Inventor · disambiguated record
Michael Ravkin
Also filed as: RAVKIN MICHAEL · RAVKIN MICHAEL A
63 granted patents·11 pending applications·1,175 citations·filing 1996–2020
99Inventor score
Top patents by PatentIndex Score
74 records- 0198US6988327B2Methods and systems for processing a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2003·Granted Jan 24, 2006·164 cites·42 claims
- 0295US7367345B1Apparatus and method for providing a confined liquid for immersion lithographyLAM RES CORP·Filed 2004·Granted May 6, 2008·62 cites·22 claims
- 0393US6733596B1Substrate cleaning brush preparation sequence, method, and systemLAM RES CORP·Filed 2002·Granted May 11, 2004·66 cites·20 claims
- 0492US7749689B2Methods for providing a confined liquid for immersion lithographyLAM RES CORP·Filed 2008·Granted Jul 6, 2010·13 cites·14 claims
- 0592US6954993B1Concentric proximity processing headLAM RES CORP·Filed 2004·Granted Oct 18, 2005·64 cites·23 claims
- 0691US6770151B1Drying a substrate using a combination of substrate processing technologiesLAM RES CORP·Filed 2002·Granted Aug 3, 2004·55 cites·20 claims
- 0791US6272712B1Brush box containment apparatusLAM RES CORP·Filed 2000·Granted Aug 14, 2001·59 cites·8 claims
- 0889US7696141B2Cleaning compound and method and system for using the cleaning compoundLAM RES CORP·Filed 2006·Granted Apr 13, 2010·10 cites·28 claims
- 0988US10861719B2Method and apparatus for processing wafer-shaped articlesLAM RES AG·Filed 2020·Granted Dec 8, 2020·2 cites·11 claims
- 1088US7737097B2Method for removing contamination from a substrate and for making a cleaning solutionLAM RES CORP·Filed 2006·Granted Jun 15, 2010·11 cites·22 claims
- 1188US7127831B2Methods and systems for processing a substrate using a dynamic liquid meniscusLAM RES CORP·Filed 2005·Granted Oct 31, 2006·9 cites·27 claims
- 1288US6616516B1Method and apparatus for asymmetric processing of front side and back side of semiconductor substratesLAM RES CORP·Filed 2001·Granted Sep 9, 2003·42 cites·22 claims
- 1387US7862662B2Method and material for cleaning a substrateLAM RES CORP·Filed 2006·Granted Jan 4, 2011·10 cites·13 claims
- 1485US7648584B2Method and apparatus for removing contamination from substrateLAM RES CORP·Filed 2006·Granted Jan 19, 2010·9 cites·27 claims
- 1585US7395611B2System processing a substrate using dynamic liquid meniscusLAM RES CORP·Filed 2006·Granted Jul 8, 2008·7 cites·20 claims
- 1685US7383843B2Method and apparatus for processing wafer surfaces using thin, high velocity fluid layerLAM RES CORP·Filed 2004·Granted Jun 10, 2008·28 cites·17 claims
- 1784US6123607AMethod and apparatus for improved conditioning of polishing padsFiled 1999·Granted Sep 26, 2000·66 cites·25 claims
- 1883US8591662B2Methods for cleaning a semiconductor substrateFREER ERIK M·Filed 2012·Granted Nov 26, 2013·4 cites·14 claims
- 1983US6290780B1Method and apparatus for processing a waferLAM RES CORP·Filed 1999·Granted Sep 18, 2001·56 cites·20 claims
- 2082US8316866B2Method and apparatus for cleaning a semiconductor substrateFREER ERIK M·Filed 2006·Granted Nov 27, 2012·6 cites·13 claims
- 2182US8137474B2Cleaning compound and method and system for using the cleaning compoundFREER ERIK M·Filed 2010·Granted Mar 20, 2012·4 cites·15 claims
- 2282US6425158B2Apparatus for processing a waferLAM RES CORP·Filed 2001·Granted Jul 30, 2002·22 cites·19 claims
- 2381US10446416B2Method and apparatus for processing wafer-shaped articlesLAM RES AG·Filed 2016·Granted Oct 15, 2019·3 cites·19 claims
- 2481US8716210B2Material for cleaning a substrateFREER ERIK M·Filed 2010·Granted May 6, 2014·4 cites·18 claims
- 2581US8475599B2Substrate preparation using stabilized fluid solutions and methods for making stable fluid solutionsFREER ERIK M·Filed 2006·Granted Jul 2, 2013·6 cites·12 claims
- 2681US7743449B2System and method for a combined contact and non-contact wafer cleaning moduleLAM RES CORP·Filed 2005·Granted Jun 29, 2010·7 cites·14 claims
- 2781US7383601B2Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the sameLAM RES CORP·Filed 2006·Granted Jun 10, 2008·7 cites·16 claims
- 2881US6431959B1System and method of defect optimization for chemical mechanical planarization of polysiliconLAM RES CORP·Filed 1999·Granted Aug 13, 2002·52 cites·22 claims
- 2981US5941762AMethod and apparatus for improved conditioning of polishing padsFiled 1998·Granted Aug 24, 1999·55 cites·20 claims
- 3080US7007333B1System and method for a combined contact and non-contact wafer cleaning moduleLAM RES CORP·Filed 2002·Granted Mar 7, 2006·25 cites·13 claims
- 3179US8522801B2Method and apparatus for cleaning a semiconductor substrateFREER ERIK M·Filed 2006·Granted Sep 3, 2013·6 cites·6 claims
- 3278US8522799B2Apparatus and system for cleaning a substrateFREER ERIK M·Filed 2006·Granted Sep 3, 2013·6 cites·8 claims
- 3378US6624078B1Methods for analyzing the effectiveness of wafer backside cleaningLAM RES CORP·Filed 2002·Granted Sep 23, 2003·20 cites·27 claims
- 3477US7806126B1Substrate proximity drying using in-situ local heating of substrate and substrate carrier point of contact, and methods, apparatus, and systems for implementing the sameLAM RES CORP·Filed 2005·Granted Oct 5, 2010·5 cites·19 claims
- 3576US8480810B2Method and apparatus for particle removalFREER ERIK M·Filed 2006·Granted Jul 9, 2013·5 cites·19 claims
- 3676US7252097B2System and method for integrating in-situ metrology within a wafer processLAM RES CORP·Filed 2003·Granted Aug 7, 2007·18 cites·15 claims
- 3776US5868863AMethod and apparatus for cleaning of semiconductor substrates using hydrofluoric acid (HF)ONTRAK SYSTEMS INC·Filed 1997·Granted Feb 9, 1999·34 cites·13 claims
- 3875US7165563B1Method and apparatus to decouple power and cavitation for megasonic cleaning applicationsLAM RES CORP·Filed 2002·Granted Jan 23, 2007·17 cites·7 claims
- 3973US6949411B1Method for post-etch and strip residue removal on coral filmsLAM RES CORP·Filed 2001·Granted Sep 27, 2005·15 cites·24 claims
- 4071US8608859B2Method for removing contamination from a substrate and for making a cleaning solutionFREER ERIK M·Filed 2010·Granted Dec 17, 2013·2 cites·15 claims
- 4171US7078344B2Stress free etch processing in combination with a dynamic liquid meniscusLAM RES CORP·Filed 2004·Granted Jul 18, 2006·13 cites·23 claims
- 4271US6866051B1Megasonic substrate processing moduleLAM RES CORP·Filed 2002·Granted Mar 15, 2005·15 cites·8 claims
- 4368US8555903B2Method and apparatus for removing contamination from substrateFREER ERIK M·Filed 2009·Granted Oct 15, 2013·2 cites·20 claims
- 4468US7396430B2Apparatus and method for confined area planarizationLAM RES CORP·Filed 2006·Granted Jul 8, 2008·2 cites·13 claims
- 4568US6439245B1Method for transferring wafers from a conveyor system to a wafer processing stationLAM RES CORP·Filed 2000·Granted Aug 27, 2002·9 cites·8 claims
- 4667US8388762B2Substrate cleaning technique employing multi-phase solutionFREER ERIK M·Filed 2007·Granted Mar 5, 2013·2 cites·18 claims
- 4767US7648616B1Apparatus and method for semiconductor wafer electroplanarizationLAM RES CORP·Filed 2006·Granted Jan 19, 2010·2 cites·20 claims
- 4866US5924154ABrush assembly apparatusONTRAK SYSTEMS INC·Filed 1996·Granted Jul 20, 1999·28 cites·22 claims
- 4965US7045018B2Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the sameLAM RES CORP·Filed 2004·Granted May 16, 2006·9 cites·19 claims
- 5063US7534307B2Methods for processing wafer surfaces using thin, high velocity fluid layerLAM RES CORP·Filed 2008·Granted May 19, 2009·1 cites·14 claims
Showing the top 50 of 74 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →