Inventor · disambiguated record
Michael Totzeck
Also filed as: TOTZECK MICHAEL
58 granted patents·13 pending applications·351 citations·filing 2003–2024
98Inventor score
Files withZEISS CARL SMT AG21TOTZECK MICHAEL7ZEISS CARL SMT GMBH7ZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH5ZEISS CARL SMS GMBH4
Top patents by PatentIndex Score
71 records- 0195US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0295US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0393US7982854B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemZEISS CARL SMT GMBH·Filed 2006·Granted Jul 19, 2011·15 cites·12 claims
- 0493US7463422B2Projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Granted Dec 9, 2008·19 cites·23 claims
- 0590US8169595B2Optical apparatus and method for modifying the imaging behavior of such apparatusSCHRIEVER MARTIN·Filed 2009·Granted May 1, 2012·23 cites·52 claims
- 0689US8237918B2Optical system of a microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2009·Granted Aug 7, 2012·11 cites·27 claims
- 0789US7411656B2Optically polarizing retardation arrangement, and a microlithography projection exposure machineZEISS CARL SMT AG·Filed 2006·Granted Aug 12, 2008·20 cites·36 claims
- 0888US9304405B2Microlithography illumination system and microlithography illumination optical unitFIOLKA DAMIAN·Filed 2010·Granted Apr 5, 2016·5 cites·13 claims
- 0987US9442381B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Sep 13, 2016·4 cites·36 claims
- 1087US7286245B2Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyserZEISS CARL SMT AG·Filed 2003·Granted Oct 23, 2007·28 cites·21 claims
- 1186US7728975B1Method for describing, evaluating and improving optical polarization properties of a microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2006·Granted Jun 1, 2010·8 cites·27 claims
- 1286US7239450B2Method of determining lens materials for a projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Granted Jul 3, 2007·16 cites·48 claims
- 1382US6992834B2Objective with birefringent lensesZEISS CARL SMT AG·Filed 2005·Granted Jan 31, 2006·9 cites·37 claims
- 1481US7053988B2Optically polarizing retardation arrangement, and microlithography projection exposure machineZEISS CARL SMT AG·Filed 2003·Granted May 30, 2006·20 cites·48 claims
- 1579US7924436B2Method for approximating an influence of an optical system on the state of polarization of optical radiationZEISS CARL SMT GMBH·Filed 2007·Granted Apr 12, 2011·6 cites·29 claims
- 1677US10670884B2Spectacle lens and method for producing sameZEISS CARL VISION INT GMBH·Filed 2019·Granted Jun 2, 2020·2 cites·17 claims
- 1777US8736849B2Method and apparatus for measuring structures on photolithography masksSTROESSNER ULRICH·Filed 2009·Granted May 27, 2014·5 cites·33 claims
- 1874US8854606B2Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in such a systemMANN HANS-JÜRGEN·Filed 2011·Granted Oct 7, 2014·2 cites·20 claims
- 1973US9778576B2Microlithography illumination system and microlithography illumination optical unitZEISS CARL SMT GMBH·Filed 2016·Granted Oct 3, 2017·1 cites·20 claims
- 2073US8605257B2Projection system with compensation of intensity variations and compensation element thereforPAZIDIS ALEXANDRA·Filed 2005·Granted Dec 10, 2013·7 cites·45 claims
- 2171US7423727B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Sep 9, 2008·3 cites·20 claims
- 2270US7321465B2Method of optimizing an objective with fluoride crystal lenses, and objective with fluoride crystal lensesZEISS CARL SMT AG·Filed 2005·Granted Jan 22, 2008·5 cites·19 claims
- 2367US12319000B23D printing apparatus and 3D printing method for manufacturing a workpieceZEISS CARL VISION INT GMBH·Filed 2024·Granted Jun 3, 2025·0 cites·14 claims
- 2467US8593618B2Optical system of a microlithographic projection exposure apparatus and microlithographic exposure methodTOTZECK MICHAEL·Filed 2010·Granted Nov 26, 2013·1 cites·18 claims
- 2567US8395753B2Microlithographic projection exposure apparatusFIOLKA DAMIAN·Filed 2010·Granted Mar 12, 2013·1 cites·24 claims
- 2667US8339574B2Lithographic apparatus and device manufacturing methodTOTZECK MICHAEL·Filed 2008·Granted Dec 25, 2012·2 cites·7 claims
- 2767US8294991B2Interference systems for microlithgraphic projection exposure systemsMUELLER RALF·Filed 2010·Granted Oct 23, 2012·2 cites·24 claims
- 2866US12442767B2Lab-on-a-chip system with functionalized waveguideZEISS CARL JENA GMBH·Filed 2021·Granted Oct 14, 2025·0 cites·19 claims
- 2966US9063439B2Projection objective for microlithography with stray light compensation and related methodsGOEHNERMEIER AKSEL·Filed 2009·Granted Jun 23, 2015·2 cites·40 claims
- 3064US8126669B2Optimization and matching of optical systems by use of orientation Zernike polynomialsTOTZECK MICHAEL·Filed 2009·Granted Feb 28, 2012·4 cites·20 claims
- 3164US8031326B2Illumination system or projection lens of a microlithographic exposure systemZEISS CARL SMT GMBH·Filed 2008·Granted Oct 4, 2011·3 cites·35 claims
- 3261US11400668B23D printing process for producing a spectacle lensZEISS CARL VISION INT GMBH·Filed 2019·Granted Aug 2, 2022·0 cites·14 claims
- 3361US7535640B2Imaging system for emulation of a high aperture scanning systemZEISS CARL SMS GMBH·Filed 2004·Granted May 19, 2009·7 cites·8 claims
- 3460US11633918B2Method and device for additive manufacturing utilizing simulation test results of a workpieceZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2019·Granted Apr 25, 2023·1 cites·14 claims
- 3560US8305558B2Illumination system for a microlithography projection exposure apparatusGRUNER TORALF·Filed 2009·Granted Nov 6, 2012·1 cites·17 claims
- 3660US7961297B2Method for determining intensity distribution in the image plane of a projection exposure arrangementZEISS CARL SMS GMBH·Filed 2006·Granted Jun 14, 2011·1 cites·25 claims
- 3759US11499814B2Inspection of bonding quality of transparent materials using optical coherence tomographyZEISS CARL MEDITEC INC·Filed 2019·Granted Nov 15, 2022·0 cites·25 claims
- 3859US7808615B2Projection exposure apparatus and method for operating the sameZEISS CARL SMT AG·Filed 2006·Granted Oct 5, 2010·2 cites·18 claims
- 3958US7286284B2Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionZEISS CARL SMS GMBH·Filed 2004·Granted Oct 23, 2007·13 cites·34 claims
- 4057USRE44216EMicroscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspectionTOTZECK MICHAEL·Filed 2009·Granted May 14, 2013·0 cites·35 claims
- 4157US7982969B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2008·Granted Jul 19, 2011·1 cites·47 claims
- 4256US11279104B2Refractive optical component and spectacle lens produced therefrom, method for producing a refractive optical component, computer program product, construction data of a spectacle lens stored on a data medium, device for additiveZEISS CARL AG·Filed 2021·Granted Mar 22, 2022·0 cites·15 claims
- 4356US2023070819A1Device for Additive Manufacturing of a WorkpieceZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2022·Application pending·0 cites
- 4455US10241423B2Method of operating a projection exposure tool for microlithographyZEISS CARL SMT GMBH·Filed 2016·Granted Mar 26, 2019·0 cites·20 claims
- 4555US8107054B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2008·Granted Jan 31, 2012·0 cites·24 claims
- 4654US8982325B2Microlithographic projection exposure apparatusTOTZECK MICHAEL·Filed 2011·Granted Mar 17, 2015·0 cites·24 claims
- 4753US11506485B2Material testing by angle-variable illuminationZEISS CARL INDUSTRIELLE MESSTECHNIK GMBH·Filed 2019·Granted Nov 22, 2022·0 cites·21 claims
- 4853US7817250B2Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2008·Granted Oct 19, 2010·0 cites·34 claims
- 4953US2008002172A1Microlithographic projection exposure apparatusZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 5052US2008037905A1Method and apparatus for determining the influencing of the state of polarization by an optical system, and an analyserZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
Showing the top 50 of 71 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →