Inventor · disambiguated record
Nabila Baba-Ali
Also filed as: BABA-ALI NABILA
10 granted patents·324 citations·filing 2003–2007
90Inventor score
Files withASML HOLDING NV10
Top patents by PatentIndex Score
10 records- 0197US7063920B2Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systemsASML HOLDING NV·Filed 2003·Granted Jun 20, 2006·211 cites·22 claims
- 0296US7445883B2Lithographic printing with polarized lightASML HOLDING NV·Filed 2006·Granted Nov 4, 2008·46 cites·19 claims
- 0395US7400382B2Light patterning device using tilting mirrors in a superpixel formASML HOLDING NV·Filed 2005·Granted Jul 15, 2008·24 cites·29 claims
- 0488US7354169B2Pattern generator using a dual phase step element and method of using sameASML HOLDING NV·Filed 2007·Granted Apr 8, 2008·9 cites·9 claims
- 0581US7589819B2Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systemsASML HOLDING NV·Filed 2006·Granted Sep 15, 2009·5 cites·13 claims
- 0680US7520626B2Pattern generator using a dual phase step element and method of using sameASML HOLDING NV·Filed 2007·Granted Apr 21, 2009·8 cites·9 claims
- 0779US7090964B2Lithographic printing with polarized lightASML HOLDING NV·Filed 2004·Granted Aug 15, 2006·18 cites·29 claims
- 0871US7286137B2Method and system for constrained pixel graytones interpolation for pattern rasterizationASML HOLDING NV·Filed 2005·Granted Oct 23, 2007·3 cites·18 claims
- 0944US7643192B2Pattern generator using a dual phase step element and method of using sameASML HOLDING NV·Filed 2004·Granted Jan 5, 2010·0 cites·21 claims
- 1042US7274502B2System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masksASML HOLDING NV·Filed 2004·Granted Sep 25, 2007·0 cites·25 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →