Inventor · disambiguated record
Norihiko Ikeda
Also filed as: IKEDA NORIHIKO
24 granted patents·8 pending applications·48 citations·filing 2003–2025
93Inventor score
Top patents by PatentIndex Score
32 records- 0198US11978612B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Granted May 7, 2024·3 cites·16 claims
- 0291US2025357080A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2025·Application pending·0 cites
- 0390US9477149B2Photoresist composition, compound, and production method thereofJSR CORP·Filed 2014·Granted Oct 25, 2016·6 cites·17 claims
- 0489US11424105B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 23, 2022·3 cites·13 claims
- 0589US10755897B2Plasma processing apparatus and plasma processing methodHITACHI HIGH-TECH CORP·Filed 2018·Granted Aug 25, 2020·5 cites·4 claims
- 0686US12444572B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2024·Granted Oct 14, 2025·0 cites·7 claims
- 0780US7252782B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted Aug 7, 2007·7 cites·18 claims
- 0879US8157877B2Chemical mechanical polishing aqueous dispersion, chemical mechanical polishing method, and kit for preparing chemical mechanical polishing aqueous dispersionIKEDA NORIHIKO·Filed 2006·Granted Apr 17, 2012·9 cites·11 claims
- 0974US9390941B2Sample processing apparatus, sample processing system, and method for processing sampleWATANABE SEIICHI·Filed 2010·Granted Jul 12, 2016·5 cites·16 claims
- 1073US11081320B2Plasma processing apparatus, plasma processing method, and ECR height monitorHITACHI HIGH TECH CORP·Filed 2019·Granted Aug 3, 2021·1 cites·9 claims
- 1173US10699884B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted Jun 30, 2020·1 cites·4 claims
- 1270US9588423B2Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production methodJSR CORP·Filed 2014·Granted Mar 7, 2017·1 cites·14 claims
- 1369US12444575B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2023·Granted Oct 14, 2025·0 cites·5 claims
- 1469US11355315B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2017·Granted Jun 7, 2022·1 cites·4 claims
- 1567US9323146B2Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable baseJSR CORP·Filed 2014·Granted Apr 26, 2016·1 cites·18 claims
- 1666US9459532B2Radiation-sensitive resin composition, polymer and compoundJSR CORP·Filed 2013·Granted Oct 4, 2016·1 cites·19 claims
- 1765US8182977B2Polymer and positive-tone radiation-sensitive resin compositionIKEDA NORIHIKO·Filed 2010·Granted May 22, 2012·2 cites·10 claims
- 1860US11094512B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Aug 17, 2021·0 cites·2 claims
- 1957US9720322B2Photoresist composition, compound, and production method thereofJSR CORP·Filed 2016·Granted Aug 1, 2017·0 cites·14 claims
- 2055US11152192B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 19, 2021·0 cites·7 claims
- 2155US2025118537A1Plasma processing apparatus and heating apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 2254US10088750B2Acid diffusion control agent, radiation-sensitive resin composition, resist pattern-forming method, compound, and production methodJSR CORP·Filed 2017·Granted Oct 2, 2018·0 cites·14 claims
- 2352US12009180B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted Jun 11, 2024·0 cites·11 claims
- 2450US2007151951A1Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization methodJSR CORP·Filed 2007·Application pending·0 cites
- 2549US7189651B2Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization methodJSR CORP·Filed 2003·Granted Mar 13, 2007·2 cites·8 claims
- 2647US2023352274A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Application pending·0 cites
- 2747US2014011365A1Plasma processing apparatus and methodYASUI NAOKI·Filed 2012·Application pending·0 cites
- 2845US2022359162A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Application pending·0 cites
- 2942US9329474B2Photoresist composition and resist pattern-forming methodJSR CORP·Filed 2013·Granted May 3, 2016·0 cites·15 claims
- 3041US7550020B2Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing methodJSR CORP·Filed 2005·Granted Jun 23, 2009·0 cites·8 claims
- 3138US2009325323A1Aqueous dispersion for chemical mechanical polishing, production method thereof, and chemical mechanical polishing methodJSR CORP·Filed 2007·Application pending·0 cites
- 3234US2011223537A1Radiation-sensitive resin composition and polymerJSR CORP·Filed 2011·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Norihiko Ikeda files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →