Inventor · disambiguated record
Michael Wenyoung Tsiang
Also filed as: TSIANG MICHAEL · TSIANG MICHAEL WENYOUNG
20 granted patents·3 pending applications·90 citations·filing 2013–2023
93Inventor score
Technology areasH10P
Files withAPPLIED MATERIALS INC23
Top patents by PatentIndex Score
23 records- 0197US9157730B2PECVD processAPPLIED MATERIALS INC·Filed 2013·Granted Oct 13, 2015·49 cites·18 claims
- 0296US9458537B2PECVD processAPPLIED MATERIALS INC·Filed 2015·Granted Oct 4, 2016·12 cites·20 claims
- 0395US9816187B2PECVD processAPPLIED MATERIALS INC·Filed 2016·Granted Nov 14, 2017·8 cites·20 claims
- 0493US11613812B2PECVD processAPPLIED MATERIALS INC·Filed 2020·Granted Mar 28, 2023·2 cites·20 claims
- 0590US10793954B2PECVD processAPPLIED MATERIALS INC·Filed 2018·Granted Oct 6, 2020·3 cites·13 claims
- 0690US10060032B2PECVD processAPPLIED MATERIALS INC·Filed 2017·Granted Aug 28, 2018·3 cites·20 claims
- 0785US11898249B2PECVD processAPPLIED MATERIALS INC·Filed 2023·Granted Feb 13, 2024·0 cites·17 claims
- 0882US11699623B2Systems and methods for analyzing defects in CVD filmsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 11, 2023·1 cites·20 claims
- 0979US9490116B2Gate stack materials for semiconductor applications for lithographic overlay improvementAPPLIED MATERIALS INC·Filed 2015·Granted Nov 8, 2016·3 cites·20 claims
- 1078US10236225B2Method for PECVD overlay improvementAPPLIED MATERIALS INC·Filed 2018·Granted Mar 19, 2019·2 cites·20 claims
- 1177US10515796B2Dry etch rate reduction of silicon nitride filmsAPPLIED MATERIALS INC·Filed 2018·Granted Dec 24, 2019·2 cites·20 claims
- 1277US9947599B2Method for PECVD overlay improvementAPPLIED MATERIALS INC·Filed 2017·Granted Apr 17, 2018·2 cites·20 claims
- 1374US12300554B2Systems and methods for analyzing defects in CVD filmsAPPLIED MATERIALS INC·Filed 2023·Granted May 13, 2025·0 cites·20 claims
- 1473US10030306B2PECVD apparatus and processAPPLIED MATERIALS INC·Filed 2013·Granted Jul 24, 2018·1 cites·16 claims
- 1571US11133177B2Oxidation reduction for SiOC filmAPPLIED MATERIALS INC·Filed 2019·Granted Sep 28, 2021·1 cites·17 claims
- 1666US10199388B2VNAND tensile thick TEOS oxideAPPLIED MATERIALS INC·Filed 2016·Granted Feb 5, 2019·1 cites·10 claims
- 1754US11515150B2Hardmask tuning by electrode adjustmentAPPLIED MATERIALS INC·Filed 2020·Granted Nov 29, 2022·0 cites·20 claims
- 1853US10483282B2VNAND tensile thick TEOS oxideAPPLIED MATERIALS INC·Filed 2019·Granted Nov 19, 2019·0 cites·11 claims
- 1949US11710631B2Tensile nitride deposition systems and methodsAPPLIED MATERIALS INC·Filed 2020·Granted Jul 25, 2023·0 cites·20 claims
- 2048US2022375747A1Flowable CVD Film Defect ReductionAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2147US11060189B2Method to enable high temperature processing without chamber driftingAPPLIED MATERIALS INC·Filed 2017·Granted Jul 13, 2021·0 cites·20 claims
- 2241US2020190664A1Methods for depositing phosphorus-doped silicon nitride filmsAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 2337US2017162417A1Method and apparatus for clamping and declamping substrates using electrostatic chucksAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →