Inventor · disambiguated record
Nakgeuon Seong
Also filed as: SEONG NAKGEUON
11 granted patents·3 pending applications·246 citations·filing 2001–2013
92Inventor score
Top patents by PatentIndex Score
14 records- 0195US7079223B2Fast model-based optical proximity correctionIBM·Filed 2004·Granted Jul 18, 2006·86 cites·24 claims
- 0290US9207119B2Active spectral control during spectrum synthesisCymer LLC·Filed 2013·Granted Dec 8, 2015·11 cites·27 claims
- 0389US6842237B2Phase shifted test pattern for monitoring focus and aberrations in optical projection systemsIBM·Filed 2001·Granted Jan 11, 2005·36 cites·17 claims
- 0488US7536664B2Physical design system and methodIBM·Filed 2004·Granted May 19, 2009·44 cites·18 claims
- 0586US8473885B2Physical design system and methodCOHN JOHN M·Filed 2012·Granted Jun 25, 2013·8 cites·20 claims
- 0684US8520186B2Active spectral control of optical sourceSEONG NAKGEUON·Filed 2010·Granted Aug 27, 2013·11 cites·20 claims
- 0783US7269817B2Lithographic process window optimization under complex constraints on edge placementIBM·Filed 2004·Granted Sep 11, 2007·23 cites·6 claims
- 0878US8238644B2Fast method to model photoresist images using focus blur and resist blurBRUNNER TIMOTHY A·Filed 2006·Granted Aug 7, 2012·5 cites·22 claims
- 0977US8219943B2Physical design system and methodCOHN JOHN M·Filed 2009·Granted Jul 10, 2012·6 cites·24 claims
- 1073US7605447B2Highly manufacturable SRAM cells in substrates with hybrid crystal orientationIBM·Filed 2005·Granted Oct 20, 2009·12 cites·12 claims
- 1163US6919146B2Planar reticle design/fabrication method for rapid inspection and cleaningIBM·Filed 2002·Granted Jul 19, 2005·4 cites·20 claims
- 1254US2008320435A1Optical proximity correction improvement by fracturing after pre-optical proximity correctionIBM·Filed 2008·Application pending·0 cites
- 1350US2008168419A1Optical proximity correction improvement by fracturing after pre-optical proximity correctionIBM·Filed 2007·Application pending·0 cites
- 1439US2005287483A1Contact hole printing method and apparatus with single mask, multiple exposures, and optimized pupil filteringIBM·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →