Inventor · disambiguated record
Mitsuhiro Shamoto
Also filed as: SHAMOTO MITSUHIRO
9 granted patents·3 pending applications·0 citations·filing 2017–2023
73Inventor score
Files withEBARA CORP12
Top patents by PatentIndex Score
12 records- 0162US11725296B2Plate, plating apparatus, and method of manufacturing plateEBARA CORP·Filed 2021·Granted Aug 15, 2023·0 cites·6 claims
- 0262US2024109026A1Exhaust gas treatment apparatusEBARA CORP·Filed 2023·Application pending·0 cites
- 0361US11319642B2Method for determining location of power feeding point in electroplating apparatus and electroplating apparatus for plating rectangular substrateEBARA CORP·Filed 2021·Granted May 3, 2022·0 cites·5 claims
- 0460US10982348B2Plating apparatusEBARA CORP·Filed 2019·Granted Apr 20, 2021·0 cites·8 claims
- 0556US10829865B2Paddle for use of stirring plating solution and plating apparatus including paddleEBARA CORP·Filed 2019·Granted Nov 10, 2020·0 cites·4 claims
- 0654US10934630B2Method for determining location of power feeding point in electroplating apparatus and electroplating apparatus for plating rectangular substrateEBARA CORP·Filed 2018·Granted Mar 2, 2021·0 cites·3 claims
- 0749US10768140B2Plating analysis method, plating analysis system, and computer readable storage medium for plating analysisEBARA CORP·Filed 2018·Granted Sep 8, 2020·0 cites·7 claims
- 0848US11603601B2Plating device and resistorEBARA CORP·Filed 2021·Granted Mar 14, 2023·0 cites·8 claims
- 0947US10968530B2Electroplating deviceEBARA CORP·Filed 2019·Granted Apr 6, 2021·0 cites·4 claims
- 1046US11773504B2Plating support system, plating support device, and recording mediumEBARA CORP·Filed 2021·Granted Oct 3, 2023·0 cites·34 claims
- 1138US2018274116A1Plating apparatus and method for determining plating bath configurationEBARA CORP·Filed 2018·Application pending·0 cites
- 1235US2020335394A1Method of manufacturing substrate and the same substrateEBARA CORP·Filed 2017·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Mitsuhiro Shamoto files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →