Control of dissolved gas levels in deionized water

Abstract

An embodiment of the invention is an apparatus having a cleaning tank 2 , a megasonic energy source 3 , and an intake pipe 6 where a membrane contactor 9 is coupled to the intake pipe 6 to change the concentration of nitrogen gas in the deionized water 8 contained in intake pipe 6 to a range between 5.4% to 54% of saturation. Another embodiment is a method of changing the concentration of nitrogen gas in deionized water 8 to a range between 5.4% to 54% of saturation.

1 . An apparatus comprising: 
 a cleaning station, said cleaning station having a first and second fluid intake pipe;    a megasonic energy source coupled to the inside of said cleaning station; and    a membrane contactor coupled to said first fluid intake pipe, said membrane contactor controlling a partial saturation level of nitrogen gas in a fluid in said first fluid intake pipe, said partial saturation level is in the range between 5.4% to 54% saturation.    
   
   
       2 . The apparatus of  claim 1  wherein said partial saturation level is 27%.  
   
   
       3 . The apparatus of  claim 1  wherein said fluid in said first fluid intake pipe is deionized water.  
   
   
       4 . The apparatus of  claim 1  wherein said second fluid intake pipe contains a high pH fluid.  
   
   
       5 . The apparatus of  claim 1  wherein said membrane contactor has a first input for providing said nitrogen gas to said fluid through a membrane and a second input for providing a vacuum to said fluid through said membrane.  
   
   
       6 . The apparatus of  claim 1  wherein at least one semiconductor wafer containing copper features is located inside said cleaning station.  
   
   
       7 - 15 . (canceled)