Inventor · disambiguated record
Mutsuo Nakashima
Also filed as: NAKASHIMA MUTSUO
70 granted patents·3 pending applications·1,117 citations·filing 1995–2009
99Inventor score
Top patents by PatentIndex Score
73 records- 0199US6448420B1Acid-decomposable ester compound suitable for use in resist materialSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 10, 2002·160 cites·5 claims
- 0299US6312867B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 6, 2001·209 cites·17 claims
- 0397US6147249AEster compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 1999·Granted Nov 14, 2000·81 cites·20 claims
- 0496US6284429B1Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 4, 2001·50 cites·19 claims
- 0592US8026038B2Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning methodSHINETSU CHEMICAL CO·Filed 2008·Granted Sep 27, 2011·19 cites·20 claims
- 0692US6309796B1High molecular weight silicone compounds resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 1998·Granted Oct 30, 2001·63 cites·23 claims
- 0791US8198016B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Jun 12, 2012·13 cites·17 claims
- 0891US6730453B2High molecular weight silicone compounds, resist compositions, and patterning methodSHINETSU CHEMICAL CO·Filed 2001·Granted May 4, 2004·42 cites·14 claims
- 0991US5972560AHigh molecular weight silicone compound, chemically amplified positive resist composition and patterning methodSHINETSU CHEMICAL CO·Filed 1998·Granted Oct 26, 1999·94 cites·15 claims
- 1087US6512067B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·23 cites·18 claims
- 1187US6444396B1Ester compounds, polymers, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Sep 3, 2002·24 cites·19 claims
- 1287US6413695B1Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Jul 2, 2002·18 cites·15 claims
- 1386US6492090B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 10, 2002·25 cites·5 claims
- 1482US6673515B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 6, 2004·20 cites·20 claims
- 1582US6369279B1Styrene derivativesSHINETSU CHEMICAL CO·Filed 2000·Granted Apr 9, 2002·12 cites·25 claims
- 1681US6461791B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·20 cites·34 claims
- 1778US6586157B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 1, 2003·12 cites·16 claims
- 1878US6492089B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Dec 10, 2002·14 cites·19 claims
- 1978US6472543B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Oct 29, 2002·7 cites·4 claims
- 2076US7745094B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 29, 2010·4 cites·8 claims
- 2176US7265234B2Silsesquioxane compound mixture, method of making, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Sep 4, 2007·4 cites·6 claims
- 2276US6962767B2Acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 8, 2005·10 cites·21 claims
- 2375US8129100B2Double patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 6, 2012·4 cites·14 claims
- 2475US6500961B2Lactone compounds having alicyclic structure and their manufacturing methodSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 31, 2002·6 cites·3 claims
- 2574US6566038B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted May 20, 2003·13 cites·21 claims
- 2673US6596463B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jul 22, 2003·8 cites·25 claims
- 2771US6403822B2Ester compounds having alicyclic structure and method for preparing sameSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 11, 2002·5 cites·14 claims
- 2870US6531627B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Mar 11, 2003·4 cites·3 claims
- 2968US6403823B2Ester compounds having alicyclic structure and method for preparing sameSHINETSU CHEMICAL CO·Filed 2001·Granted Jun 11, 2002·9 cites·15 claims
- 3061US5527490ASilacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compoundSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 18, 1996·8 cites·14 claims
- 3160US6515149B2Acetal compound, polymer, resist composition and patterning responseSHINETSU CHEMICAL CO·Filed 2001·Granted Feb 4, 2003·3 cites·3 claims
- 3260US6461790B1Polymers, chemical amplification resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2000·Granted Oct 8, 2002·5 cites·28 claims
- 3359US6670094B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Dec 30, 2003·5 cites·7 claims
- 3459US6624335B2Ether, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Sep 23, 2003·4 cites·4 claims
- 3559US5582764ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Dec 10, 1996·17 cites·33 claims
- 3658US7651829B2Positive resist material and pattern formation method using the sameSHINETSU CHEMICAL CO·Filed 2004·Granted Jan 26, 2010·9 cites·8 claims
- 3758US6835525B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Dec 28, 2004·4 cites·14 claims
- 3857US5578244ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Nov 26, 1996·7 cites·12 claims
- 3957US5560866AProcess for preparing silacyclohexane compoundsSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 1, 1996·7 cites·5 claims
- 4057US5523440ASilacyclohexane compound, a method of preparaing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 4, 1996·7 cites·7 claims
- 4155US5679746ASilacyclohexane compound, a method of preparing it and a liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 21, 1997·6 cites·11 claims
- 4255US5641431ASilacyclohexanone compound and a method of preparing a silacyclohexane-type liquid crystal composition containing itSHINETSU CHEMICAL CO·Filed 1995·Granted Jun 24, 1997·6 cites·4 claims
- 4354US6780563B2Polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Aug 24, 2004·3 cites·20 claims
- 4454US6677101B2Polymers, resist materials, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2002·Granted Jan 13, 2004·3 cites·20 claims
- 4553US6670498B2Ester compounds, polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Dec 30, 2003·2 cites·18 claims
- 4653US5582765ATriflate compounds and process for preparing silacyclohexane-based liquid crystal compounds from the triflate compoundsSHINETSU CHEMICAL CO·Filed 1995·Granted Dec 10, 1996·5 cites·7 claims
- 4753US2008038664A1Silsesquioxane compound mixture, method of making, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 4849US7638256B2Fluorinated cyclic structure-bearing silicon compounds and silicone resins, resist compositions using the same, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 29, 2009·0 cites·11 claims
- 4949US6784268B2Ether, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Aug 31, 2004·0 cites·8 claims
- 5048US6743566B2Cyclic acetal compound, polymer, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Jun 1, 2004·1 cites·19 claims
Showing the top 50 of 73 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Mutsuo Nakashima files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →