Inventor · disambiguated record
Moritz Becker
Also filed as: BECKER MORITZ · BECKER MORITZ Y
25 granted patents·12 pending applications·140 citations·filing 2006–2025
94Inventor score
Top patents by PatentIndex Score
37 records- 0191US8938783B2Security language expressions for logic resolutionBECKER MORITZ Y·Filed 2006·Granted Jan 20, 2015·33 cites·20 claims
- 0289US8584230B2Security authorization queriesDILLAWAY BLAIR B·Filed 2011·Granted Nov 12, 2013·12 cites·20 claims
- 0389US8060931B2Security authorization queriesDILLAWAY BLAIR B·Filed 2006·Granted Nov 15, 2011·19 cites·18 claims
- 0488US8095969B2Security assertion revocationDILLAWAY BLAIR B·Filed 2006·Granted Jan 10, 2012·18 cites·13 claims
- 0585US8656503B2Security language translations with logic resolutionBECKER MORITZ Y·Filed 2006·Granted Feb 18, 2014·15 cites·6 claims
- 0678US11199363B2Method for removing a contamination layer by an atomic layer etching processZEISS CARL SMT GMBH·Filed 2020·Granted Dec 14, 2021·1 cites·23 claims
- 0778US8201215B2Controlling the delegation of rightsDILLAWAY BLAIR B·Filed 2006·Granted Jun 12, 2012·9 cites·20 claims
- 0875US8296822B2State-updating authorizationBECKER MORITZ·Filed 2009·Granted Oct 23, 2012·8 cites·19 claims
- 0975US2025278025A1Euv optics module for an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 1074US8010560B2Abducing assertion to support access queryMICROSOFT CORP·Filed 2007·Granted Aug 30, 2011·7 cites·20 claims
- 1170US8407807B2Dynamic assertion providers for logic-based security policy languagesBECKER MORITZ Y·Filed 2010·Granted Mar 26, 2013·3 cites·20 claims
- 1269US10649340B2Reflective optical element for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted May 12, 2020·1 cites·18 claims
- 1369US8839344B2Access policy analysisBECKER MORITZ Y·Filed 2008·Granted Sep 16, 2014·5 cites·20 claims
- 1468US12306551B2Projection exposure apparatus having a device for determining the concentration of atomic hydrogenZEISS CARL SMT GMBH·Filed 2022·Granted May 20, 2025·0 cites·19 claims
- 1566US12287588B2Method for operating an EUV lithography apparatus, and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2022·Granted Apr 29, 2025·0 cites·21 claims
- 1666US8607311B2Delegation in logic-based access controlBECKER MORITZ Y·Filed 2007·Granted Dec 10, 2013·4 cites·19 claims
- 1766US2024302756A1Method for depositing a cover layer, euv lithography system and optical elementZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 1865US10061205B2Reflective optical elementZEISS CARL SMT GMBH·Filed 2017·Granted Aug 28, 2018·1 cites·20 claims
- 1965US2024319621A1Apparatus and method for avoiding a degradation of an optical used surface of a mirror module, projection system, illumination system and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2065US2024248408A1Multi-mirror arrayZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2163US9251342B2Evaluating detectability of information in authorization policiesBECKER MORITZ·Filed 2011·Granted Feb 2, 2016·2 cites·20 claims
- 2262US8339576B2Projection objective of a microlithographic projection exposure apparatusLOERING ULRICH·Filed 2012·Granted Dec 25, 2012·1 cites·20 claims
- 2361US2024302304A1Electron microscope for examining a specimenZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2458US9160738B2Delegation-based authorizationBECKER MORITZ·Filed 2010·Granted Oct 13, 2015·1 cites·20 claims
- 2557US11307505B2Method for operating an optical apparatus, and optical apparatusZEISS CARL SMT GMBH·Filed 2020·Granted Apr 19, 2022·0 cites·29 claims
- 2656US9282121B2Security language translations with logic resolutionMICROSOFT TECHNOLOGY LICENSING LLC·Filed 2014·Granted Mar 8, 2016·0 cites·17 claims
- 2754US10712677B2Projection exposure system for semiconductor lithography, comprising elements for plasma conditioningZEISS CARL SMT GMBH·Filed 2018·Granted Jul 14, 2020·0 cites·18 claims
- 2853US11137687B2Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasmaZEISS CARL SMT GMBH·Filed 2020·Granted Oct 5, 2021·0 cites·15 claims
- 2953US9874175B2External heat engine deviceVIKING HEAT ENGINES AS·Filed 2014·Granted Jan 23, 2018·0 cites·10 claims
- 3048US2010205649A1Credential gathering with deferred instantiationMICROSOFT CORP·Filed 2009·Application pending·0 cites
- 3146US2010153695A1Data handling preferences and policies within security policy assertion languageMICROSOFT CORP·Filed 2008·Application pending·0 cites
- 3245US10627217B2Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography systemZEISS CARL SMT GMBH·Filed 2017·Granted Apr 21, 2020·0 cites·14 claims
- 3345US2023416907A1Process for manufacturing silicon-containing materialsWACKER CHEMIE AG·Filed 2020·Application pending·0 cites
- 3445US2008065899A1Variable Expressions in Security AssertionsMICROSOFT CORP·Filed 2006·Application pending·0 cites
- 3544US2008066169A1Fact Qualifiers in Security ScenariosMICROSOFT CORP·Filed 2006·Application pending·0 cites
- 3643US2016207078A1Optical arrangement, in particular plasma light source or euv lithography systemZEISS CARL SMT GMBH·Filed 2016·Application pending·0 cites
- 3736US2011283335A1Handling privacy preferences and policies through logic languageBUSSARD LAURENT·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →