Inventor · disambiguated record
Michael D. Willwerth
Also filed as: WILLWERTH MICHAEL · WILLWERTH MICHAEL D · WILLWERTH MICHAEL DAVID
52 granted patents·16 pending applications·297 citations·filing 2003–2024
98Inventor score
Top patents by PatentIndex Score
68 records- 0196US12130561B2Gas distribution plate with UV blockerAPPLIED MATERIALS INC·Filed 2022·Granted Oct 29, 2024·2 cites·14 claims
- 0294US8270141B2Electrostatic chuck with reduced arcingWILLWERTH MICHAEL D·Filed 2010·Granted Sep 18, 2012·26 cites·20 claims
- 0393US11668602B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2021·Granted Jun 6, 2023·2 cites·18 claims
- 0493US10257887B2Substrate support assemblyAPPLIED MATERIALS INC·Filed 2017·Granted Apr 9, 2019·6 cites·20 claims
- 0592US9883549B2Substrate support assembly having rapid temperature controlAPPLIED MATERIALS INC·Filed 2016·Granted Jan 30, 2018·6 cites·20 claims
- 0692US9275887B2Substrate processing with rapid temperature gradient controlMATYUSHKIN ALEXANDER·Filed 2007·Granted Mar 1, 2016·20 cites·19 claims
- 0792US8075728B2Gas flow equalizer plate suitable for use in a substrate process chamberBALAKRISHNA AJIT·Filed 2008·Granted Dec 13, 2011·28 cites·9 claims
- 0891US10790180B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2019·Granted Sep 29, 2020·5 cites·9 claims
- 0991US10283397B2Substrate lift pin actuatorAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·11 cites·20 claims
- 1090US11448977B1Gas distribution plate with UV blocker at the centerAPPLIED MATERIALS INC·Filed 2021·Granted Sep 20, 2022·1 cites·20 claims
- 1188US9761416B2Apparatus and methods for reducing particles in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2014·Granted Sep 12, 2017·7 cites·2 claims
- 1288US7832354B2Cathode liner with wafer edge gas injection in a plasma reactor chamberAPPLIED MATERIALS INC·Filed 2007·Granted Nov 16, 2010·13 cites·17 claims
- 1386US7777152B2High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuckAPPLIED MATERIALS INC·Filed 2007·Granted Aug 17, 2010·26 cites·15 claims
- 1485US12009236B2Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2019·Granted Jun 11, 2024·3 cites·7 claims
- 1585US8349128B2Method and apparatus for stable plasma processingAPPLIED MATERIALS INC·Filed 2004·Granted Jan 8, 2013·26 cites·27 claims
- 1684US8419893B2Shielded lid heater assemblyWILLWERTH MICHAEL D·Filed 2009·Granted Apr 16, 2013·7 cites·15 claims
- 1784US7330244B2Method and apparatus for performing limited area spectral analysisAPPLIED MATERIALS INC·Filed 2006·Granted Feb 12, 2008·9 cites·20 claims
- 1883US8801896B2Method and apparatus for stable plasma processingAPPLIED MATERIALS INC·Filed 2013·Granted Aug 12, 2014·4 cites·18 claims
- 1983US7879250B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2007·Granted Feb 1, 2011·7 cites·8 claims
- 2082US8287650B2Low sloped edge ring for plasma processing chamberLEE CHANGHUN·Filed 2008·Granted Oct 16, 2012·13 cites·7 claims
- 2181US10186444B2Gas flow for condensation reduction with a substrate processing chuckAPPLIED MATERIALS INC·Filed 2015·Granted Jan 22, 2019·3 cites·15 claims
- 2281US8840725B2Chamber with uniform flow and plasma distributionPALAGASHVILI DAVID·Filed 2010·Granted Sep 23, 2014·8 cites·17 claims
- 2380US12405164B2Spatial optical emission spectroscopy for etch uniformityAPPLIED MATERIALS INC·Filed 2023·Granted Sep 2, 2025·0 cites·20 claims
- 2480USD931240SSubstrate support pedestalAPPLIED MATERIALS INC·Filed 2019·Granted Sep 21, 2021·18 cites·1 claims
- 2580US8757603B2Low force substrate liftWILLWERTH MICHAEL D·Filed 2010·Granted Jun 24, 2014·5 cites·19 claims
- 2678US8299391B2Field enhanced inductively coupled plasma (Fe-ICP) reactorTODOROW VALENTIN N·Filed 2008·Granted Oct 30, 2012·8 cites·20 claims
- 2777US10490435B2Cooling element for an electrostatic chuck assemblyAPPLIED MATERIALS INC·Filed 2018·Granted Nov 26, 2019·3 cites·18 claims
- 2874US7158221B2Method and apparatus for performing limited area spectral analysisAPPLIED MATERIALS INC·Filed 2003·Granted Jan 2, 2007·14 cites·24 claims
- 2974US2024321610A1Sensors and system for in-situ edge ring erosion monitorAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3073US12163911B2Capacitive sensor housing for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2022·Granted Dec 10, 2024·0 cites·14 claims
- 3172US8501626B2Methods for high temperature etching a high-K material gate structureLIU WEI·Filed 2008·Granted Aug 6, 2013·4 cites·13 claims
- 3272US2024290592A1Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wallAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 3371US8383002B2Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injectionAPPLIED MATERIALS INC·Filed 2010·Granted Feb 26, 2013·2 cites·6 claims
- 3469US11094511B2Processing chamber with substrate edge enhancement processingAPPLIED MATERIALS INC·Filed 2018·Granted Aug 17, 2021·1 cites·14 claims
- 3568US10770269B2Apparatus and methods for reducing particles in semiconductor process chambersAPPLIED MATERIALS INC·Filed 2017·Granted Sep 8, 2020·0 cites·9 claims
- 3668US9948214B2High temperature electrostatic chuck with real-time heat zone regulating capabilityAPPLIED MATERIALS INC·Filed 2013·Granted Apr 17, 2018·2 cites·21 claims
- 3768US8771423B2Low sloped edge ring for plasma processing chamberAPPLIED MATERIALS INC·Filed 2012·Granted Jul 8, 2014·2 cites·4 claims
- 3868US7602484B2Method and apparatus for performing limited area spectral analysisAPPLIED MATERIALS INC·Filed 2007·Granted Oct 13, 2009·2 cites·20 claims
- 3967US9362148B2Shielded lid heater assemblyWILLWERTH MICHAEL D·Filed 2013·Granted Jun 7, 2016·1 cites·15 claims
- 4066US10460968B2Electrostatic chuck with variable pixelated magnetic fieldAPPLIED MATERIALS INC·Filed 2013·Granted Oct 29, 2019·1 cites·6 claims
- 4165US12437979B2Capacitive sensors and capacitive sensing locations for plasma chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Oct 7, 2025·0 cites·12 claims
- 4264US11545346B2Capacitive sensing data integration for plasma chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Jan 3, 2023·0 cites·8 claims
- 4363US11415538B2Capacitive sensor housing for chamber condition monitoringAPPLIED MATERIALS INC·Filed 2020·Granted Aug 16, 2022·0 cites·8 claims
- 4460US12009191B2Thin film, in-situ measurement through transparent crystal and transparent substrate within processing chamber wallAPPLIED MATERIALS INC·Filed 2020·Granted Jun 11, 2024·0 cites·19 claims
- 4559US9443753B2Apparatus for controlling the flow of a gas in a process chamberPALAGASHVILI DAVID·Filed 2011·Granted Sep 13, 2016·1 cites·15 claims
- 4657US10083816B2Shielded lid heater assemblyAPPLIED MATERIALS INC·Filed 2016·Granted Sep 25, 2018·0 cites·20 claims
- 4756US10770329B2Gas flow for condensation reduction with a substrate processing chuckAPPLIED MATERIALS INC·Filed 2018·Granted Sep 8, 2020·0 cites·13 claims
- 4856US2014345803A1Method and apparatus for stable plasma processingAPPLIED MATERIALS INC·Filed 2014·Application pending·0 cites
- 4955US2025095970A1Plasma processing chamber lid coolingAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 5053US11264252B2Chamber lid with integrated heaterAPPLIED MATERIALS INC·Filed 2019·Granted Mar 1, 2022·0 cites·20 claims
Showing the top 50 of 68 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →