Inventor · disambiguated record
Naoki Takeyama
Also filed as: TAKEYAMA NAOKI
21 granted patents·259 citations·filing 1991–2003
95Inventor score
Files withSUMITOMO CHEMICAL CO21
Top patents by PatentIndex Score
21 records- 0185US5731110APhotoresist composition for use in color filtersSUMITOMO CHEMICAL CO·Filed 1996·Granted Mar 24, 1998·21 cites·8 claims
- 0283US6656660B1Resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Dec 2, 2003·56 cites·2 claims
- 0378US6329119B1Negative type resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Dec 11, 2001·15 cites·13 claims
- 0473US5686585AAzo dyes for use in color filters and method for production of color filtersSUMITOMO CHEMICAL CO·Filed 1994·Granted Nov 11, 1997·10 cites·11 claims
- 0572US5876895APhotosensitive resin composition for color filterSUMITOMO CHEMICAL CO·Filed 1996·Granted Mar 2, 1999·35 cites·5 claims
- 0669US5585218APhotoresist composition containing alkyletherified polyvinylphenolSUMITOMO CHEMICAL CO·Filed 1994·Granted Dec 17, 1996·24 cites·10 claims
- 0763US5478680AColor filterSUMITOMO CHEMICAL CO·Filed 1994·Granted Dec 26, 1995·17 cites·14 claims
- 0862US5304456ANegative photoresist compositionSUMITOMO CHEMICAL CO·Filed 1992·Granted Apr 19, 1994·17 cites·21 claims
- 0952US6280902B1Positive working photoresist compositions comprising a nitrogen-containing cyclic compoundSUMITOMO CHEMICAL CO·Filed 2000·Granted Aug 28, 2001·3 cites·7 claims
- 1045US5362598AQuinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dyeSUMITOMO CHEMICAL CO·Filed 1993·Granted Nov 8, 1994·7 cites·13 claims
- 1144US5965748ASuccinimide derivative, process for production and use thereofSUMITOMO CHEMICAL CO·Filed 1998·Granted Oct 12, 1999·2 cites·6 claims
- 1244US5397679ACyclic carbonate compounds, method for producing the same and positive photoresist composition using the sameSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 14, 1995·8 cites·14 claims
- 1344US5395727APositive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenolSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 7, 1995·5 cites·10 claims
- 1443USRE40964ENegative type resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted Nov 10, 2009·0 cites·13 claims
- 1543US5198323AResist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation componentSUMITOMO CHEMICAL CO·Filed 1991·Granted Mar 30, 1993·7 cites·13 claims
- 1639US5846688APhotoresist compositionSUMITOMO CHEMICAL CO·Filed 1996·Granted Dec 8, 1998·6 cites·12 claims
- 1738US5985511APhotoresist compositionSUMITOMO CHEMICAL CO·Filed 1996·Granted Nov 16, 1999·6 cites·10 claims
- 1838US5420331ACyclic carbonate compounds, method for producing the same and positive photoresist composition using the sameSUMITOMO CHEMICAL CO·Filed 1994·Granted May 30, 1995·5 cites·5 claims
- 1937US5614594ACurable resin composition for overcoat film of color filter and color filterSUMITOMO CHEMICAL CO·Filed 1995·Granted Mar 25, 1997·7 cites·10 claims
- 2035US6156476APositive photoresist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Dec 5, 2000·5 cites·29 claims
- 2134US5800966APositive photoresist compositionSUMITOMO CHEMICAL CO·Filed 1993·Granted Sep 1, 1998·3 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →