Inventor · disambiguated record
Nagesh Shirali
Also filed as: SHIRALI NAGESH
20 granted patents·6 pending applications·19 citations·filing 2018–2025
91Inventor score
Files withD2S INC26
Top patents by PatentIndex Score
26 records- 0197US12019973B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2023·Granted Jun 25, 2024·3 cites·17 claims
- 0296US11062878B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2020·Granted Jul 13, 2021·5 cites·15 claims
- 0395US11783110B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2021·Granted Oct 10, 2023·3 cites·5 claims
- 0491US11756765B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2021·Granted Sep 12, 2023·2 cites·16 claims
- 0591US2025371241A1Computing parasitic values for semiconductor designsD2S INC·Filed 2025·Application pending·0 cites
- 0690US10748744B1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2019·Granted Aug 18, 2020·5 cites·14 claims
- 0787US12340164B2Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2024·Granted Jun 24, 2025·0 cites·17 claims
- 0887US12248242B2Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2024·Granted Mar 11, 2025·0 cites·20 claims
- 0984US12287567B2Method and system for reticle enhancement technologyD2S INC·Filed 2024·Granted Apr 29, 2025·0 cites·22 claims
- 1083US11953824B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2023·Granted Apr 9, 2024·0 cites·20 claims
- 1180US12372864B2Methods and systems to determine shapes for semiconductor or flat panel display fabricationD2S INC·Filed 2020·Granted Jul 29, 2025·1 cites·26 claims
- 1280US12243712B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2023·Granted Mar 4, 2025·0 cites·17 claims
- 1380US2025347990A1Methods and systems to determine shapes for semiconductor or flat panel display fabricationD2S INC·Filed 2025·Application pending·0 cites
- 1479US12387029B2Computing parasitic values for semiconductor designsD2S INC·Filed 2022·Granted Aug 12, 2025·0 cites·20 claims
- 1579US11921420B2Method and system for reticle enhancement technologyD2S INC·Filed 2023·Granted Mar 5, 2024·0 cites·18 claims
- 1679US11886166B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2023·Granted Jan 30, 2024·0 cites·20 claims
- 1778US12499301B2Computing parasitic values for semiconductor designsD2S INC·Filed 2022·Granted Dec 16, 2025·0 cites·20 claims
- 1878US12488175B2Methods and systems to determine parasitics for semiconductor or flat panel display fabricationD2S INC·Filed 2022·Granted Dec 2, 2025·0 cites·17 claims
- 1976US11693306B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2021·Granted Jul 4, 2023·0 cites·5 claims
- 2076US2025291999A1Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2025·Application pending·0 cites
- 2172US2025237940A1Method and system for reticle enhancement technologyD2S INC·Filed 2025·Application pending·0 cites
- 2272US2023124768A1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2022·Application pending·0 cites
- 2371US11592802B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2020·Granted Feb 28, 2023·0 cites·18 claims
- 2469US11604451B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2021·Granted Mar 14, 2023·0 cites·19 claims
- 2561US10884395B2Method and system of reducing charged particle beam write timeD2S INC·Filed 2018·Granted Jan 5, 2021·0 cites·20 claims
- 2650US2023092665A1Using a machine-trained network to perform physical designD2S INC·Filed 2022·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Nagesh Shirali files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →