Inventor · disambiguated record
Michael A. Walker
Also filed as: WALKER MICHAEL · WALKER MICHAEL A · WALKER MICHAEL ALBERT CHAPMAN
80 granted patents·1 pending application·5,131 citations·filing 1992–2021
99Inventor score
Files withMICRON TECHNOLOGY INC72BOEING CO2SPIRIT AEROSYS INC2HITACHI HIGH TECH CORP1MICRON TECHNOLOGIES INC1
Top patents by PatentIndex Score
81 records- 0199US6361417B2Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substratesMICRON TECHNOLOGY INC·Filed 2001·Granted Mar 26, 2002·141 cites·86 claims
- 0299US6331139B2Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substratesMICRON TECHNOLOGY INC·Filed 2001·Granted Dec 18, 2001·95 cites·17 claims
- 0399US6306014B1Web-format planarizing machines and methods for planarizing microelectronic substrate assembliesMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 23, 2001·115 cites·7 claims
- 0499US5616069ADirectional spray pad scrubberMICRON TECHNOLOGY INC·Filed 1995·Granted Apr 1, 1997·195 cites·15 claims
- 0599US5498562ASemiconductor processing methods of forming stacked capacitorsMICRON TECHNOLOGY INC·Filed 1994·Granted Mar 12, 1996·263 cites·17 claims
- 0698US6261163B1Web-format planarizing machines and methods for planarizing microelectronic substrate assembliesMICRON TECHNOLOGY INC·Filed 1999·Granted Jul 17, 2001·160 cites·8 claims
- 0798US6254460B1Fixed abrasive polishing padMICRON TECHNOLOGY INC·Filed 2000·Granted Jul 3, 2001·65 cites·20 claims
- 0898US5779522ADirectional spray pad scrubberMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 14, 1998·125 cites·32 claims
- 0998US5270241AOptimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishingMICRON TECHNOLOGY INC·Filed 1992·Granted Dec 14, 1993·237 cites·60 claims
- 1098US5162248AOptimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishingMICRON TECHNOLOGY INC·Filed 1992·Granted Nov 10, 1992·236 cites·16 claims
- 1197US6273800B1Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substratesMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 14, 2001·133 cites·15 claims
- 1297US6037218ASemiconductor processing methods of forming stacked capacitorsMICRON TECHNOLOGY INC·Filed 1997·Granted Mar 14, 2000·120 cites·12 claims
- 1397US5919082AFixed abrasive polishing padMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 6, 1999·118 cites·29 claims
- 1497US5733176APolishing pad and method of useMICRON TECHNOLOGY INC·Filed 1996·Granted Mar 31, 1998·185 cites·62 claims
- 1597US5652164ASemiconductor processing methods of forming stacked capacitorsMICRON TECHNOLOGY INC·Filed 1995·Granted Jul 29, 1997·120 cites·22 claims
- 1696US6296557B1Method and apparatus for releasably attaching polishing pads to planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assembliesMICRON TECHNOLOGY INC·Filed 1999·Granted Oct 2, 2001·124 cites·12 claims
- 1796US6200901B1Polishing polymer surfaces on non-porous CMP padsMICRON TECHNOLOGY INC·Filed 1998·Granted Mar 13, 2001·177 cites·42 claims
- 1896US6180450B1Semiconductor processing methods of forming stacked capacitorsMICRON TECHNOLOGIES INC·Filed 1999·Granted Jan 30, 2001·127 cites·18 claims
- 1996US6136043APolishing pad methods of manufacture and useMICRON TECHNOLOGY INC·Filed 1999·Granted Oct 24, 2000·107 cites·29 claims
- 2096US6090475APolishing pad, methods of manufacturing and useMICRON TECHNOLOGY INC·Filed 1997·Granted Jul 18, 2000·139 cites·54 claims
- 2196US5893754AMethod for chemical-mechanical planarization of stop-on-feature semiconductor wafersMICRON TECHNOLOGY INC·Filed 1996·Granted Apr 13, 1999·188 cites·26 claims
- 2296US5690540ASpiral grooved polishing pad for chemical-mechanical planarization of semiconductor wafersMICRON TECHNOLOGY INC·Filed 1996·Granted Nov 25, 1997·185 cites·8 claims
- 2395US11295960B1Etching methodHITACHI HIGH TECH CORP·Filed 2021·Granted Apr 5, 2022·6 cites·15 claims
- 2495US7179706B2Permeable capacitor electrodeMICRON TECHNOLOGY INC·Filed 2004·Granted Feb 20, 2007·93 cites·11 claims
- 2595US6290579B1Fixed abrasive polishing padMICRON TECHNOLOGY INC·Filed 2000·Granted Sep 18, 2001·34 cites·11 claims
- 2695US5990012AChemical-mechanical polishing of hydrophobic materials by use of incorporated-particle polishing padsMICRON TECHNOLOGY INC·Filed 1998·Granted Nov 23, 1999·114 cites·39 claims
- 2794US5981396AMethod for chemical-mechanical planarization of stop-on-feature semiconductor wafersMICRON TECHNOLOGY INC·Filed 1999·Granted Nov 9, 1999·139 cites·12 claims
- 2894US5855804AMethod and apparatus for stopping mechanical and chemical-mechanical planarization of substrates at desired endpointsMICRON TECHNOLOGY INC·Filed 1996·Granted Jan 5, 1999·134 cites·28 claims
- 2994US5855811ACleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabricationMICRON TECHNOLOGY INC·Filed 1996·Granted Jan 5, 1999·138 cites·45 claims
- 3092US7329917B2Permeable capacitor electrodeMICRON TECHNOLOGY INC·Filed 2006·Granted Feb 12, 2008·16 cites·16 claims
- 3192US6206769B1Method and apparatus for stopping mechanical and chemical mechanical planarization of substrates at desired endpointsMICRON TECHNOLOGY INC·Filed 1998·Granted Mar 27, 2001·111 cites·9 claims
- 3292US5686038AResin transfer molding of composite materials that emit volatiles during processingBOEING CO·Filed 1995·Granted Nov 11, 1997·84 cites·21 claims
- 3390US6468951B1Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabricationMICRON TECHNOLOGY INC·Filed 2000·Granted Oct 22, 2002·39 cites·61 claims
- 3490US6409586B2Fixed abrasive polishing padMICRON TECHNOLOGY INC·Filed 1998·Granted Jun 25, 2002·45 cites·36 claims
- 3590US6364749B1CMP polishing pad with hydrophilic surfaces for enhanced wettingMICRON TECHNOLOGY INC·Filed 1999·Granted Apr 2, 2002·88 cites·40 claims
- 3690US6044851ACleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabricationMICRON TECHNOLOGY INC·Filed 1998·Granted Apr 4, 2000·86 cites·70 claims
- 3788US8209874B1Building frame construction tools and methods using laser alignmentTRIBBLE RANDY L·Filed 2009·Granted Jul 3, 2012·48 cites·6 claims
- 3887US6277015B1Polishing pad and systemMICRON TECHNOLOGY INC·Filed 1999·Granted Aug 21, 2001·52 cites·35 claims
- 3986US10094013B2Method to prevent abnormal grain growth for beta annealed TI-6AL-4V forgingsSPIRIT AEROSYS INC·Filed 2015·Granted Oct 9, 2018·2 cites·19 claims
- 4086US6224466B1Methods of polishing materials, methods of slowing a rate of material removal of a polishing processMICRON TECHNOLOGY INC·Filed 1998·Granted May 1, 2001·66 cites·17 claims
- 4185US5518948AMethod of making cup-shaped DRAM capacitor having an inwardly overhanging lipMICRON TECHNOLOGY INC·Filed 1995·Granted May 21, 1996·54 cites·22 claims
- 4284US6428404B2Web-format planarizing machines and methods for planarizing microelectronic substrate assembliesMICRON TECHNOLOGY INC·Filed 2001·Granted Aug 6, 2002·17 cites·28 claims
- 4384US5645737AWet clean for a surface having an exposed silicon/silica interfaceMICRON TECHNOLOGY INC·Filed 1996·Granted Jul 8, 1997·54 cites·23 claims
- 4483US6784069B1Permeable capacitor electrodeMICRON TECHNOLOGY INC·Filed 2003·Granted Aug 31, 2004·23 cites·34 claims
- 4581US6269511B1Surface cleaning apparatusMICRON TECHNOLOGY INC·Filed 2000·Granted Aug 7, 2001·38 cites·57 claims
- 4680US5963814AMethod of forming recessed container cells by wet etching conductive layer and dissimilar layer formed over conductive layerMICRON TECHNOLOGY INC·Filed 1997·Granted Oct 5, 1999·44 cites·103 claims
- 4778US6672951B2Fixed abrasive polishing padMICRON TECHNOLOGY INC·Filed 2003·Granted Jan 6, 2004·9 cites·20 claims
- 4877US7427793B2Sacrificial self-aligned interconnect structureMICRON TECHNOLOGY INC·Filed 2006·Granted Sep 23, 2008·5 cites·12 claims
- 4976US6558234B2Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substratesMICRON TECHNOLOGY INC·Filed 2001·Granted May 6, 2003·12 cites·102 claims
- 5076US6409581B1Belt polishing pad methodMICRON TECHNOLOGY INC·Filed 2000·Granted Jun 25, 2002·13 cites·50 claims
Showing the top 50 of 81 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →