Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method

Abstract

A stopper for chemical mechanical planarization comprising an organosilicon polymer, in particular a polycarbosilane, is provided. The stopper used for polishing wafers with a wiring pattern in the manufacture of semiconductor devices to protect interlayer dielectric films made of a material such as SiO 2 , fluorine dope SiO 2 , or organic or inorganic SOG (Spin-on glass) from damages during the chemical mechanical planarization process.

1 - 4 . (canceled)  
   
   
       5 . A method for producing a stopper for chemical mechanical planarization comprising 
 applying a coating solution comprising (A) a polycarbosilane and (B) an organic solvent to a substrate and heating the coating.    
   
   
       6 . A chemical mechanical planarization method for removing a metallic film formed on an insulating film using a polishing solution characterized by providing a stopper for chemical mechanical planarization comprising polycarbosilane between the insulating film and metal film.  
   
   
       7 . The chemical mechanical planarization method according to  claim 6 , wherein the metallic film comprises a first metal film of a barrier metal and a second metal film of copper, an alloy containing copper as a main component, or a copper compound.  
   
   
       8 . A chemical mechanical planarization method comprising 
 forming a layer having an opening on a semiconductor region, the layer comprising an insulating film formed on the semiconductor region and a stopper for chemical mechanical planarization formed on insulating film,    depositing a first metallic film of a barrier metal and a second metallic film of copper, an alloy containing copper as a main component, or a copper compound in the stopper for chemical mechanical planarization and the opening to fill the opening with the deposited metal films, and    removing the second metallic film on the stopper for chemical mechanical planarization using a chemical mechanical planarization solution.    
   
   
       9 . The method of  claim 5 , wherein the polycarbosilane (A) of the coating solution consists of structural units of the following formula (1),  
     
       
         
         
             
             
         
       
       wherein R 1  and R 2  independently represent a hydrogen atom, an alkyl group having 1-30 carbon atoms that may have a substituent, an alkenyl group having 1-30 carbon atoms that may have a substituent, an alkynyl group having 1-30 carbon atoms that may have a substituent, or an aromatic group that may have a substituent and R 3  represents —C≡C—, —CH 2 —that may have a substituent linked with at least one —C≡C— group, an alkylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkenylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkynylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, or a divalent aromatic group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group.  
     
   
   
       10 . The method of  claim 5 , which is carried out to form a chemical mechanical planarization stopper film consisting of the polycarbosilane polymer, wherein the film is present on the surface of the substrate.  
   
   
       11 . The method of  claim 6 , wherein the stopper for chemical mechanical planarization consists of a polycarbosilane polymer consisting of structural units of the following formula (1),  
     
       
         
         
             
             
         
       
       wherein R 1  and R 2  independently represent a hydrogen atom, an alkyl group having 1-30 carbon atoms that may have a substituent, an alkenyl group having 1-30 carbon atoms that may have a substituent, an alkynyl group having 1-30 carbon atoms that may have a substituent, or an aromatic group that may have a substituent and R 3  represents —C≡C—, —CH 2 — that may have a substituent linked with at least one —C≡C— group, an alkylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkenylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkynylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C-group, or a divalent aromatic group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group.  
     
   
   
       12 . The method of  claim 8 , wherein the stopper consists of a polycarbosilane polymer that consists of structural units of the following formula (1),  
     
       
         
         
             
             
         
       
       wherein R 1  and R 2  independently represent a hydrogen atom, an alkyl group having 1-30 carbon atoms that may have a substituent, an alkenyl group having 1-30 carbon atoms that may have a substituent, an alkynyl group having 1-30 carbon atoms that may have a substituent, or an aromatic group that may have a substituent and R 3  represents —C≡C—, —CH 2 — that may have a substituent linked with at least one —C≡C— group, an alkylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkenylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, an alkynylene group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group, or a divalent aromatic group having 2-30 carbon atoms that may have a substituent linked with at least one —C≡C— group.