10439128B2Piezoelectric device, piezoelectric sensor using the same, and wearable device having the sameSAMSUNG DISPLAY CO LTD·Filed 2015·Granted Oct 8, 2019·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →