Inventor · disambiguated record
Naoto Motoike
Also filed as: MOTOIKE NAOTO
10 granted patents·8 pending applications·24 citations·filing 2002–2019
82Inventor score
Top patents by PatentIndex Score
18 records- 0183US8283105B2Positive resist composition and method of forming resist patternKAKINOYA YASUHIKO·Filed 2010·Granted Oct 9, 2012·10 cites·8 claims
- 0279US8257904B2Resist composition and method of forming resist patternMOTOIKE NAOTO·Filed 2009·Granted Sep 4, 2012·11 cites·12 claims
- 0369US8367299B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2011·Granted Feb 5, 2013·1 cites·15 claims
- 0469US8206890B2Resist composition, method of forming resist pattern, compound and acid generatorKAWAUE AKIYA·Filed 2009·Granted Jun 26, 2012·2 cites·10 claims
- 0558US2009311625A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2009·Application pending·0 cites
- 0656US2008227027A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2008·Application pending·0 cites
- 0753US2007141514A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2007·Application pending·0 cites
- 0850US2005266346A1Method for forming photoresist pattern and photoresist laminateYAMAZAKI AKIYOSHI·Filed 2005·Application pending·0 cites
- 0948US9274424B2Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Mar 1, 2016·0 cites·5 claims
- 1047US8945812B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Feb 3, 2015·0 cites·20 claims
- 1145US9235123B2Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 12, 2016·0 cites·3 claims
- 1245US2020192223A1Resist composition, method of forming resist pattern, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2019·Application pending·0 cites
- 1343US2004248033A1Method for forming photoresist pattern and photoresist laminateFiled 2004·Application pending·0 cites
- 1441US9459535B2Method of forming patternTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Oct 4, 2016·0 cites·7 claims
- 1541US8252509B2Resist composition and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2010·Granted Aug 28, 2012·0 cites·7 claims
- 1641US2003129534A1Method for forming photoresist pattern and photoresist laminateFiled 2002·Application pending·0 cites
- 1737US7629105B2Positive photoresist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 8, 2009·0 cites·13 claims
- 1836US2005170276A1Chemical-amplification positive-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Naoto Motoike files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →