Inventor · disambiguated record
Mu Feng
Also filed as: FENG MU
8 granted patents·7 pending applications·4 citations·filing 2017–2023
76Inventor score
Files withASML NETHERLANDS BV15
Top patents by PatentIndex Score
15 records- 0181US12443111B2Prediction data selection for model calibration to reduce model prediction uncertaintyASML NETHERLANDS BV·Filed 2020·Granted Oct 14, 2025·1 cites·20 claims
- 0276US11675274B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2018·Granted Jun 13, 2023·1 cites·20 claims
- 0376US11567413B2Method for determining stochastic variation of printed patternsASML NETHERLANDS BV·Filed 2020·Granted Jan 31, 2023·1 cites·20 claims
- 0475US12468232B2Etch bias characterization and method of using the sameASML NETHERLANDS BV·Filed 2023·Granted Nov 11, 2025·0 cites·20 claims
- 0568US11614690B2Methods of tuning process modelsASML NETHERLANDS BV·Filed 2018·Granted Mar 28, 2023·1 cites·20 claims
- 0661US2025355364A1Modelling of multi-level etch processesASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0758US2024377343A1Method for converting metrology dataASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0857US12339591B2Determining metrics for a portion of a pattern on a substrateASML NETHERLANDS BV·Filed 2021·Granted Jun 24, 2025·0 cites·20 claims
- 0954US11977336B2Method for improving a process for a patterning processASML NETHERLANDS BV·Filed 2019·Granted May 7, 2024·0 cites·21 claims
- 1050US2023298158A1Apparatus and method for selecting high quality images from raw images automaticallyASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 1150US2024385530A1Etching systems, models, and manufacturing processesASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 1245US2022299881A1Methods for improving process based contour information of structure in imageASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1344US11314172B2Instant tuning method for accelerating resist and etch model calibrationASML NETHERLANDS BV·Filed 2019·Granted Apr 26, 2022·0 cites·20 claims
- 1444US2022113632A1Gauge selection for model calibrationASML NETHERLANDS BV·Filed 2020·Application pending·0 cites
- 1537US2021294218A1Modeling post-exposure processesASML NETHERLANDS BV·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →