Inventor · disambiguated record
Michael J. Rooks
Also filed as: ROOKS MICHAEL J · ROOKS MICHAEL JOSEPH
22 granted patents·1 pending application·223 citations·filing 1999–2012
95Inventor score
Top patents by PatentIndex Score
23 records- 0197US8445892B2p-FET with a strained nanowire channel and embedded SiGe source and drain stressorsCOHEN GUY·Filed 2012·Granted May 21, 2013·31 cites·14 claims
- 0297US8399314B2p-FET with a strained nanowire channel and embedded SiGe source and drain stressorsCOHEN GUY·Filed 2010·Granted Mar 19, 2013·40 cites·20 claims
- 0396US8008095B2Methods for fabricating contacts to pillar structures in integrated circuitsIBM·Filed 2007·Granted Aug 30, 2011·56 cites·16 claims
- 0493US7999251B2Nanowire MOSFET with doped epitaxial contacts for source and drainIBM·Filed 2006·Granted Aug 16, 2011·22 cites·15 claims
- 0590US7160477B2Method for making a contact magnetic transfer templateHITACHI GLOBAL STORAGE TECH·Filed 2005·Granted Jan 9, 2007·11 cites·40 claims
- 0675US7417315B2Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packagingIBM·Filed 2002·Granted Aug 26, 2008·12 cites·30 claims
- 0774US7572499B2Contact magnetic transfer templateHITACHI GLOBAL STORAGE TECH·Filed 2005·Granted Aug 11, 2009·2 cites·11 claims
- 0873US8241957B2Negative thermal expansion system (NTES) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packagingHOUGHAM GARETH GEOFFREY·Filed 2010·Granted Aug 14, 2012·2 cites·16 claims
- 0971US7037638B1High sensitivity crosslinkable photoresist composition, based on soluble, film forming dendrimeric calix[4] arene compositions method and for use thereofIBM·Filed 2000·Granted May 2, 2006·10 cites·13 claims
- 1070US8153494B2Nanowire MOSFET with doped epitaxial contacts for source and drainCHU JACK O·Filed 2009·Granted Apr 10, 2012·3 cites·17 claims
- 1170US7525109B2Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing systemHITACHI GLOBAL STORAGE TECH·Filed 2006·Granted Apr 28, 2009·2 cites·7 claims
- 1267US8119206B2Negative coefficient of thermal expansion particlesHOUGHAM GARETH GEOFFREY·Filed 2009·Granted Feb 21, 2012·4 cites·10 claims
- 1366US7556979B2Negative thermal expansion system (NTEs) device for TCE compensation in elastomer composites and conductive elastomer interconnects in microelectronic packagingIBM·Filed 2007·Granted Jul 7, 2009·1 cites·7 claims
- 1464US8754530B2Self-aligned borderless contacts for high density electronic and memory device integrationBABICH KATHERINA E·Filed 2008·Granted Jun 17, 2014·3 cites·7 claims
- 1563US7696057B2Method for co-alignment of mixed optical and electron beam lithographic fabrication levelsIBM·Filed 2007·Granted Apr 13, 2010·2 cites·20 claims
- 1661US6821715B2Fully undercut resist systems using E-beam lithography for the fabrication of high resolution MR sensorsIBM·Filed 2001·Granted Nov 23, 2004·4 cites·12 claims
- 1760US7883919B2Negative thermal expansion system (NTEs) device for TCE compensation in elastomer compsites and conductive elastomer interconnects in microelectronic packagingIBM·Filed 2009·Granted Feb 8, 2011·0 cites·6 claims
- 1858US6280908B1Post-development resist hardening by vapor silylationIBM·Filed 1999·Granted Aug 28, 2001·17 cites·20 claims
- 1948US2012190155A1Nanowire mosfet with doped epitaxial contacts for source and drainCHU JACK O·Filed 2012·Application pending·0 cites
- 2047US8120138B2High-Z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levelsFRIED DAVID MICHAEL·Filed 2009·Granted Feb 21, 2012·0 cites·30 claims
- 2146US7579069B2Negative coefficient of thermal expansion particles and method of forming the sameIBM·Filed 2003·Granted Aug 25, 2009·1 cites·4 claims
- 2245US7550361B2Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levelsIBM·Filed 2007·Granted Jun 23, 2009·0 cites·21 claims
- 2336US6440639B1High-aspect ratio resist development using safe-solvent mixtures of alcohol and waterIBM·Filed 2000·Granted Aug 27, 2002·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →