Inventor · disambiguated record
Noriyuki Anai
Also filed as: ANAI NORIYUKI
26 granted patents·1 pending application·1,276 citations·filing 1989–2002
98Inventor score
Files withTOKYO ELECTRON LTD26
Top patents by PatentIndex Score
27 records- 0197US5002008ACoating apparatus and method for applying a liquid to a semiconductor wafer, including selecting a nozzle in a stand-by stateTOKYO ELECTRON LTD·Filed 1989·Granted Mar 26, 1991·115 cites·12 claims
- 0295US5061144AResist process apparatusTOKYO ELECTRON LTD·Filed 1989·Granted Oct 29, 1991·183 cites·10 claims
- 0392US5919520ACoating method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 1997·Granted Jul 6, 1999·105 cites·16 claims
- 0491US5688322AApparatus for coating resist on substrateTOKYO ELECTRON LTD·Filed 1996·Granted Nov 18, 1997·89 cites·16 claims
- 0590US5089305ACoating apparatus and method for applying a liquid to a semiconductor wafer including selecting a nozzle on a stand by stateTOKYO ELECTRON LTD·Filed 1990·Granted Feb 18, 1992·74 cites·6 claims
- 0689US5505781AHydrophobic processing apparatus including a liquid delivery systemTOKYO ELECTRON LTD·Filed 1994·Granted Apr 9, 1996·64 cites·11 claims
- 0788US6458208B1Film forming apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Oct 1, 2002·40 cites·5 claims
- 0885US6443641B2Substrate process method and substrate process apparatusTOKYO ELECTRON LTD·Filed 2001·Granted Sep 3, 2002·28 cites·7 claims
- 0980US5345639ADevice and method for scrubbing and cleaning substrateTOKYO ELECTRON LTD·Filed 1993·Granted Sep 13, 1994·67 cites·9 claims
- 1078US6749688B2Coating method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 1999·Granted Jun 15, 2004·47 cites·8 claims
- 1176US6261007B1Substrate process method and substrate process apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jul 17, 2001·43 cites·6 claims
- 1276US5518552AMethod for scrubbing and cleaning substrateTOKYO ELECTRON LTD·Filed 1994·Granted May 21, 1996·54 cites·10 claims
- 1376US5488964AWashing apparatus, and washing methodTOKYO ELECTRON LTD·Filed 1992·Granted Feb 6, 1996·45 cites·9 claims
- 1475US6165552AFilm forming methodTOKYO ELECTRON LTD·Filed 1998·Granted Dec 26, 2000·41 cites·9 claims
- 1571US5681614AHydrophobic treatment method involving delivery of a liquid process agent to a process spaceTOKYO ELECTRON LTD·Filed 1996·Granted Oct 28, 1997·31 cites·14 claims
- 1668US6451515B2Substrate treating methodTOKYO ELECTRON LTD·Filed 1999·Granted Sep 17, 2002·31 cites·10 claims
- 1767US6079428AApparatus for removing coated film from peripheral portion of substrateTOKYO ELECTRON LTD·Filed 1998·Granted Jun 27, 2000·34 cites·14 claims
- 1866US6635113B2Coating apparatus and coating methodTOKYO ELECTRON LTD·Filed 1999·Granted Oct 21, 2003·31 cites·6 claims
- 1966USD415184SApparatus for manufacturing a semiconductor for a liquid crystal displayTOKYO ELECTRON LTD·Filed 1998·Granted Oct 12, 1999·15 cites·1 claims
- 2066US5782990AMethod for washing objectsTOKYO ELECTRON LTD·Filed 1997·Granted Jul 21, 1998·23 cites·4 claims
- 2164US5887604AWashing apparatus, and washing methodTOKYO ELECTRON LTD·Filed 1996·Granted Mar 30, 1999·21 cites·6 claims
- 2264US5671764AWashing apparatus, and washing methodTOKYO ELECTRON LTD·Filed 1995·Granted Sep 30, 1997·21 cites·15 claims
- 2363US6444409B2Coating and developing methodTOKYO ELECTRON LTD·Filed 2001·Granted Sep 3, 2002·9 cites·8 claims
- 2462US6270576B1Coating and developing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Aug 7, 2001·24 cites·9 claims
- 2562US5028955AExposure apparatusTOKYO ELECTRON LTD·Filed 1990·Granted Jul 2, 1991·36 cites·10 claims
- 2641USD415776SApparatus for manufacturing a semiconductor for a liquid crystal displayTOKYO ELECTRON LTD·Filed 1998·Granted Oct 26, 1999·5 cites·1 claims
- 2740US2002187423A1Substrate treating methodFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →