Inventor · disambiguated record
Noriaki Fukiage
Also filed as: FUKIAGE NORIAKI
25 granted patents·20 pending applications·149 citations·filing 2000–2025
95Inventor score
Top patents by PatentIndex Score
45 records- 0195US7862683B2Chamber dry cleaningTOKYO ELECTRON LTD·Filed 2005·Granted Jan 4, 2011·27 cites·36 claims
- 0292US9478410B2Method of forming nitride film with plasmaTOKYO ELECTRON LTD·Filed 2015·Granted Oct 25, 2016·13 cites·8 claims
- 0386US10151029B2Silicon nitride film forming method and silicon nitride film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Dec 11, 2018·4 cites·12 claims
- 0482US7201174B2Processing apparatus and cleaning methodTOKYO ELECTRON LTD·Filed 2001·Granted Apr 10, 2007·18 cites·18 claims
- 0582US6699531B1Plasma treatment methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 2, 2004·29 cites·8 claims
- 0681US11201053B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Dec 14, 2021·1 cites·3 claims
- 0777US10438791B2Film forming method, film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Oct 8, 2019·2 cites·7 claims
- 0876US10573512B2Film forming methodTOKYO ELECTRON LTD·Filed 2015·Granted Feb 25, 2020·2 cites·4 claims
- 0976US6753610B1Semiconductor device having multilayer interconnection structure and method of making the sameTOKYO ELECTRON LTD·Filed 2000·Granted Jun 22, 2004·19 cites·6 claims
- 1070US7718497B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2008·Granted May 18, 2010·3 cites·4 claims
- 1169US10714332B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Jul 14, 2020·1 cites·4 claims
- 1268US6773762B1Plasma treatment methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 10, 2004·12 cites·13 claims
- 1367US9922820B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 20, 2018·1 cites·4 claims
- 1467US9892909B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Feb 13, 2018·1 cites·7 claims
- 1566US2024209507A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1663US8419859B2Method of cleaning plasma-treating apparatus, plasma-treating apparatus where the cleaning method is practiced, and memory medium memorizing program executing the cleaning methodFUKIAGE NORIAKI·Filed 2008·Granted Apr 16, 2013·3 cites·8 claims
- 1760US7611758B2Method of improving post-develop photoresist profile on a deposited dielectric filmTOKYO ELECTRON LTD·Filed 2003·Granted Nov 3, 2009·4 cites·18 claims
- 1860US7371436B2Method and apparatus for depositing materials with tunable optical properties and etching characteristicsTOKYO ELECTRON LTD·Filed 2003·Granted May 13, 2008·7 cites·58 claims
- 1960US2025246417A1Plasma purge method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 2056US10900121B2Method of manufacturing semiconductor device and apparatus of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2017·Granted Jan 26, 2021·0 cites·4 claims
- 2155US6576569B1Method of plasma-assisted film depositionTOKYO ELECTRON LTD·Filed 2000·Granted Jun 10, 2003·2 cites·10 claims
- 2255US2010086681A1Control device of evaporating apparatus and control method of evaporating apparatusTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 2355US2009304906A1Evaporating apparatus, apparatus for controlling evaporating apparatus, method for controlling evaporating apparatus, method for using evaporating apparatus and method for manufacturing blowing portTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2454US12077855B2Cleaning method and film deposition apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Sep 3, 2024·0 cites·7 claims
- 2554US2019292662A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 2652US11508571B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Nov 22, 2022·0 cites·7 claims
- 2752US2008000423A1System for improving the wafer to wafer uniformity and defectivity of a deposited dielectric filmTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 2851US11725276B2Plasma purge methodTOKYO ELECTRON LTD·Filed 2021·Granted Aug 15, 2023·0 cites·8 claims
- 2948US2011008938A1Thin film and method for manufacturing semiconductor device using the thin filmTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 3047US2010173467A1Thin film and semiconductor device manufacturing method using the thin filmTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 3146US2011001197A1Method for manufacturing semiconductor device and semiconductor deviceTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 3245US11970768B2Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Apr 30, 2024·0 cites·7 claims
- 3345US2022081766A1Plasma purge methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 3444US10626496B2Film forming apparatus, method of cleaning film forming apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2018·Granted Apr 21, 2020·0 cites·10 claims
- 3543US11171014B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Nov 9, 2021·0 cites·4 claims
- 3642US2005221020A1Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric filmTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 3742US2021054501A1Film forming method and film forming apparatusTOKYO ELECTRON LTD·Filed 2020·Application pending·0 cites
- 3840US2019177845A1Semiconductor Process ChamberSAMSUNG ELECTRONICS CO LTD·Filed 2018·Application pending·0 cites
- 3940US2006046506A1Soft de-chucking sequenceTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 4039US2005100682A1Method for depositing materials on a substrateIBM·Filed 2003·Application pending·0 cites
- 4138US2018245216A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 4237US2017218517A1Method of forming nitride filmTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 4337US2018237914A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 4436US2018135170A1Film forming apparatusTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 4533US2016322218A1Film Forming Method and Film Forming ApparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →