Inventor · disambiguated record
Mitsuhiro Tachibana
Also filed as: TACHIBANA MITSUHIRO
33 granted patents·7 pending applications·1,074 citations·filing 1993–2025
97Inventor score
Top patents by PatentIndex Score
40 records- 0197US9991138B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·337 cites·6 claims
- 0293US9111747B2Film deposition apparatus, substrate processing apparatus and film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Aug 18, 2015·15 cites·17 claims
- 0389US6036782AShower headTOKYO ELECTRON LTD·Filed 1998·Granted Mar 14, 2000·109 cites·13 claims
- 0488US6646271B2Method and apparatus for reading fluorescenceHITACHI SOFTWARE ENG·Filed 2001·Granted Nov 11, 2003·45 cites·14 claims
- 0588US6465347B2Tungsten film forming methodTOKYO ELECTRON LTD·Filed 2001·Granted Oct 15, 2002·53 cites·22 claims
- 0687US6767748B2Spotting pin, spotting device and method for spotting biomoleculesHITACHI SOFTWARE ENG·Filed 2003·Granted Jul 27, 2004·34 cites·8 claims
- 0787US5303671ASystem for continuously washing and film-forming a semiconductor waferTOKYO ELECTRON LTD·Filed 1993·Granted Apr 19, 1994·107 cites·12 claims
- 0886US6399484B1Semiconductor device fabricating method and system for carrying out the sameTOKYO ELECTRON LTD·Filed 1999·Granted Jun 4, 2002·88 cites·4 claims
- 0984US6924223B2Method of forming a metal layer using an intermittent precursor gas flow processIBM·Filed 2003·Granted Aug 2, 2005·32 cites·53 claims
- 1084US6737666B1Apparatus and method for detecting an end point of a cleaning processNEC ELECTRONICS CORP·Filed 2000·Granted May 18, 2004·34 cites·8 claims
- 1182US9583312B2Film formation device, substrate processing device, and film formation methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 28, 2017·5 cites·9 claims
- 1282US5997651AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Dec 7, 1999·68 cites·17 claims
- 1381US6582954B2Biopolymer detectorHITACHI SOFTWARE ENG·Filed 2002·Granted Jun 24, 2003·8 cites·7 claims
- 1477US10903083B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·2 cites·9 claims
- 1576US6913996B2Method of forming metal wiring and semiconductor manufacturing apparatus for forming metal wiringTOKYO ELECTRON LTD·Filed 2001·Granted Jul 5, 2005·20 cites·34 claims
- 1673US9136156B2Substrate processing apparatus and film deposition apparatusENOMOTO TADASHI·Filed 2012·Granted Sep 15, 2015·4 cites·8 claims
- 1772US6660101B1Method and apparatus for cleaning film deposition deviceTOKYO ELECTRON LTD·Filed 2000·Granted Dec 9, 2003·11 cites·9 claims
- 1871US6835352B2Spotting pinHITACHI SOFTWARE ENG·Filed 2003·Granted Dec 28, 2004·20 cites·11 claims
- 1970US6787349B1Biochip reader and labeling reagentHITACHI SOFTWARE ENG·Filed 2000·Granted Sep 7, 2004·9 cites·9 claims
- 2069US5972114AFilm deposition apparatus with anti-adhesion film and chamber cooling meansTOKYO ELECTRON LTD·Filed 1996·Granted Oct 26, 1999·32 cites·5 claims
- 2168US10460946B2Naturally oxidized film removing method and naturally oxidized film removing deviceTOKYO ELECTRON LTD·Filed 2016·Granted Oct 29, 2019·1 cites·8 claims
- 2268US8895456B2Method of depositing a filmTOKYO ELECTRON LTD·Filed 2013·Granted Nov 25, 2014·2 cites·20 claims
- 2361US6875603B2Apparatus for detecting biopolymers and cartridgeHITACHI SOFTWARE ENG·Filed 2001·Granted Apr 5, 2005·3 cites·16 claims
- 2461US6346425B1Vapor-phase processing method capable of eliminating particle formationTOKYO ELECTRON LTD·Filed 2000·Granted Feb 12, 2002·8 cites·10 claims
- 2560US12237173B2Substrate processing method, substrate processing apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Feb 25, 2025·0 cites·5 claims
- 2660US7063871B2CVD process capable of reducing incubation timeTOKYO ELECTRON LTD·Filed 2003·Granted Jun 20, 2006·4 cites·11 claims
- 2757US6790651B2Hybridization reaction apparatus and hybridization methodHITACHI SOFTWARE ENG·Filed 2001·Granted Sep 14, 2004·5 cites·10 claims
- 2857US2014220260A1Substrate processing apparatus and method of depositing a filmTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 2954US12283489B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 22, 2025·0 cites·23 claims
- 3054US2025183052A1Processing method and processing systemTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 3151US7135331B2Apparatus for detecting biopolymers and cartridgeHITACHI SOFTWARE ENG·Filed 2005·Granted Nov 14, 2006·0 cites·7 claims
- 3249US6726883B2Spotting pinHITACHI SOFTWARE ENG·Filed 2003·Granted Apr 27, 2004·3 cites·8 claims
- 3347US6331483B1Method of film-forming of tungstenTOKYO ELECTRON LTD·Filed 1999·Granted Dec 18, 2001·13 cites·9 claims
- 3445US2003003020A1Apparatus for preparing microarraysFiled 2002·Application pending·0 cites
- 3544US7592256B2Method of forming tungsten filmTOKYO ELECTRON LTD·Filed 2002·Granted Sep 22, 2009·1 cites·32 claims
- 3643US2015211119A1Film deposition apparatusTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 3742US2009246373A1Method of forming metallic film and program-storing recording mediumTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 3839US2005069641A1Method for depositing metal layers using sequential flow depositionTOKYO ELECTRON LTD·Filed 2003·Application pending·0 cites
- 3936US2015240357A1Substrate processing apparatus using rotatable tableTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 4025US5578756AMethod and apparatus for evaluating soundness of block-like structuresRAILWAY TECHNICAL RES INST·Filed 1995·Granted Nov 26, 1996·1 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →