Inventor · disambiguated record
Naotaka Noro
Also filed as: NORO NAOTAKA
14 granted patents·6 pending applications·51 citations·filing 2006–2020
89Inventor score
Top patents by PatentIndex Score
20 records- 0191US11081322B2Film forming apparatus, cleaning method for film forming apparatus and recording mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 3, 2021·5 cites·8 claims
- 0289US7494943B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Feb 24, 2009·10 cites·20 claims
- 0387US10392698B2Film forming method, film forming system and surface processing methodTOKYO ELECTRON LTD·Filed 2017·Granted Aug 27, 2019·2 cites·15 claims
- 0478US7727296B2Collecting unit for semiconductor processTOKYO ELECTRON LTD·Filed 2007·Granted Jun 1, 2010·17 cites·18 claims
- 0577US11450512B2Plasma processing methodTOKYO ELECTRON LTD·Filed 2018·Granted Sep 20, 2022·2 cites·2 claims
- 0674US11377739B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Jul 5, 2022·1 cites·4 claims
- 0774US8808452B2Silicon film formation apparatus and method for using sameNORO NAOTAKA·Filed 2010·Granted Aug 19, 2014·6 cites·9 claims
- 0867US7938080B2Method for using film formation apparatusTOKYO ELECTRON LTD·Filed 2008·Granted May 10, 2011·8 cites·5 claims
- 0956US2020208260A1Method of Forming RuSi Film and Film and Film-Forming ApparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1055US2021301402A1Film forming apparatus and film forming methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1150US10872764B2Film forming methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 22, 2020·0 cites·8 claims
- 1249US11721557B2Etching methodTOKYO ELECTRON LTD·Filed 2019·Granted Aug 8, 2023·0 cites·8 claims
- 1348US10519548B2Film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Dec 31, 2019·0 cites·1 claims
- 1447US11981992B2Method for forming RuSi film and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted May 14, 2024·0 cites·4 claims
- 1547US10535528B2Method of forming titanium oxide film and method of forming hard maskTOKYO ELECTRON LTD·Filed 2017·Granted Jan 14, 2020·0 cites·13 claims
- 1644US2015179408A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1741US10811264B2Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Oct 20, 2020·0 cites·8 claims
- 1839US2022068637A1Film-forming method, film-forming apparatus, and oxidation methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1937US2018047647A1Analysis method for silanol group of substrate surfaceTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 2033US2013115367A1Method for forming ruthenium oxide filmTOKYO ELECTRON LTD·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →