Inventor · disambiguated record
Naoya Uchiyama
Also filed as: UCHIYAMA NAOYA
13 granted patents·6 pending applications·38 citations·filing 2011–2024
87Inventor score
Files withMITSUBISHI GAS CHEMICAL CO7KEYENCE CO LTD5HIGASHIHARA GO2MITSUBISHI ELECTRIC CORP2ECHIGO MASATOSHI1
Top patents by PatentIndex Score
19 records- 0192US9316913B2Underlayer film-forming material for lithography, underlayer film for lithography, and pattern formation methodECHIGO MASATOSHI·Filed 2012·Granted Apr 19, 2016·15 cites·9 claims
- 0286US9117137B2Visual inspection device, visual inspection method, and computer programKEYENCE CO LTD·Filed 2012·Granted Aug 25, 2015·13 cites·18 claims
- 0377US10137574B2Image processing apparatus, image processing system, image processing method, and computer programKEYENCE CO LTD·Filed 2015·Granted Nov 27, 2018·3 cites·13 claims
- 0472US9920024B2Method for purifying compound or resinMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Mar 20, 2018·1 cites·13 claims
- 0567US8741553B2Aromatic hydrocarbon resin, underlayer film forming composition for lithography, and method for forming multilayer resist patternHIGASHIHARA GO·Filed 2011·Granted Jun 3, 2014·3 cites·12 claims
- 0662US9809601B2Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Nov 7, 2017·1 cites·16 claims
- 0760US2025004629A1Inspection setting deviceKEYENCE CO LTD·Filed 2024·Application pending·0 cites
- 0859US12118196B2Inspection setting deviceKEYENCE CO LTD·Filed 2023·Granted Oct 15, 2024·0 cites·20 claims
- 0955US10065320B2Image processing apparatus, image processing system, image processing method, and computer programKEYENCE CO LTD·Filed 2015·Granted Sep 4, 2018·1 cites·20 claims
- 1054US9110373B2Phenolic resin and material for forming underlayer film for lithographyUCHIYAMA NAOYA·Filed 2012·Granted Aug 18, 2015·1 cites·14 claims
- 1151US9200105B2Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resinMITSUBISHI GAS CHEMICAL CO·Filed 2013·Granted Dec 1, 2015·0 cites·2 claims
- 1247US12353860B2Programmable controller system, development support device, and recording mediumMITSUBISHI ELECTRIC CORP·Filed 2022·Granted Jul 8, 2025·0 cites·5 claims
- 1347US2015037736A1Acidic treatment-subjected monoalkylnaphthalene formaldehyde resinMITSUBISHI GAS CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1446US9828355B2Compound, material for forming underlayer film for lithography, underlayer film for lithography and pattern forming methodMITSUBISHI GAS CHEMICAL CO·Filed 2014·Granted Nov 28, 2017·0 cites·10 claims
- 1545US2020002307A1Method for purifying compound or resin and method for producing compositionMITSUBISHI GAS CHEMICAL CO·Filed 2018·Application pending·0 cites
- 1642US2015322308A1Epoxy resin, production method thereof, epoxy resin composition, and cured productMITSUBISHI GAS CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1739US11277253B2Time synchronization system, master device, slave device, and programMITSUBISHI ELECTRIC CORP·Filed 2019·Granted Mar 15, 2022·0 cites·20 claims
- 1838US2012207379A1Image Inspection Apparatus, Image Inspection Method, And Computer ProgramSHIMODAIRA MASATO·Filed 2012·Application pending·0 cites
- 1933US2014246400A1Resin having fluorene structure and material for forming underlayer film for lithographyHIGASHIHARA GO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →