Inventor · disambiguated record
Noriaki Fujitani
Also filed as: FUJITANI NORIAKI
16 granted patents·2 pending applications·70 citations·filing 1989–2015
90Inventor score
Top patents by PatentIndex Score
18 records- 0187US8722840B2Resist underlayer film forming composition, and method for forming resist pattern using the sameSAKAMOTO RIKIMARU·Filed 2011·Granted May 13, 2014·6 cites·8 claims
- 0283US9910354B2Resist underlayer film-forming composition and method for forming resist pattern using the sameNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 6, 2018·4 cites·9 claims
- 0381US9195137B2Composition for forming highly adhesive resist underlayer filmNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 24, 2015·5 cites·6 claims
- 0480US9746768B2Resist overlayer film forming composition for lithography and method for producing semiconductor device using the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Aug 29, 2017·5 cites·4 claims
- 0578US5071221AWater penetration preventive cableMITSUBISHI PETROCHEMICAL CO·Filed 1989·Granted Dec 10, 1991·41 cites·9 claims
- 0677US9250525B2Resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Feb 2, 2016·2 cites·4 claims
- 0771US9165782B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2012·Granted Oct 20, 2015·2 cites·6 claims
- 0866US10042258B2Composition for forming a resist upper-layer film and method for producing a semiconductor device using the compositionNISSAN CHEMICAL IND LTD·Filed 2015·Granted Aug 7, 2018·1 cites·13 claims
- 0964US10242871B2Resist underlayer film-forming composition including a compound having an amino group protected with a tert-butoxycarbonyl groupNISSAN CHEMICAL IND LTD·Filed 2015·Granted Mar 26, 2019·1 cites·8 claims
- 1063US9927705B2Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Mar 27, 2018·1 cites·4 claims
- 1163US9436085B2Composition for forming photosensitive resist underlayer filmHORIGUCHI YUSUKE·Filed 2010·Granted Sep 6, 2016·1 cites·2 claims
- 1260US9240327B2Resist underlayer film-forming composition for EUV lithography containing condensation polymerSAKAMOTO RIKIMARU·Filed 2012·Granted Jan 19, 2016·1 cites·8 claims
- 1351US9212255B2Resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2013·Granted Dec 15, 2015·0 cites·13 claims
- 1448US9448480B2Resist underlayer film formation composition and method for forming resist pattern using the sameNISSAN CHEMICAL IND LTD·Filed 2014·Granted Sep 20, 2016·0 cites·10 claims
- 1548US2011117746A1Coating composition and pattern forming methodNISSAN CHEMICAL IND LTD·Filed 2009·Application pending·0 cites
- 1646US2010291483A1Resist underlayer film forming composition containing branched polyhydroxystyreneNISSAN CHEMICAL IND LTD·Filed 2008·Application pending·0 cites
- 1740US9977331B2Resist overlayer film forming composition and method for producing semiconductor device including the sameNISSAN CHEMICAL IND LTD·Filed 2015·Granted May 22, 2018·0 cites·15 claims
- 1835US10133178B2Coating liquid for resist pattern coatingNISSAN CHEMICAL IND LTD·Filed 2015·Granted Nov 20, 2018·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →