Inventor · disambiguated record
Mona Eissa
Also filed as: EISSA MONA · EISSA MONA M
35 granted patents·11 pending applications·404 citations·filing 1997–2022
97Inventor score
Top patents by PatentIndex Score
46 records- 0195US6383928B1Post copper CMP cleanTEXAS INSTRUMENTS INC·Filed 2000·Granted May 7, 2002·109 cites·21 claims
- 0293US7833895B2TSVS having chemically exposed TSV tips for integrated circuit devicesTEXAS INSTRUMENTS INC·Filed 2009·Granted Nov 16, 2010·24 cites·8 claims
- 0393US7179751B2Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materialsTEXAS INSTRUMENTS INC·Filed 2005·Granted Feb 20, 2007·22 cites·8 claims
- 0487US6806193B2CMP in-situ conditioning with pad and retaining ring cleanTEXAS INSTRUMENTS INC·Filed 2003·Granted Oct 19, 2004·29 cites·31 claims
- 0578US10017851B2Magnetic field annealing for integrated fluxgate sensorsTEXAS INSTRUMENTS INC·Filed 2015·Granted Jul 10, 2018·1 cites·15 claims
- 0678US6939795B2Selective dry etching of tantalum and tantalum nitrideTEXAS INSTRUMENTS INC·Filed 2002·Granted Sep 6, 2005·19 cites·9 claims
- 0777US11075157B2IC having trench-based metal-insulator-metal capacitorTEXAS INSTRUMENTS INC·Filed 2019·Granted Jul 27, 2021·2 cites·22 claims
- 0874US6723658B2Gate structure and methodTEXAS INSTRUMENTS INC·Filed 2002·Granted Apr 20, 2004·15 cites·8 claims
- 0972US10266950B2Process for NiFe fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2017·Granted Apr 23, 2019·1 cites·17 claims
- 1072US6624086B1Effective solution and process to wet-etch metal-alloy films in semiconductor processingTEXAS INSTRUMENTS INC·Filed 2000·Granted Sep 23, 2003·12 cites·7 claims
- 1172US6551943B1Wet clean of organic silicate glass filmsTEXAS INSTRUMENTS INC·Filed 2000·Granted Apr 22, 2003·16 cites·2 claims
- 1271US9771261B1Selective patterning of an integrated fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2016·Granted Sep 26, 2017·1 cites·17 claims
- 1371US7153782B2Effective solution and process to wet-etch metal-alloy films in semiconductor processingTEXAS INSTRUMENTS INC·Filed 2003·Granted Dec 26, 2006·11 cites·8 claims
- 1470US11508721B2Integrated fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2021·Granted Nov 22, 2022·0 cites·5 claims
- 1569US6030706AIntegrated circuit insulator and methodTEXAS INSTRUMENTS INC·Filed 1997·Granted Feb 29, 2000·33 cites·4 claims
- 1668US12512322B2Small grain size polysilicon engineering for threshold voltage mismatch improvementTEXAS INSTRUMENTS INC·Filed 2022·Granted Dec 30, 2025·0 cites·26 claims
- 1767US9840781B2Process for NiFe fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2014·Granted Dec 12, 2017·1 cites·17 claims
- 1867US7354853B2Selective dry etching of tantalum and tantalum nitrideTEXAS INSTRUMENTS INC·Filed 2005·Granted Apr 8, 2008·2 cites·8 claims
- 1966US6605536B2Treatment of low-k dielectric films to enable patterning of deep submicron featuresTEXAS INSTRUMENTS INC·Filed 2002·Granted Aug 12, 2003·9 cites·7 claims
- 2066US6579798B2Processes for chemical-mechanical polishing of a semiconductor waferTEXAS INSTRUMENTS INC·Filed 2001·Granted Jun 17, 2003·13 cites·20 claims
- 2165US6316350B1Post fuse slag etchTEXAS INSTRUMENTS INC·Filed 2000·Granted Nov 13, 2001·10 cites·10 claims
- 2264US11616011B2IC having trench-based metal-insulator-metal capacitorTEXAS INSTRUMENTS INC·Filed 2021·Granted Mar 28, 2023·0 cites·25 claims
- 2364US6967173B2Hydrogen plasma photoresist strip and polymeric residue cleanup processs for low dielectric constant materialsTEXAS INSTRUMENTS INC·Filed 2001·Granted Nov 22, 2005·9 cites·29 claims
- 2460US5888905AIntegrated circuit insulator and methodTEXAS INSTRUMENTS INC·Filed 1997·Granted Mar 30, 1999·23 cites·5 claims
- 2559US7268073B2Post-polish treatment for inhibiting copper corrosionTEXAS INSTRUMENTS INC·Filed 2004·Granted Sep 11, 2007·9 cites·8 claims
- 2658US10005662B2Selective patterning of titanium encapsulation layersTEXAS INSTRUMENTS INC·Filed 2017·Granted Jun 26, 2018·0 cites·27 claims
- 2757US5828132ASemiconductor device having perfluorinated and non-fluorinated parylene intermetal dielectricTEXAS INSTRUMENTS INC·Filed 1997·Granted Oct 27, 1998·20 cites·6 claims
- 2856US2019211458A1PROCESS FOR NiFe FLUXGATE DEVICETEXAS INSTRUMENTS INC·Filed 2019·Application pending·0 cites
- 2955US11972942B2Gate oxide fabrication and systemTEXAS INSTRUMENTS INC·Filed 2021·Granted Apr 30, 2024·0 cites·20 claims
- 3055US10978448B2Integrated fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2016·Granted Apr 13, 2021·0 cites·15 claims
- 3155US10199573B2Magnetic coreTEXAS INSTRUMENTS INC·Filed 2017·Granted Feb 5, 2019·0 cites·23 claims
- 3253US7232768B2Hydrogen plasma photoresist strip and polymeric residue cleanup process for low dielectric constant materialsTEXAS INSTRUMENTS INC·Filed 2007·Granted Jun 19, 2007·0 cites·1 claims
- 3350US6997192B2Control of dissolved gas levels in deionized waterTEXAS INSTRUMENTS INC·Filed 2002·Granted Feb 14, 2006·3 cites·12 claims
- 3449US2007181532A1Cmp clean process for high performance copper/low-k devicesTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 3548US10718826B2High performance fluxgate deviceTEXAS INSTRUMENTS INC·Filed 2014·Granted Jul 21, 2020·0 cites·20 claims
- 3648US2022068649A1Bcd ic with gate etch and self-aligned implant integrationTEXAS INSTRUMENTS INC·Filed 2021·Application pending·0 cites
- 3746US2011018107A1TSVS Having Chemically Exposed TSV Tips for Integrated Circuit DevicesTEXAS INSTRUMENTS INC·Filed 2010·Application pending·0 cites
- 3844US6150010AIntegrated circuit insulatorTEXAS INSTRUMENTS INC·Filed 1997·Granted Nov 21, 2000·10 cites·5 claims
- 3944US2009087956A1Dummy Contact Fill to Improve Post Contact Chemical Mechanical Polish TopographyTEXAS INSTRUMENTS INC·Filed 2007·Application pending·0 cites
- 4042US2005217694A1Control of dissolved gas levels in deionized waterDOKE NILESH S·Filed 2005·Application pending·0 cites
- 4141US2013249096A1Through silicon via fillingEISSA MONA·Filed 2012·Application pending·0 cites
- 4241US2005247675A1Treatment of dies prior to nickel silicide formationTEXAS INSTRUMENTS INC·Filed 2004·Application pending·0 cites
- 4339US2002064951A1Treatment of low-k dielectric films to enable patterning of deep submicron featuresFiled 2001·Application pending·0 cites
- 4437US2004074518A1Surfactants for post-chemical mechanical polishing storage and cleaningTEXAS INSTRUMENTS INC·Filed 2002·Application pending·0 cites
- 4537US2004074517A1Surfactants for chemical mechanical polishingTEXAS INSTRUMENTS INC·Filed 2002·Application pending·0 cites
- 4635US8288283B2Aluminum enhanced palladium CMP processEISSA MONA M·Filed 2011·Granted Oct 16, 2012·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →