Inventor · disambiguated record
Nobuhiro Komine
Also filed as: KOMINE NOBUHIRO
31 granted patents·11 pending applications·46 citations·filing 2002–2021
94Inventor score
Top patents by PatentIndex Score
42 records- 0179US8907346B2Imprint apparatus, imprint method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2013·Granted Dec 9, 2014·4 cites·15 claims
- 0276US9784573B2Positional deviation measuring device, non-transitory computer-readable recording medium containing a positional deviation measuring program, and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2015·Granted Oct 10, 2017·2 cites·6 claims
- 0371US6866976B2Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unitTOSHIBA KK·Filed 2003·Granted Mar 15, 2005·14 cites·36 claims
- 0470US8976356B2Measurement mark, method for measurement, and measurement apparatusTOSHIBA KK·Filed 2013·Granted Mar 10, 2015·2 cites·15 claims
- 0569US9128388B2Method of focus measurement, exposure apparatus, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2013·Granted Sep 8, 2015·2 cites·13 claims
- 0669US7092068B2Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·10 cites·25 claims
- 0768US10295409B2Substrate measurement system, method of measuring substrate, and computer program productTOSHIBA MEMORY CORP·Filed 2016·Granted May 21, 2019·1 cites·15 claims
- 0868US9952505B2Imprint device and pattern forming methodTOSHIBA MEMORY CORP·Filed 2014·Granted Apr 24, 2018·1 cites·7 claims
- 0966US9632407B2Mask processing apparatus and mask processing methodTOSHIBA KK·Filed 2014·Granted Apr 25, 2017·1 cites·17 claims
- 1066US7906258B2Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2008·Granted Mar 15, 2011·2 cites·16 claims
- 1163US9459093B2Deflection measuring device and deflection measuring methodTOSHIBA KK·Filed 2014·Granted Oct 4, 2016·1 cites·19 claims
- 1263US9260300B2Pattern formation method and pattern formation apparatusTOSHIBA KK·Filed 2013·Granted Feb 16, 2016·1 cites·8 claims
- 1355US7164960B2Apparatus for correcting a plurality of exposure tools, method for correcting a plurality of exposure tools, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2004·Granted Jan 16, 2007·4 cites·16 claims
- 1449US9396299B2Reticle mark arrangement method and nontransitory computer readable medium storing a reticle mark arrangement programTOSHIBA KK·Filed 2014·Granted Jul 19, 2016·0 cites·18 claims
- 1549US9354527B2Overlay displacement amount measuring method, positional displacement amount measuring method and positional displacement amount measuring apparatusTOSHIBA KK·Filed 2013·Granted May 31, 2016·0 cites·15 claims
- 1649US9239526B2Exposure apparatus and transfer characteristics measuring methodTOSHIBA KK·Filed 2013·Granted Jan 19, 2016·0 cites·10 claims
- 1749US8928871B2Reflective maskSUZUKI MASARU·Filed 2012·Granted Jan 6, 2015·0 cites·2 claims
- 1848US9429849B2Adjusting method of pattern transferring plate, laser application machine and pattern transferring plateTOSHIBA KK·Filed 2014·Granted Aug 30, 2016·0 cites·20 claims
- 1947US9368413B2Light exposure condition analysis method, nontransitory computer readable medium storing a light exposure condition analysis program, and manufacturing method for a semiconductor deviceTOSHIBA KK·Filed 2014·Granted Jun 14, 2016·0 cites·9 claims
- 2047US9104115B2Method for controlling exposure apparatus and exposure apparatusTOSHIBA KK·Filed 2013·Granted Aug 11, 2015·0 cites·18 claims
- 2147US2022293418A1Semiconductor manufacturing apparatus and semiconductor manufacturing methodKIOXIA CORP·Filed 2021·Application pending·0 cites
- 2246US7630052B2Exposure processing system, exposure processing method and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2004·Granted Dec 8, 2009·1 cites·15 claims
- 2345US10488754B2Imprint apparatus and manufacturing method of semiconductor deviceTOSHIBA MEMORY CORP·Filed 2017·Granted Nov 26, 2019·0 cites·19 claims
- 2445US9772566B2Mask alignment mark, photomask, exposure apparatus, exposure method, and manufacturing method of deviceTOSHIBA MEMORY CORP·Filed 2015·Granted Sep 26, 2017·0 cites·20 claims
- 2545US2015009488A1Mask distortion measuring apparatus and method of measuring mask distortionTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2645US2016020099A1Pattern forming method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2014·Application pending·0 cites
- 2744US10599045B2Exposure method, exposure system, and manufacturing method for semiconductor deviceTOSHIBA MEMORY CORP·Filed 2018·Granted Mar 24, 2020·0 cites·8 claims
- 2844US9885960B2Pattern shape adjustment method, pattern shape adjustment system, exposure apparatus, and recording mediumTOSHIBA MEMORY CORP·Filed 2014·Granted Feb 6, 2018·0 cites·10 claims
- 2944US8343692B2Exposure apparatus inspection mask and exposure apparatus inspection methodTOSHIBA KK·Filed 2010·Granted Jan 1, 2013·0 cites·18 claims
- 3044US2016043037A1Mark, semiconductor device, and semiconductor waferTOSHIBA KK·Filed 2014·Application pending·0 cites
- 3142US2014240892A1Electrostatic chuck, reticle, and electrostatic chuck methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3241US11143950B2Mask manufacturing method and mask setTOSHIBA MEMORY CORP·Filed 2018·Granted Oct 12, 2021·0 cites·3 claims
- 3341US9703912B2Mask set, fabrication method of mask set, manufacturing method of semiconductor device, and recording mediumTOSHIBA KK·Filed 2015·Granted Jul 11, 2017·0 cites·20 claims
- 3440US2014285787A1Exposure system and exposure methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 3537US9741564B2Method of forming mark pattern, recording medium and method of generating mark dataTOSHIBA MEMORY CORP·Filed 2015·Granted Aug 22, 2017·0 cites·7 claims
- 3637US2018082880A1Substrate holding apparatusTOSHIBA MEMORY CORP·Filed 2017·Application pending·0 cites
- 3737US2014061969A1Patterning method and templateOKAMOTO YOSUKE·Filed 2012·Application pending·0 cites
- 3836US6872508B2Exposure method and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Mar 29, 2005·0 cites·14 claims
- 3936US2016266500A1Exposure apparatus, exposure method, and manufacturing method of deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 4033US2016379902A1Measurement apparatus, measurement method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2015·Application pending·0 cites
- 4131US9760017B2Wafer lithography equipmentTOSHIBA MEMORY CORP·Filed 2015·Granted Sep 12, 2017·0 cites·9 claims
- 4229US2016225650A1Substrate holding device and semiconductor device manufacturing methodTOSHIBA KK·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →