Inventor · disambiguated record
Morimi Osawa
Also filed as: OSAWA MORIMI
10 granted patents·300 citations·filing 2002–2012
89Inventor score
Top patents by PatentIndex Score
10 records- 0197US7971160B2Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomaskFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Jun 28, 2011·164 cites·15 claims
- 0294US6677089B2Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure methodFUJITSU LTD·Filed 2002·Granted Jan 13, 2004·68 cites·47 claims
- 0388US6862726B2Light intensity simulation method, program product, and designing method of photomaskFUJITSU LTD·Filed 2003·Granted Mar 1, 2005·35 cites·20 claims
- 0482US7205078B2Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this methodFUJITSU LTD·Filed 2004·Granted Apr 17, 2007·19 cites·29 claims
- 0578US7601471B2Apparatus and method for correcting pattern dimension and photo mask and test photo maskFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Oct 13, 2009·5 cites·18 claims
- 0676US7240307B2Pattern size correcting device and pattern size correcting methodFUJITSU LTD·Filed 2005·Granted Jul 3, 2007·5 cites·36 claims
- 0758US7870520B2Semiconductor device and yield calculation methodFUJITSU SEMICONDUCTOR LTD·Filed 2008·Granted Jan 11, 2011·1 cites·18 claims
- 0854US7732107B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureFUJITSU SEMICONDUCTOR LTD·Filed 2004·Granted Jun 8, 2010·3 cites·1 claims
- 0950US8553198B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2012·Granted Oct 8, 2013·0 cites·2 claims
- 1045US8227153B2Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposureYAO TERUYOSHI·Filed 2010·Granted Jul 24, 2012·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →