Inventor · disambiguated record
Nikhil Dole
Also filed as: DOLE NIKHIL
12 granted patents·8 pending applications·94 citations·filing 2015–2025
90Inventor score
Top patents by PatentIndex Score
20 records- 0197US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 0297US9543158B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2015·Granted Jan 10, 2017·28 cites·28 claims
- 0395US10170324B2Technique to tune sidewall passivation deposition conformality for high aspect ratio cylinder etchLAM RES CORP·Filed 2017·Granted Jan 1, 2019·13 cites·23 claims
- 0494US12217972B2Multi-state pulsing for achieving a balance between bow control and mask selectivityLAM RES CORP·Filed 2020·Granted Feb 4, 2025·3 cites·26 claims
- 0591US10297459B2Technique to deposit sidewall passivation for high aspect ratio cylinder etchLAM RES CORP·Filed 2016·Granted May 21, 2019·7 cites·11 claims
- 0689US10861708B2Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2019·Granted Dec 8, 2020·4 cites·20 claims
- 0786US12278112B2Multiple state pulsing for high aspect ratio etchLAM RES CORP·Filed 2022·Granted Apr 15, 2025·1 cites·25 claims
- 0886US10741407B2Reduction of sidewall notching for high aspect ratio 3D NAND etchLAM RES CORP·Filed 2018·Granted Aug 11, 2020·8 cites·18 claims
- 0984US10515821B1Method of achieving high selectivity for high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 24, 2019·3 cites·15 claims
- 1080US10847377B2Method of achieving high selectivity for high aspect ratio dielectric etchLAM RES CORP·Filed 2019·Granted Nov 24, 2020·2 cites·20 claims
- 1173US2024297050A1Method for etching an etch layerLAM RES CORP·Filed 2024·Application pending·0 cites
- 1265US2025210364A1Multiple State Pulsing for High Aspect Ratio EtchLAM RES CORP·Filed 2025·Application pending·0 cites
- 1364US2025349514A1Multi-state rf pulsing to control mask shape and breaking selectivity versus process margin trade-offLAM RES CORP·Filed 2025·Application pending·0 cites
- 1463US2025140565A1Multi-state pulsing for achieving a balance between bow control and mask selectivityLAM RES CORP·Filed 2025·Application pending·0 cites
- 1557US12020944B2Method for etching an etch layerLAM RES CORP·Filed 2019·Granted Jun 25, 2024·0 cites·5 claims
- 1655US2025021194A1On-cell touch and force sensing in displayAPPLE INC·Filed 2024·Application pending·0 cites
- 1752US12322571B2Multi-state RF pulsing to control mask shape and breaking selectivity versus process margin trade-offLAM RES CORP·Filed 2020·Granted Jun 3, 2025·0 cites·23 claims
- 1852US2023260798A1Chemistry for high aspect ratio etch for 3d-nandLAM RES CORP·Filed 2022·Application pending·0 cites
- 1950US2024120209A1Systems and methods for etching a high aspect ratio structureLAM RES CORP·Filed 2021·Application pending·0 cites
- 2049US2025087456A1High selectivity and uniform dielectric etchLAM RES CORP·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →