Inventor · disambiguated record
Naoki Umeshita
Also filed as: UMESHITA NAOKI
4 granted patents·5 pending applications·0 citations·filing 2021–2025
53Inventor score
Files withTOKYO ELECTRON LTD9
Top patents by PatentIndex Score
9 records- 0171US12406862B2Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2023·Granted Sep 2, 2025·0 cites·3 claims
- 0263US12417928B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2023·Granted Sep 16, 2025·0 cites·9 claims
- 0361US2022403509A1Vacuum processing apparatus and oxidizing gas removal methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 0459US12011738B2Substrate processing method and ionic liquidTOKYO ELECTRON LTD·Filed 2023·Granted Jun 18, 2024·0 cites·18 claims
- 0558US2025381641A1Polishing apparatus and substrate polishing methodTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0651US2025174439A1Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0751US2024420970A1Liquid circulation system, substrate processing apparatus, and liquid circulation methodTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0850US12486575B2Apparatus for processing substrate, gas shower head, and method for processing substrateTOKYO ELECTRON LTD·Filed 2022·Granted Dec 2, 2025·0 cites·7 claims
- 0948US2023223251A1Method of manufacturing semiconductor device, semiconductor manufacturing device, and systemTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →