Inventor · disambiguated record
Norio Komine
Also filed as: KOMINE NORIO
30 granted patents·15 pending applications·624 citations·filing 1995–2012
98Inventor score
Top patents by PatentIndex Score
45 records- 0198US7423731B2Illumination optical system, exposure apparatus, and exposure method with polarized switching deviceNIKON CORP·Filed 2005·Granted Sep 9, 2008·59 cites·58 claims
- 0297US7515248B2Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustmentNIKON CORP·Filed 2007·Granted Apr 7, 2009·25 cites·28 claims
- 0393US6649268B1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberNIKON CORP·Filed 2000·Granted Nov 18, 2003·25 cites·13 claims
- 0490US5707908ASilica glassNIKON CORP·Filed 1996·Granted Jan 13, 1998·64 cites·6 claims
- 0587US6505484B1Forming method of silica glass and forming apparatus thereofNIKON CORP·Filed 2000·Granted Jan 14, 2003·16 cites·8 claims
- 0684US5679125AMethod for producing silica glass for use with light in a vacuum ultraviolet wavelength rangeNIKON CORP·Filed 1995·Granted Oct 21, 1997·59 cites·9 claims
- 0783US6374639B2Silica glass and its manufacturing methodNIKON CORP·Filed 2001·Granted Apr 23, 2002·10 cites·15 claims
- 0883US5958809AFluorine-containing silica glassNIKON CORP·Filed 1997·Granted Sep 28, 1999·47 cites·7 claims
- 0982US6291377B1Silica glass and its manufacturing methodNIKON CORP·Filed 1998·Granted Sep 18, 2001·25 cites·18 claims
- 1082US5908482AMethod for producing a silica glassNIKON CORP·Filed 1997·Granted Jun 1, 1999·41 cites·6 claims
- 1181US6339033B2Silica glass having superior durability against excimer laser beams and method for manufacturing the sameNIKON CORP·Filed 2000·Granted Jan 15, 2002·9 cites·17 claims
- 1280US6087283ASilica glass for photolithographyNIKON CORP·Filed 1996·Granted Jul 11, 2000·39 cites·12 claims
- 1377US6094940AManufacturing method of synthetic silica glassNIKON CORP·Filed 1999·Granted Aug 1, 2000·23 cites·10 claims
- 1476US5699183ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 16, 1997·25 cites·10 claims
- 1576US5696624ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1996·Granted Dec 9, 1997·24 cites·3 claims
- 1675US7515247B2Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting deviceNIKON CORP·Filed 2007·Granted Apr 7, 2009·2 cites·30 claims
- 1773US6320661B1Method for measuring transmittance of optical members for ultraviolent use, synthetic silica glass, and photolithography apparatus using the sameNIKON CORP·Filed 2000·Granted Nov 20, 2001·11 cites·24 claims
- 1873US6061174AImage-focusing optical system for ultraviolet laserNIKON CORP·Filed 1998·Granted May 9, 2000·32 cites·19 claims
- 1970US6518210B1Exposure apparatus including silica glass and method for producing silica glassNIKON CORP·Filed 2000·Granted Feb 11, 2003·10 cites·9 claims
- 2069US6174830B1Silica glass having superior durability against excimer laser beams and method for manufacturing the sameNIKON CORP·Filed 1998·Granted Jan 16, 2001·16 cites·14 claims
- 2166US6587262B1UV synthetic silica glass optical member and reduction projection exposure apparatus using the sameNIKON CORP·Filed 2000·Granted Jul 1, 2003·7 cites·12 claims
- 2264US6656860B2Synthetic silica glass member, photolithography apparatus and process for producing photolithography apparatusNIKON CORP·Filed 2001·Granted Dec 2, 2003·7 cites·3 claims
- 2360US6378340B2Manufacturing method of synthetic silica glassNIKON CORP·Filed 2000·Granted Apr 30, 2002·1 cites·49 claims
- 2459US5703712ASilica glass member for UV-lithography, method for silica glass production, and method for silica glass member productionNIKON CORP·Filed 1995·Granted Dec 30, 1997·11 cites·3 claims
- 2558US2008239274A1Illumination optical system, exposure apparatus, and exposure methodNIKON CORP·Filed 2008·Application pending·0 cites
- 2658US2012236285A1Illumination optical system, exposure apparatus, and exposure methodTANITSU OSAMU·Filed 2012·Application pending·0 cites
- 2758US2005284177A1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberNIKON CORP·Filed 2005·Application pending·0 cites
- 2854US2010225895A1Illumination optical system, exposure apparatus, and exposure methodNIKON CORP·Filed 2010·Application pending·0 cites
- 2954US2010149511A1Illumination optical system, exposure apparatus, and exposure methodNIKON CORP·Filed 2010·Application pending·0 cites
- 3052US2004095566A1Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical memberFiled 2003·Application pending·0 cites
- 3150US7072026B2Exposure apparatus and optical component for the sameNIKON CORP·Filed 2005·Granted Jul 4, 2006·0 cites·11 claims
- 3250US5983672AMethod for manufacturing optical components for use in the ultraviolet regionNIKON CORP·Filed 1997·Granted Nov 16, 1999·12 cites·24 claims
- 3350US2006158636A1Exposure apparatus and optical component for the sameNIKON CORP·Filed 2006·Application pending·0 cites
- 3450US2006164620A1Exposure apparatus and optical component for the sameNIKON CORP·Filed 2006·Application pending·0 cites
- 3549US2005047986A1Synthetic quartz glass member and method for producing the sameNIKON CORP·Filed 2004·Application pending·0 cites
- 3648US6075607AMethod for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical memberNIKON CORP·Filed 1998·Granted Jun 13, 2000·13 cites·19 claims
- 3746US2003119649A1Exposure apparatus including silica glass for photolithographyNIKON CORP·Filed 2002·Application pending·0 cites
- 3845US2002144517A1Synthetic silica glass optical member and method of manufacturing the sameNIKON CORP·Filed 2002·Application pending·0 cites
- 3944US2003037568A1Fluorine-containing silica glass and its method of manufactureNIKON CORP·Filed 2002·Application pending·0 cites
- 4044US2002050152A1Synthetic silica glass molding method, synthetic silica glass molding apparatus, and synthetic silica glassFiled 2001·Application pending·0 cites
- 4141US6442973B1Synthetic silica glass and its manufacturing methodNIKON CORP·Filed 1999·Granted Sep 3, 2002·6 cites·34 claims
- 4238US6835683B2Quartz glass member and projection alignerNIKON CORP·Filed 2002·Granted Dec 28, 2004·0 cites·7 claims
- 4338US2006171138A1Illuminating optical system, exposure system and exposure methodMURAMATSU KENICHI·Filed 2004·Application pending·0 cites
- 4437US2004047029A1Optical member and projection optical system for photolithography using the sameNIKON CORP·Filed 2002·Application pending·0 cites
- 4536US6269661B1Method for manufacturing optical components for use in the ultraviolet regionNIKON CORP·Filed 1999·Granted Aug 7, 2001·5 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →